A source for generating extreme ultraviolet (EUV) radiation includes a chamber enclosing a low pressure environment. A gas inlet is configured to provide a cleaning gas in the chamber. A plurality of exhaust ports, each having a corresponding gate valve including a scanner gate valve corresponding to an exhaust port separating the chamber from an EUV scanner are provided to the chamber. A pressure sensor is disposed inside the chamber and adjacent to the scanner gate valve. A controller is configured to control the gate valves other than the scanner gate valve based on an output of the pressure sensor.

The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 m.sup.2 to 50 m.sup.2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.

A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 450.2. The light is in at least one plane orthogonal to the surface.

A photocurable composition including a fluorine-based polymeric monomer, a (meth)acrylate monomer, and a photoinitiator. An amount of the fluorine-based polymeric monomer is in a range of about 20 parts to less than 40 parts by weight based on 100 parts by weight of the photocurable composition.

A substrate processing apparatus according to the present disclosure includes: a nozzle that ejects a processing liquid to a wafer; a force-feeding unit that force-feeds the processing liquid to the nozzle side; a liquid feeding pipeline that includes first and second valves and guides the processing liquid from the force-feeding unit to the nozzle; and a controller. The controller is configured to perform opening the first valve in a state where the second valve is closed and a pressure between the first and second valves is higher than a pressure between the force-feeding unit and the first valve, controlling the force-feeding unit to increase the pressure between the first and second valves that has been decreased by the opening of the first valve, and opening the second valve after the pressure between the first and second valves is decreased by the opening of the first valve.

The invention relates to the field of materials technology and provides a modified nano-silica and a method for preparing the same, a pigment dispersion and a photosensitive resin composition, so as to solve the problem that conventional nano-silica cannot crosslink with other polymeric materials, and pigment dispersions are apt to aggregate and have a poor film-forming property. The modified nano-silica according to the invention has unsaturated double bonds on the surface thereof and can crosslink with other polymeric materials, such that the pigment dispersion comprising the modified nano-silica can effectively prevent agglomeration and has a good film-forming property, and the photosensitive resin composition comprising the pigment dispersion can reduce the thermal expansion of a film made thereby, as well as the occurrence of shrinkage and collapse phenomena in the surface of the film, and enhance the heat-resistance, chemical-resistance, mechanical properties and abrasion-resistance of the film.

A photocurable composition including a fluorine-based polymeric monomer, a (meth)acrylate monomer, and a photoinitiator. An amount of the fluorine-based polymeric monomer is in a range of about 20 parts to less than 40 parts by weight based on 100 parts by weight of the photocurable composition.

The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

The invention relates to a method for producing a structure with spatial encoded functionality, the method comprising: providing in a volume (114) a first photosensitive material (116) that is two-photon crosslinking compatible, generating in the volume (114) a framework of crosslinked first photo-sensitive material (116), the generating of the framework comprising exposing the first photosensitive material (116) with a first focused laser beam (118) according to a first pattern for specifically initiating a two-photon crosslinking of the first photosensitive material (116) in accordance with the first pattern, removing from the volume (114) any remaining non-crosslinked portions of the first photosensitive material (116), providing to the volume (114) a second photosensitive material (116) that is two-photon crosslinking compatible, generating in the volume (114) the structure, the generating of the structure comprising exposing the second photosensitive material (116) with a second focused laser beam (118) according to a second pattern for specifically initiating a two-photon crosslinking of predefined surface portions of the framework and the second photosensitive material (116) in accordance with the second pattern, removing from the volume (114) any remaining non-crosslinked portions of the second photosensitive material (116).