Anti-slip components are made from a polymeric composition that comprises a fluoroelastomer doped with a transition metal ceramic. The fluoroelastomer has excellent chemical resistance and thermal resistance, and the transition metal ceramic increases the static coefficient of friction for the polymeric composition. The anti-slip components are especially suitable for material handling systems that may be exposed to harsh environments in a photolithographic patterning system.

A developing apparatus includes: a first nozzle including a first discharge port for a developing solution extending in a direction covering a width of a substrate; a moving mechanism that causes a first state where the first nozzle moves in a direction intersecting with an extending direction of the first discharge port discharging the developing solution; a first liquid contact surface that is in contact with a liquid film of the developing solution formed on the substrate in the first state; a second nozzle including a second discharge port for the developing solution; a rotation mechanism that rotates the substrate to cause a second state where the substrate rotates when the second discharge port is discharge the developing solution; and a second liquid contact surface that is in contact with the liquid film of the developing solution formed on the substrate in the second state.

The present application relates to a developing apparatus. The developing apparatus comprises a housing; a wafer support disposed within the housing and for holding a wafer; a semipermeable diaphragm disposed within the housing and separating the housing into an upper housing defining an upper chamber and a lower housing defining a low chamber, wherein the semipermeable diaphragm is semipermeable to moisture such that moisture is allowed to move from the lower chamber to the upper chamber, but liquid drops are prohibited to move from the upper chamber to the lower chamber; and a nozzle assembly disposed above the wafer support and for spraying at least developer to the wafer support.

The present application relates to a developing apparatus. The developing apparatus comprises a housing; a wafer support disposed within the housing and for holding a wafer; a semipermeable diaphragm disposed within the housing and separating the housing into an upper housing defining an upper chamber and a lower housing defining a low chamber, wherein the semipermeable diaphragm is semipermeable to moisture such that moisture is allowed to move from the lower chamber to the upper chamber, but liquid drops are prohibited to move from the upper chamber to the lower chamber; and a nozzle assembly disposed above the wafer support and for spraying at least developer to the wafer support.

A spin coater may include a spin chuck, a nozzle, a first temperature controller and a second temperature controller. The spin chuck may be configured make contact with a central portion of a lower surface of a substrate and may be configured to rotate the substrate when photoresist is on the substrate. The nozzle may be arranged over a central portion of the spin chuck and configured to provide a central portion of an upper surface of the substrate with photoresist. The first temperature controller may be configured to control a temperature in a first region of the spin chuck. The second temperature controller may be configured to control a temperature in a second region of the spin chuck.