A method and apparatus to expose photosensitive printing plates with a predetermined radiation density from the main side (top) and a predetermined radiation density from the back side (bottom). The method comprises executing the main exposure with a time delay after the back exposure. The time delay between back exposure and main exposure is optimized to create smaller stable single dot elements on the photosensitive printing plate after processing and smaller single element dot sizes printed on the print substrate. The plate floor may be adjusted by performing a back-side-only exposure prior to executing the combined back and main exposure with the time delay.

The present invention provides a method for manufacturing a thin film transistor including processing of irradiating an amorphous silicon film 8 deposited on a substrate with laser light. The method comprises: a laser annealing step for forming a polysilicon film 9 including a channel region 52 by irradiating an area including a formation region of the region 52 in the film 8 with the laser light such that the area including the formation region is heated, melted, and recrystallized; and a removing step for etching off an area outside the region 52 from the polysilicon film 9. Thus, the present invention can provide a method for manufacturing a thin film transistor and a mask for use in the manufacturing method that are capable of promoting the recrystallization of the film 8 and thereby improving its electron mobility even when laser irradiation has to be performed under restricted irradiation conditions.

A fiber-based sensor and a method of forming a fiber-based sensor using microsphere lithography techniques in which a microsphere array is applied to a surface of a tip of an optical fiber to provide for microsphere lithography fabrication of a desired pattern on the tip of the optical fiber. The characteristics of the pattern define sensing capabilities of the sensor to provide for chemical and/or biological sensing.

A method for manufacturing a display panel includes: providing a first substrate and an exposure system, wherein the exposure system includes a light source module and a first shielding unit; disposing the first shielding unit at a position between the first substrate and the light source module in the initial state; moving the first shielding unit along a first direction; moving the light source module to pass through the first shielding unit along a second direction different from the first direction, and exposing the first substrate to the light emitted by the light source module; moving the light source module along the opposite direction of the second direction; and moving the first shielding unit back to the position between the first substrate and the light source module along the opposite direction of the first direction.

A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.

A method of creating an image film negative capable of masking non-image areas of one or more layers of liquid photopolymer during a step of imagewise exposing the one or more layers of liquid photopolymer to actinic radiation. The method includes the steps of (a) providing an image film negative comprising a negative of an image on the image film negative, wherein the negative of the image comprises a pattern of opaque areas; and (b) inkjet printing a filtering layer on portions of the image film negative not covered by the pattern of opaque areas, wherein the portions of the image film negative comprise portions where it is desirable to modulate intensity of actinic radiation in a subsequent exposure step.

A method and apparatus to expose photosensitive printing plates with a predetermined radiation density from the main side (top) and a predetermined radiation density from the back side (bottom). The method comprises executing the main exposure with a time delay after the back exposure. The time delay between back exposure and main exposure is optimized to create smaller stable single dot elements on the photosensitive printing plate after processing and smaller single element dot sizes printed on the print substrate. The plate floor may be adjusted by performing a back-side-only exposure prior to executing the combined back and main exposure with the time delay.

A device and method for producing light-exposed structures on a workpiece having a light-sensitive surface. An optical unit includes a light source and a diffraction grating for producing a strip-shaped illumination pattern having strips extending in a longitudinal direction and having a pattern width extending transversely. A device moves the surface of the workpiece and optical unit relative to each other according to a path sequence, which includes movement longitudinal paths to produce a first and second light-exposed structure having strips, which is oriented parallel to each other on the workpiece surface. The movement paths are mutually spaced apart by less than the pattern width and the light-exposed structures overlap in such a way that strips of the light-exposed structures lie on each other. To obtain good light exposure of the surface by the illumination pattern, the diffraction grating is set oblique to the surface of the workpiece that is light-exposed by the illumination pattern.

A system for forming a micro-truss structure including a reservoir having walls and a flat bottom configured to hold a volume of a liquid photomonomer configured to form a photopolymer when exposed to light, a partially transparent mask secured to, or being, the bottom of the reservoir, a release layer on the mask configured to resist adhesion by the photopolymer, and a blocker positioned a first distance below the mask. The system also includes a light source positioned below the blocker configured to produce collimated light suitable for causing conversion of the photomonomer into the photopolymer, and to which the blocker is opaque, and a first mirror, oblique to the blocker, configured to reflect the light from the light source around the blocker and through the mask and into the reservoir. The blocker is positioned to block a straight path of light from the light source to the mask.

The present disclosure is directed to photosensitive compositions Fischer-type ruthenium carbene catalysts containing chelated 2,2-bipyridine ligands and methods of using the same. These catalysts are surprisingly active even when using relatively low intensity diode light sources. The 2,2-bipyridine-chelated ruthenium photocatalysts show reactivity at substantially lower exposure levels than other photoactive chelating dinitrogen ligands of similar structure. The present disclosure is further directed to novel photosensitive compositions, their use as photoresists, and methods related to patterning polymer layers on substrates.