A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

A structured-light projector includes a diffractive optical element (DOE) that receives a collimated light and generates a plurality of light tiles. The DOE includes a plurality of optical components disposed on a substrate, wherein the optical components of the DOE are randomly arranged on the substrate.

The present invention is to provide a projection system, a projection method, and a projection program that improve the convenience. The projection system 1 that corrects an image to be projected on a projection surface images the projection surface, detects the shape of an object existing on the imaged projection surface by image analysis, corrects an image to be projected so as to eliminate the shape of the detected object, and projects the corrected image on the projection surface.

An optical measuring device having a base for placing the measuring device and a targeting unit that is rotatable with respect to the base and defines a target axis for targeting a target object that is to be measured. The targeting unit has a first beam path for emitting optical measurement radiation in the direction of the target object that is to be measured. The targeting unit furthermore has a diffractive optical element (DOE), which is arranged or arrangeable in the beam path such that the optical measurement radiation is homogenized.

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

The present invention is to provide a projection system, a projection method, and a projection program that improve the convenience. The projection system 1 that corrects an image to be projected on a projection surface images the projection surface, detects the shape of an object existing on the imaged projection surface by image analysis, corrects an image to be projected so as to eliminate the shape of the detected object, and projects the corrected image on the projection surface.

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

A structured-light projector includes a diffractive optical element (DOE) that receives a collimated light and generates a plurality of light tiles. The DOE includes a plurality of optical components disposed on a substrate, wherein the optical components of the DOE are randomly arranged on the substrate.

An optical device includes a mirror, and a plurality of actuators configured to deform a shape of a reflecting surface of the mirror. At least some of the plurality of actuators are arranged on a plurality of concentric circles arranged in such a manner that the concentric circles are arranged denser as positions of the concentric circles are located farther from a center of the reflecting surface of the mirror, and at least some of the plurality of actuators are arranged at equal intervals in circumferential directions of the concentric circles.