G02B7/185

Projection exposure apparatus for semiconductor lithography

A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.

Adaptive optical system with improved response time, related use and method

The invention relates to an adaptive optical system (1) comprising: an adaptive optical device (2) comprising an optical processing surface (3) and a driving device (5) for controllably modifying the optical behaviour of said optical processing surface (3), an optical analyser (6) intended to be subjected to an input light beam (7) in order to produce, in response, output signals (8, 9, 10), a control device (11) connected to the optical analyser (6) and to the driving device (5) in order to command the latter depending on said output signals (8, 9, 10), characterised in that said optical analyser (6) is designed to spatially demultiplex, via multi-plane light conversion, the input light beams (7) into a plurality of elementary output light beams (80, 90, 100). Adaptive optical systems.

Adaptive optical system with improved response time, related use and method

The invention relates to an adaptive optical system (1) comprising: an adaptive optical device (2) comprising an optical processing surface (3) and a driving device (5) for controllably modifying the optical behaviour of said optical processing surface (3), an optical analyser (6) intended to be subjected to an input light beam (7) in order to produce, in response, output signals (8, 9, 10), a control device (11) connected to the optical analyser (6) and to the driving device (5) in order to command the latter depending on said output signals (8, 9, 10), characterised in that said optical analyser (6) is designed to spatially demultiplex, via multi-plane light conversion, the input light beams (7) into a plurality of elementary output light beams (80, 90, 100). Adaptive optical systems.

Optical assembly, method for deforming an optical element, and projection exposure system

An optical assembly has an optical element for influencing the beam path in a projection exposure apparatus and an actuator device for deforming the optical element. The actuator device has at least one photostrictive component and at least one light source. The photostrictive component is mechanically coupled to the optical element for the transmission of a tensile and/or compressive force in order to deform the optical element. The light source is configured for targeted illumination of the photostrictive component in order to induce the tensile and/or compressive force in the photostrictive component.

LIQUID MIRROR
20250334773 · 2025-10-30 ·

An example liquid mirror includes a first liquid, a second liquid immiscible with the first liquid and configured to define an interface between the first liquid and the second liquid, and a plurality of reflective particles configured to self-assemble at the interface between the first liquid and the second liquid. The liquid mirror also includes a support structure defining an outer surface configured to support the first liquid and the second liquid. The outer surface, the first liquid, and the second liquid are configured to cause the plurality of reflective particles to form a focusing shape via capillary action of the first liquid and the second liquid and interaction with the support structure.

LIQUID MIRROR
20250334773 · 2025-10-30 ·

An example liquid mirror includes a first liquid, a second liquid immiscible with the first liquid and configured to define an interface between the first liquid and the second liquid, and a plurality of reflective particles configured to self-assemble at the interface between the first liquid and the second liquid. The liquid mirror also includes a support structure defining an outer surface configured to support the first liquid and the second liquid. The outer surface, the first liquid, and the second liquid are configured to cause the plurality of reflective particles to form a focusing shape via capillary action of the first liquid and the second liquid and interaction with the support structure.

Amplified laser device using a MEMS MMA having tip, tilt and piston capability to both correct a beam profile and steer the amplified beam

An amplified laser device is provided with one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) having tip, tilt and piston capability positioned on either side of the optical amplifier to correct the profile of the beam to improve the gain performance of the optical amplifier or to compensate for atmospheric distortion while steering the amplified beam over a FOR. The MEMS MMAs may be positioned in front of, behind or on both sides of the amplifier. The MEMS MMAs can be configured to optimize the combined amplifier performance, static and time varying, and compensation for atmospheric distortion together or separately.

ADAPTIVE OPTICAL MODULE
20260064008 · 2026-03-05 ·

An adaptive optical module has at least one actuator for altering a shape of an optical surface of the optical module. The actuator comprises: a dielectric medium, which is deformable via an electric field, and electrodes for generating the electric field in the dielectric medium by applying an electrical working voltage. The adaptive optical module further comprises a measuring device that measures an impedance present at different values of the working voltage between the electrodes depending on a frequency of an AC voltage applied to the electrodes for measurement purposes, and an evaluation device configured to ascertain from the measured impedance approximately a respective gradient value of characteristic curves each representing a capacitance of the actuator depending on the frequency for the different values of the working voltage and to determine therefrom a deflection of the actuator at at least one operating point of the working voltage.

ADAPTIVE OPTICAL MODULE
20260064008 · 2026-03-05 ·

An adaptive optical module has at least one actuator for altering a shape of an optical surface of the optical module. The actuator comprises: a dielectric medium, which is deformable via an electric field, and electrodes for generating the electric field in the dielectric medium by applying an electrical working voltage. The adaptive optical module further comprises a measuring device that measures an impedance present at different values of the working voltage between the electrodes depending on a frequency of an AC voltage applied to the electrodes for measurement purposes, and an evaluation device configured to ascertain from the measured impedance approximately a respective gradient value of characteristic curves each representing a capacitance of the actuator depending on the frequency for the different values of the working voltage and to determine therefrom a deflection of the actuator at at least one operating point of the working voltage.

ACTUATOR ASSEMBLY

An actuator assembly is disclosed. The actuator assembly comprises a support structure (2): a first movable part (10): a second movable part (12): an actuator arrangement configured to drive rotation of the first movable part around a primary axis (O) relative to the support structure: a first bearing arrangement (20, 21) configured to convert said rotation of the first movable part into helical movement of the first movable part around the primary axis relative to the support structure: a rotation control arrangement capable of limiting rotation of the second movable part around the primary axis relative to the support structure; and a second bearing arrangement (30, 31) configured such that, when the first movable part undergoes said helical movement and the second movable part undergoes said rotation limitation, the second movable part undergoes translational movement along the primary axis relative to the support structure and/or the first movable part.