A review system and operation method directs a beam of light toward a sample on a stage. The sample is a wafer level packaging wafer or a backend wafer. Defect review is performed based on the light reflected from the sample. The review system can use one or more of: a fluid supplied by an immersion subsystem that includes a fluid supply unit and a fluid removal unit; an illumination pattern for differential phase contrast; or ultraviolet or deep ultraviolet wavelengths.

A review system and operation method directs a beam of light toward a sample on a stage. The sample is a wafer level packaging wafer or a backend wafer. Defect review is performed based on the light reflected from the sample. The review system can use one or more of: a fluid supplied by an immersion subsystem that includes a fluid supply unit and a fluid removal unit; an illumination pattern for differential phase contrast; or ultraviolet or deep ultraviolet wavelengths.

Various embodiments include reflective-mode Fourier ptychographic microscope (RFPM) apparatuses and methods for using the RFPM. In one example, the RFPM includes a multiple-component light source configured to direct radiation to a surface. The multiple-component light source has a number of individual-light sources, each of which is configured to be activated individually. The RFPM further includes collection optics to receive radiation reflected and scattered or otherwise redirected from the surface, and a sensor element to convert received light-energy from the collection optics into an electrical-signal output. Other apparatuses, designs, and methods are disclosed.

Various embodiments include reflective-mode Fourier ptychographic microscope (RFPM) apparatuses and methods for using the RFPM. In one example, the RFPM includes a multiple-component light source configured to direct radiation to a surface. The multiple-component light source has a number of individual-light sources, each of which is configured to be activated individually. The RFPM further includes collection optics to receive radiation reflected and scattered or otherwise redirected from the surface, and a sensor element to convert received light-energy from the collection optics into an electrical-signal output. Other apparatuses, designs, and methods are disclosed.

The present invention describes an imaging system that allows visualization of a wide range of samples both in terms of morphology and in terms of material (e.g. density distribution, varying chemical composition, or anything that induces a change of optical path). The application of this imaging system includes absorptive samples as well as nearly and fully transparent samples with respect to the wavelength of illumination.

Two elements are key in this system: the use of a so-called lock-in camera, and the synchronization of the recording to a modulation of choice along the image forming apparatus. Such modulation can consist for example in modulation of the illumination, use of filters, tilt/rotation of the sample or of certain microscope components.

The present invention describes an imaging system that allows visualization of a wide range of samples both in terms of morphology and in terms of material (e.g. density distribution, varying chemical composition, or anything that induces a change of optical path). The application of this imaging system includes absorptive samples as well as nearly and fully transparent samples with respect to the wavelength of illumination.

Two elements are key in this system: the use of a so-called lock-in camera, and the synchronization of the recording to a modulation of choice along the image forming apparatus. Such modulation can consist for example in modulation of the illumination, use of filters, tilt/rotation of the sample or of certain microscope components.

An observation device includes an illumination optical system provided on a lower side of an installation position of a multi-well plate, a reflector that reflects light emitted from the illumination optical system, the reflector being provided on an upper side of the installation position, and an observation optical system that condenses the light reflected by the reflector, the observation optical system being provided on the lower side of the installation position. The reflector includes a plurality of curved surfaces where the light emitted from the illumination optical system enters. Each of the plurality of curved surfaces corresponds to one or more wells included in the multi-well plate, has positive power in a first direction in which the illumination optical system and the observation optical system are aligned, and has a center of curvature at a position deviating from a central axis of a well of the multi-well plate.

A quantitative phase microscopy (QPM) system and methods are provided for sample imaging and metrology in both transmissive and reflective modes. The QPM system includes a first illuminating beam propagating along a transmission-mode path and a second illuminating beam propagating along a reflection-mode path, a microscope objective lens disposed in the reflection-mode path, and a common-path interferometer comprising a diffraction grating, a Fourier lens, a pinhole, and a 2f system lens to collimate the reference beam and the imaging beam such that the collimated reference beam and imaging beam interfere with each other to form an interferogram at a final image plane.

A quantitative phase microscopy (QPM) system and methods are provided for sample imaging and metrology in both transmissive and reflective modes. The QPM system includes a first illuminating beam propagating along a transmission-mode path and a second illuminating beam propagating along a reflection-mode path, a microscope objective lens disposed in the reflection-mode path, and a common-path interferometer comprising a diffraction grating, a Fourier lens, a pinhole, and a 2f system lens to collimate the reference beam and the imaging beam such that the collimated reference beam and imaging beam interfere with each other to form an interferogram at a final image plane.

An optical system is presented for optically imaging a sample including a nanoscale object. The optical system includes an imaging lens, an illumination source configured to provide an excitation light, a detector and a substrate for supporting the sample. A sample interface, arranged to reflect the excitation light, is formed between the sample and a first side of the substrate facing the sample when the sample is applied on the substrate. The optical imaging system is arranged such that the excitation light is sent into the substrate via the imaging lens and such that the detector receives a reference light and a scattered light. The reference light comprises a part of the excitation light reflected at the sample interface and collected by the imaging lens and the scattered light comprises a part of the excitation light scattered by the nanoscale object and collected by the imaging lens. The optical system is configured such that the nanoscale object is imaged at the detector, in response to the excitation light, by an optical contrast of an interference pattern between the reference light and the scattered light. The substrate comprises an optical coating disposed on the first side of the substrate such that the sample is in contact with the optical coating when the sample is applied on the substrate. A degree of reflection of the excitation light at the sample interface is such that the optical contrast is larger compared to the optical contrast obtained with the sample interface formed without the optical coating.