A litho-litho-etch double patterning method including forming a resist layer by coating a substrate with a resist composition; exposing the resist layer to a first radiant energy density of UV rays; forming a first pattern in the resist layer by developing the resist layer with a positive developer; exposing the resist layer to a second radiant energy density of UV rays; and forming a second pattern in the resist layer by developing the resist layer with a negative developer, the second pattern including one or more features of the first pattern.

Provided is a photosensitive composition capable of Ruining a pattern having excellent rectangularity and solvent resistance. Provided are also a cured film, a pattern forming method, a color filter, a solid-state imaging element, and an image display device. This photosensitive composition includes a white or colorless pigment A, an alkali-soluble resin B, a polymerizable compound C having an ethylenically unsaturated double bond, a photopolymerization initiator D1 having a light absorption coefficient of 1.010.sup.3 mL/gcm or more at a wavelength of 365 nm in methanol, and a photopolymerization initiator D2 having a light absorption coefficient of 1.010.sup.2 mL/gcm or less at a wavelength of 365 nm in methanol and a light absorption coefficient of 1.010.sup.3 mL/gcm or more at a wavelength of 254 nm, in which the mass ratio of the photopolymerization initiator D1 to the photopolymerization initiator D2 is photopolymerization initiator D1:photopolymerization initiator D2=90:10 to 40:60.

A wavelength tuning system determines a temperature calibrated to a DOE of a structured light (SL) projector. The wavelength tuning system includes a camera and controller. The camera captures images of a SL pattern projected by the SL projector. The controller generates tuning instruction. The tuning instructions cause a wavelength regulator of the SL projector to set a light source of the SL projector to different temperatures. The tuning instruction also cause the camera to capture images of the structured light pattern at each of the different temperatures. Using at least some of the captured images, the controller determines the temperature calibrated to the DOE. In one embodiment, the temperature calibrated to the DOE corresponds to a wavelength of light emitted by the light source that result in an estimated minimum power of a zeroth order diffracted beam of the SL pattern.

A litho-litho-etch double patterning method including forming a resist layer by coating a substrate with a resist composition; exposing the resist layer to a first radiant energy density of UV rays; forming a first pattern in the resist layer by developing the resist layer with a positive developer; exposing the resist layer to a second radiant energy density of UV rays; and forming a second pattern in the resist layer by developing the resist layer with a negative developer, the second pattern including one or more features of the first pattern.

The present invention provides a TFT substrate manufacturing method. The method uses a photoresist material that contains crystallizable and precipitatable pigment to form a photoresist layer, so that a plurality of crystallization burrs can be formed on a surface of the photoresist layer, making it possible for a pixel electrode film not completely covering the surface of the photoresist layer and thus, allowing a peeling agent to pass through the crystallization burrs and penetrate into the photoresist layer to cause corrosion of the photoresist layer thereby peeling off the photoresist layer and a portion of the pixel electrode film located on the photoresist layer at the same time to form a pixel electrode, whereby, compared to the prior art, peeling can be conducted without adopting a special mask and involving special mask parameters and also requiring no plasma treatment so that the process of fabricating a TFT substrate can be simplified to enhance fabrication efficiency of the TFT substrate.

Provided are a photomask and a method of manufacturing a color filter substrate. This belongs to the field of display technologies, and can be used to simplify manufacturing process of the color filter substrate and improve manufacturing efficiency of the color filter substrate.

A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.

A process of forming a three-dimensional micro component includes the step of forming a three-dimensional (3D) geometry contour within a photoresist material using two-photon absorption polymerization. The three-dimensional geometry contour forms a cross-linked polymeric contour defining an outer surface portion of a micro component upon baking of the three-dimensional geometry portion formed in the photoresist. Another step involves applying a UV (ultraviolet) polymerization process so as to cross-link polymeric material of the photoresist adjacent the three-dimensional geometry contour.

A method for producing flexographic printing plates, using a photopolymerizable flexographic printing element having, arranged one atop another, a dimensionally stable support, a photopolymerizable, relief-forming layer, an elastomeric binder, an ethylenically unsaturated compound, and a photoinitiator, and optionally a rough, UV-transparent layer, a particulate substance, and digitally imagable layer. The method includes: (a) producing a mask by imaging the digitally imagable layer, (b) exposing the photopolymerizable, relief-forming layer through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photpolymerized layer by washing out the unphotopolymerized regions of the relief-forming layer with an organic solvent, or by thermal development. Step (b) includes (1) exposure with actinic light with an intensity of 100 mW/cm2 from a plurality of UV-LEDs and (2) exposure with actinic light with an intensity of <100 mW/cm2 from a UV radiation source other than UV-LEDs.

A method for performing DBO measurements utilizing apertures having a single pole includes using a first aperture plate to measure X-axis diffraction of a composite grating. In some embodiments, the first aperture plate has a first pair of radiation-transmitting regions disposed along a first diametrical axis and on opposite sides of an optical axis that is aligned with a center of the first aperture plate. Thereafter, in some embodiments, a second aperture plate, which is complementary to the first aperture plate, is used to measure Y-axis diffraction of the composite grating. By way of example, the second aperture plate has a second pair of radiation-transmitting regions disposed along a second diametrical axis and on opposite sides of the optical axis. In some cases, the second diametrical axis is substantially perpendicular to the first diametrical axis.