A kinematically engaged yoke system (KEYS) for multiple-order-diffraction engineered material may comprise a harness comprising a frame and a plurality of semi-kinematic keys disposed on the frame, wherein the semi-kinematic keys are configured based on a MOD-side mechanical profile of a plurality of segments of a multiple-order-diffraction engineered material, and wherein the MOD-side mechanical profile, when engaged with the semi-kinematic keys, functions as a fiducial that provides alignment between neighboring segments; and one or more shims disposed between one or more pairs of neighboring segments of the plurality of segments of the multiple-order-diffraction engineered material, wherein the one or more shims facilitate alignment of the one or more pairs of neighboring segments of the plurality of segments based on a translation across one or more surfaces of the one or more shims.

Apparatus for generating a dynamic structured light pattern for optical tracking in three-dimensional space, comprises an array of lasers, such as a VCSEL laser array, to project light in a pattern into a three-dimensional space; and an optical element or elements arranged in cells. The cells are aligned with subsets of the laser array, and each cell individually applies a modulation, in particular an intensity modulation, to light from the laser or lasers of the subset, to provide a distinguishable and separately controllable part of the dynamic structured light pattern. A method of generating a structured light pattern is disclosed, in which light is provided from an array of lasers, and light is individually projected from subsets of the array of lasers to provide differentiated parts of the structured light pattern.

Apparatus for generating a dynamic structured light pattern for optical tracking in three-dimensional space, comprises an array of lasers, such as a VCSEL laser array, to project light in a pattern into a three-dimensional space; and an optical element or elements arranged in cells. The cells are aligned with subsets of the laser array, and each cell individually applies a modulation, in particular an intensity modulation, to light from the laser or lasers of the subset, to provide a distinguishable and separately controllable part of the dynamic structured light pattern. A method of generating a structured light pattern is disclosed, in which light is provided from an array of lasers, and light is individually projected from subsets of the array of lasers to provide differentiated parts of the structured light pattern.

A method of overlay error measurement includes disposing a reference pattern module over a substrate. The substrate includes first and second overlay measurement patterns in first and second locations. The reference pattern module includes first and second reference patterns. The method includes creating a first overlap of the first reference pattern with the first overlay measurement pattern and a second overlap of the second reference pattern with the second overlay measurement pattern. The method further includes determining a first overlay error between the first reference pattern of the reference pattern module and the first overlay measurement pattern of the substrate and determining a second overlay error between the second reference pattern and the second overlay measurement pattern. The method also includes determining a total overlay error between the first and second overlay measurement patterns of the substrate based on the first and second overlay errors.

In systems and methods for adjusting the position of a headset element (e.g., a display and/or other optical element), coherent light (e.g., a laser beam) is transmitted through a display of a headset to produce a diffraction pattern on a detector, which detects the diffraction pattern. The orientation of the headset element is determined based in part on the detected diffraction pattern. Based on the determined orientation and a target orientation, an adjustment to the orientation of the headset element is determined. The position of the headset element is adjusted based on the determined adjustment. This method may be repeated until the headset element is determined to be correctly oriented.

A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.

A method of overlay error measurement includes disposing a reference pattern module over a substrate. The substrate includes first and second overlay measurement patterns in first and second locations. The reference pattern module includes first and second reference patterns. The method includes creating a first overlap of the first reference pattern with the first overlay measurement pattern and a second overlap of the second reference pattern with the second overlay measurement pattern. The method further includes determining a first overlay error between the first reference pattern of the reference pattern module and the first overlay measurement pattern of the substrate and determining a second overlay error between the second reference pattern and the second overlay measurement pattern. The method also includes determining a total overlay error between the first and second overlay measurement patterns of the substrate based on the first and second overlay errors.

Fiducial patterns that produce 2D Barker code-like diffraction patterns at a camera sensor are etched or otherwise provided on a cover glass in front of a camera. 2D Barker code kernels, when cross-correlated with the diffraction patterns captured in images by the camera, provide sharp cross-correlation peaks. Misalignment of the cover glass with respect to the camera can be derived by detecting shifts in the location of the detected peaks with respect to calibrated locations. Devices that include multiple cameras behind a cover glass with one or more fiducials on the cover glass in front of each camera are also described. The diffraction patterns caused by the fiducials at the various cameras may be analyzed to detect movement or distortion of the cover glass in multiple degrees of freedom.

A method of fabricating a shadow mask includes depositing a chrome etch mask layer on a substrate. The substrate includes a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer. The method also includes forming a patterning layer including a pattern on the chrome etch mask layer, etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer, and etching the pattern of the chrome etch mask layer into the single crystal silicon layer. The method further includes patterning the backside oxide layer, etching the silicon handle wafer using the patterned backside oxide layer, removing the buried oxide layer, and removing remaining portions of the patterned chrome etch mask layer and the patterning layer.

Provided is an optical structure 100 that includes: a polarizing beam splitter A which splits input light input from an incoming plane thereof into first polarized light and second polarized light and in which split angles, which are angles formed by traveling directions of rays of the first polarized light and traveling directions of rays of the second polarized light, are acute angles; and a diffractive optical element B which is disposed at a stage subsequent to the polarizing beam splitter A and has a plurality of light transmission regions separated at a prescribed pitch. Since the diffractive optical element B having a prescribed pitch is used, the diffractive optical element B can perform deflection while having a smaller size than a Wollaston prism, and application to various fields is expected.