The present invention is a substrate for a display, the substrate having a film B including a polysiloxane resin on at least one surface of a film A including a polyimide resin, wherein the film B contains inorganic oxide particles therein, and the present invention has an object to provide a substrate for a display: being able to be applied to a color filter, an organic EL element, or the like without the need to carry out any complex operations; allowing high-definition displays to be manufactured; and being provided with a low CTE, a low birefringence, and flexibility.

The present invention aims to provide a flexographic printing original plate which exhibits improved sustainability of the ability of preventing the plate surface from staining. According to the present invention, there is provided a water-developable flexographic printing original plate including at least a support and a photosensitive resin layer provided on the support, in which the photosensitive resin layer contains a water-dispersible latex, a photopolymerizable unsaturated compound, a photopolymerization initiator, and a silicone compound. When the water-dispersible latex is one or more latex rubbers selected from the group consisting of polybutadiene rubber and poly(nitrile-butadiene) rubber, the silicone compound is a silicone compound having an amino group in the molecule and has a refractive index of 1.44 to 1.60. When the water-dispersible latex is poly(styrene-butadiene) rubber, the silicone compound is a silicone compound having an amino group in the molecule and has a refractive index of 1.47 to 1.63.

A positive photosensitive resin composition according to the present invention contains at least (A) a polysiloxane compound having at least a structural unit of the general formula (1), (B) a photoacid generator or quinone diazide compound and (C) a solvent
[(R.sup.X).sub.bR.sup.1.sub.mSiO.sub.n/2]  (1)
where R.sup.X represents the following group; R.sup.1 each represents a hydrogen atom, C.sub.1-C.sub.3 alkyl group, phenyl group, hydroxy group, C.sub.1-C.sub.3 alkoxy group or C.sub.1-C.sub.3 fluoroalkyl group; b represents an integer of 1 to 3; m represents an integer of 0 to 2; n represents an integer of 1 to 3; and b, m and n satisfy b+m+n=4, ##STR00001##
where X each represents a hydrogen atom or acid labile group; and a represents an integer of 1 to 5. It is possible by the use of this positive photosensitive resin composition to provide a film with high resistance and heat-resistant transparency and provide an electronic component with such a film.

A method for manufacturing a semiconductor apparatus, including preparing a first substrate provided with a pad optionally having a plug and a second substrate or device provided with a plug, forming a solder ball on at least one of the pad or plug of first substrate and the plug of second substrate or device, covering at least one of a pad-forming surface of first substrate and a plug-forming surface of second substrate or device with a photosensitive insulating layer, forming an opening on the pad or plug of the substrate or device that has been covered with photosensitive insulating layer by lithography, pressure-bonding the second substrate or device's plug to the pad or plug of first substrate with the solder ball through the opening, electrically connecting pad or plug of first substrate to second substrate or device's plug by baking, and curing photosensitive insulating layer by baking.

A composition for nanoimprinting including a siloxane polymer which includes a polymerizable group polymerized by irradiation with light; a polymerization initiator; and a fluorine-containing polymeric compound in which the fluorine-containing polymeric compound has a constituent unit represented by the following formula (f1-1) in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf.sup.102 and Rf.sup.103 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Rf.sup.102 and Rf.sup.103 may be the same as or different from each other, nf.sup.1 represents an integer of 1 to 5, and Rf.sup.101 represents an organic group including a fluorine atom. ##STR00001##

Disclosed is a method for manufacturing a semiconductor device, including a step of yielding a pattern 2a of a polysiloxane-containing composition over a substrate 1, and a step of forming an ion impurity region 6 in the substrate, wherein, after the step of forming an ion impurity region, the method further includes a step of firing the pattern at a temperature of 300 to 1,500° C. This method makes it possible that after the formation of the ion impurity region in the semiconductor substrate, the pattern 2a of the polysiloxane-containing composition is easily removed without leaving any residual. Thus, the yield in the production of a semiconductor device can be improved and the tact time can be shortened.

In microelectronic applications, it is often desired to deposit and pattern a permanent dielectric film in order to electrically and mechanically isolate components. Photo-patternable dielectrics are attractive for these uses because of their reduced time and cost requirements. These permanent dielectrics should be high-speed, positive-tone, and aqueous-developable. This type of patternability may be achieved by using a chemically amplified deprotection reaction of tert-butoxycarbonate or tert-butyl acrylate catalyzed by a photo-inducible acid. Provided herein are: a composition for preparing a dielectric film comprising a polymer mixture, wherein the polymer mixture comprises a base polymer comprising a pendent protected organic functionality, a photocatalyst for deprotecting the protected organic functionality and a chemical cross-linker for cross-linking the dielectric film after a photo-patterning has taken place in an aqueous solution; a dielectric film prepared from said composition; and method of preparing a dielectric film.

The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).

##STR00001##

The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.

A photosensitive resin composition, an organic light emitting display device, and method for manufacturing an organic light emitting device, the composition including a photosensitive compound; a solvent; and a silsesquioxane-based copolymer, the silsesquioxane-based copolymer being obtained by copolymerizing a compound represented by the following Chemical Formula 1 with at least one of a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3;

R.sub.1-R.sub.2—Si(R.sub.3).sub.3  [Chemical Formula 1]

R.sub.4—Si(R.sub.5).sub.3  [Chemical Formula 2]

Si(R.sub.6).sub.4.  [Chemical Formula 3]