Provided is a photosensitive resin composition comprising a thermoplastic elastomer (A), a liquid farnesene rubber (B), an ethylenically unsaturated compound (C), and a photoinitiator (D).

A highly fluorinated photoresist employing a photodimerization chemistry and a method for manufacturing an organic light emitting diode display using the same. The photoresist includes a copolymer that is made from two different monomers. When the copolymer is used as a photoresist, the photoresist has the characteristic that it becomes insoluble when exposed to an ultraviolet light having a wavelength of 365 nm.

A positive-working lithographic printing plate includes a support having a hydrophilic surface or a hydrophilic layer, and a heat- and/or light-sensitive coating provided including at least two different (ethylene vinyl) acetal copolymer including a plurality of ethylenic moieties A having a structure according to the following formula:

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wherein R.sup.2 and R.sup.3 independently represent hydrogen, a halogen or an optionally substituted linear, branched, or cyclic alk(en)yl group, or an optionally substituted aromatic or heteroaromatic group.

Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R.sub.1 to R.sub.7, m.sub.1 to m.sub.4, n.sub.1, n.sub.2, Y and W are each as defined in the description.

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A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.

A photosensitive resin composition is prepared by dispersing at least one of a hydrophobic polymer and a mixture of an oil-soluble photopolymerization initiator and a water-insoluble or sparingly water-soluble compound having at least one photoactive, ethylenically unsaturated group in an aqueous solution that contains both a water-soluble polymer and a diazo resin is obtained by condensing a water-soluble salt of an optionally substituted 4-diazodiphenylamine with formaldehyde in the presence of sulfuric acid and phosphoric acid. This photosensitive resin composition gives a photosensitive film having excellent stability over time and a wide exposure latitude. By adding a specific fluorine compound to the photosensitive resin composition, a screen plate has an excellent discharge performance.

Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R.sub.1 to R.sub.7, m.sub.1 to m.sub.4, n.sub.1, n.sub.2, Y and W are each as defined in the description. ##STR00001##

Flexible multi-resonant plasmonic sheets, flexible microporous multi-resonant meshes, and dissolvable template-based hierarchical imprinting fabrication methods are described. A method of manufacture of a flexible microporous multi-resonant plasmonics mesh (MMPM) is described in one example. The method includes depositing alternating metal and insulating layers on a solvent-soluble nanowell array, to form a nanolaminate plasmonic crystal (NLPC) array on the solvent-soluble nanowell array. The method also includes pressing a hydrophobic curable resist over the NLPC array and the solvent-soluble nanowell array, using a watersoluble micropillar array as a working stamp for the pressing, curing the hydrophobic curable resist into a flexible scaffold, and dissolving the water-soluble micropillar array in water. The dissolving exposes a first side of the flexible scaffold, with the solvent-soluble nanowell array supporting a second side of the flexible scaffold. The method also includes dissolving the solvent-soluble nanowell array in a solvent, and separating the solvent-soluble nanowell array from the NLPC array and the flexible scaffold.

An object of the present invention is to provide a composition with which a film having excellent cycle thermo characteristics can be formed, a transfer film, a manufacturing method of a laminate, a laminate, and a manufacturing method of a semiconductor package. The composition of the present invention contains a resin X including at least one selected from the group consisting of a polyimide precursor, a polyimide, a polybenzoxazole precursor, and a polybenzoxazole, and a filler, in which a content of the filler is 50.0% by mass or more with respect to a total solid content of the composition, and an average particle diameter of the filler is 300 nm or less.

A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is useful to pattern circuits by visible light.