A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.

An illumination device includes a light source and a rod-like light guide extending in a longitudinal direction for guiding incident light to an object to be illuminated. The light source is disposed at an end of the light guide extending in a longitudinal direction. The light guide includes an incident surface at the longitudinal end to receive light emitted from the light source, a flat emission surface to emit light incident on the light guide toward the object to be illuminated, a parabolic reflective surface to reflect, toward the emission surface, light from a focus of the paraboloid shape of the refractive surface or light passing through the focus from a predetermined area, and a light-scattering portion, having a predetermined area, to scatter light entering through the incident surface and reflect the light toward the reflective surface. The light-scattering portion is placed at the focus of the paraboloid shape or at a position where light reflected by the scattering area on the light-scattering portion passes through the focus.

A reading module has a light source, an optical system having a mirror array and an aperture stop portion, a sensor in which a plurality of image regions where the image light is converted into an electrical signal are arranged; a housing; and a light-shielding wall shielding stray light striking the image regions. In the mirror array, a plurality of reflective mirrors whose reflection surfaces are aspherical concave surfaces are coupled together in an array in the main scanning direction. The optical system is fixed to on the case housing at one point in the main scanning direction, and the light shielding walls are arranged at a positions displaced deviated by a predetermined amount from boundaries between the image regions in the direction opposite to the fixed side of the optical system.

A reading module has a light source, an optical system having a mirror array and an aperture stop portion, a sensor in which a plurality of image regions where the image light is converted into an electrical signal are arranged; a housing; and a light-shielding wall shielding stray light striking the image regions. In the mirror array, a plurality of reflective mirrors whose reflection surfaces are aspherical concave surfaces are coupled together in an array in the main scanning direction. The optical system is fixed to on the case housing at one point in the main scanning direction, and the light shielding walls are arranged at a positions displaced deviated by a predetermined amount from boundaries between the image regions in the direction opposite to the fixed side of the optical system.

In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.

A lithography system has a projection lens that includes a first optical element and a first sensor subframe. The projection lens also includes first sensor which is configured to detect a position of the first optical element with respect to the first sensor subframe. The projection lens further includes a second sensor which is configured to detect a position of a wafer with respect to the first sensor subframe.

A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.

A method of and an apparatus for use in determining one or more alignment properties of an illumination beam of radiation emitted by a radiation source are provided. The illumination beam is for irradiating a target area on a substrate in a metrology apparatus. The method comprises: (a) obtaining a first set of intensity data; (b) obtaining a second set of intensity data; (c) processing said first and second sets of intensity data to determine said one or more alignment properties of said illumination beam of radiation; wherein said processing involves comparing said first and second sets of intensity data to calculate a value which is indicative of a translation of said illumination beam of radiation.

A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second state in which incident light is given a phase change amount of 180 () become arrayed in a checkered pattern; guiding light having passed the inspection target area to a projection optical system with a resolution limit coarser than a width of an image of one mirror element, to form a spatial image; and inspecting a characteristic of the spatial light modulator from the spatial image. This method allows us to readily perform the inspection of the characteristic of the spatial light modulator having the array of optical elements.

Illumination optical unit for illuminating an object field in a projection exposure apparatus, comprising a first facet mirror with a structure, which has a spatial frequency of at least 0.2 mm.sup.1 in at least one direction, and a second facet mirror, comprising a multiplicity of facets, wherein the facets are respectively provided with a mechanism for damping spatial frequencies of the structure of the first facet mirror.