Provided are an improved holographic reconstruction apparatus and method.

A holographic reconstruction method includes: obtaining an object hologram of a measurement target object; extracting reference light information from the obtained object hologram; calculating a wavenumber vector constant of the extracted reference light information, and generating digital reference light by calculating a compensation term of the reference light information by using the calculated wavenumber vector constant; extracting curvature aberration information from the object hologram, and then generating digital curvature in which a curvature aberration is compensated for; calculating a compensated object hologram by multiplying the compensation term of the reference light information by the obtained object hologram; extracting phase information of the compensated object hologram; and reconstructing 3-dimensional (3D) shape information and quantitative thickness information of the measurement target object by calculating the quantitative thickness information of the measurement target object by using the extracted phase information of the compensated object hologram.

The invention relates to a method for determining an imaging function of a mask inspection microscope, wherein the mask inspection microscope comprises an imaging optical element, a tube, a recording device, an object stage, an illumination unit for measurement with transmitted light and an illumination unit for measurement in reflection, comprising the following method steps: a) measuring the intensities in the pupil plane of the imaging optical element in a reflective measurement, b) measuring the intensities in the pupil plane of the imaging optical element in a transmitted-light measurement, d) Determining the imaging function of the intensities of the imaging optical element, d) determining the imaging function of the intensities of the illumination optical element comprised in the illumination unit for the transmitted-light measurement.

Furthermore, the invention relates to a mask inspection microscope for determining the deviation of an actual structure from a desired structure on an object, comprising an imaging optical element, a tube, a recording device, an additional optical module, an illumination unit for measurement with transmitted light, an illumination unit for measurement in reflection, and an object stage, wherein the object stage is configured to move to a position with a deviation of less than 100 nm, in particular of less than 20 nm, a calculation unit, in which the calculation unit is configured to calibrate the mask inspection microscope.

An example imaging apparatus comprises a light source, an imaging spectrometer, an image sensor, control circuitry, and processing circuitry. The light source generates power for delivery at a molecular sample, which can include at least 100 mW. The imaging spectrometer separates light emitted from the molecular sample into a plurality of different component wavelengths. The control circuitry causes the image sensor to scan one or more regions of the molecular sample while the imaging spectrometer is aligned with the image sensor and collects hyperspectral image data of the molecular sample from the light emitted that corresponds to the plurality of different component wavelengths. The processing circuitry performs an image processing pipeline by transforming the hyperspectral image data into data that is representative of a quantification of emitters, absorbers, and/or scatterers present in the one or more regions of the molecular sample.

Methods, devices, systems, and apparatuses are provided for the image analysis of measurement of biological samples. Specifically, methods are provided for detecting and measuring, in a sample, cell morphology; measurement of cell numbers; detection of particles; measurement of particle numbers; and other properties and quantities of or in a sample. Some embodiments may use a sample holder comprising a sample chamber configured to hold said sample, at least a portion of said sample holder comprising an optically transmissive material, said optically transmissive material comprising an optically transmissive surface and a reflective surface.

An imaging microscope (12) for generating an image of a sample (10) comprises a beam source (14) that emits a temporally coherent illumination beam (20), the illumination beam (20) including a plurality of rays that are directed at the sample (10); an image sensor (18) that converts an optical image into an array of electronic signals; and an imaging lens assembly (16) that receives rays from the beam source (14) that are transmitted through the sample (10) and forms an image on the image sensor (18). The imaging lens assembly (16) can further receive rays from the beam source (14) that are reflected off of the sample (10) and form a second image on the image sensor (18). The imaging lens assembly (16) receives the rays from the sample (10) and forms the image on the image sensor (18) without splitting and recombining the rays.

An IR microscope includes an IR light source (1) generating a collimated IR beam (26), an effectively beam-limiting element (8) in a stop plane (27), a sample position (15), a detector (19) having an IR sensor (19a), a detector stop (19b), a first optical device focusing the collimated IR beam onto the sample position, and a second optical device imaging the sample position onto the IR sensor. The effectively beam-limiting element is situated in the collimated IR beam. The first and second optical devices image the detector stop opening into an input beam plane. For the area A1 of the image of the detector stop opening in the input beam plane and the area A2 of the cross section of the collimated IR beam in the input beam plane: 0<A1/A21. Thereby, only collimated IR radiation is picked up, while vignetting and stray radiation are avoided.

Methods, devices, apparatus, and systems are provided for image analysis. Methods of image analysis may include observation, measurement, and analysis of images of biological and other samples; devices, apparatus, and systems provided herein are useful for observation, measurement, and analysis of images of such samples. The methods, devices, apparatus, and systems disclosed herein provide advantages over other methods, devices, apparatus, and systems.

A pattern inspection apparatus includes a transmitted illumination optical system to illuminate change the shape of a first inspection light, a reflected illumination optical system to illuminate a mask substrate with a second inspection light by using an objective lens and a polarizing element, and let a reflected light from the mask substrate pass therethrough, a drive mechanism to enable the polarizing element to be moved from/to outside/inside an optical path, a sensor to receive a transmitted light from the mask substrate illuminated with the first inspection light during stage moving, and an aperture stop, between the mask substrate and the sensor, to adjust a light flux diameter of the transmitted light so that the transmitted light reaching the sensor can be switched between high and low numerical aperture (NA) states with which the transmitted light from the mask substrate can enter the objective lens.

An imaging microscope (12) for generating an image of a sample (10) comprises a beam source (14) that emits a temporally coherent illumination beam (20), the illumination beam (20) including a plurality of rays that are directed at the sample (10); an image sensor (18) that converts an optical image into an array of electronic signals; and an imaging lens assembly (16) that receives rays from the beam source (14) that are transmitted through the sample (10) and forms an image on the image sensor (18). The imaging lens assembly (16) can further receive rays from the beam source (14) that are reflected off of the sample (10) and form a second image on the image sensor (18). The imaging lens assembly (16) receives the rays from the sample (10) and forms the image on the image sensor (18) without splitting and recombining the rays.

A microscopy system includes: an imaging unit that acquires an image by capturing an object image generated by an observation optical system; a shift unit that shifts a focal plane and a position of a field of view of the observation optical system; an imaging control unit that causes the imaging unit to acquire a multi-focus superimposed image including image information on planes in an optical axis direction of the observation optical system by shifting the focal plane and the position of the field of view during one exposure period; a shift amount acquisition processing unit that acquires a shift amount by which the position of the field of view is shifted; an all-in-focus image generation unit that generates all-in-focus images based on multi-focus superimposed images, respectively, acquired under conditions in which the shift amounts are different; and a display unit that displays the all-in-focus images.