A method of manufacturing a display panel substrate having a semiconductor element includes a film forming step of forming a thin film, a resist film forming step of forming a positive resist film on the thin film, a first exposure step of selectively exposing a resist film via a photomask including a pattern of the semiconductor element, a second exposure step of selectively exposing the resist film by scanning and irradiating the resist film with light along an outline shape of the display panel substrate, a developing step of developing the resist film to remove the resist film exposed in the first and second exposure steps and form a resist pattern on the thin film, an etching step of etching the thin film using the resist pattern as a mask, and forming a thin-film pattern by selectively removing the thin film, and a peeling step of peeling the resist pattern.

A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.

An extreme ultraviolet lithography (EUVL) method includes providing at least two phase-shifting mask areas having a same pattern. A resist layer is formed over a substrate. An optimum exposure dose of the resist layer is determined, and a latent image is formed on a same area of the resist layer by a multiple exposure process. The multiple exposure process includes a plurality of exposure processes and each of the plurality of exposure processes uses a different phase-shifting mask area from the at least two phase-shifting mask areas having a same pattern.

Apparatus, method, and system for exposing a photosensitive printing plate to radiation, including a plurality of LED point sources configured to emit UV light. The plurality of LED point sources in at least one of a front side set or back side set are controllable in subsets smaller than an entirety of the collective irradiation field corresponding to the respective set. A holder receives the printing plate in a stationary position to receive incident radiation and a controller is configured to control the plurality of LED source subsets. A first LED point source subset is configured to be controlled at a first intensity differing by a factor relative to a second intensity of a second LED point source subset to give the radiation emitted by the respective set an intended degree of homogeneity.

An illumination system includes a light source used to generate a light and an opaque plate. The opaque plate is disposed between the light source and a photomask and includes an annular aperture and an aperture dipole. The annular aperture has an inner side and an outer side. The aperture dipole includes at least one first aperture and at least one second aperture. The first aperture and the second aperture connected to the annular aperture respectively and protruding out from the outer side of the annular aperture are disposed symmetrically with respect to a center of the annular aperture.

A method for forming a pattern on a substrate is described. The method includes providing a substrate, forming a photosensitive layer over the substrate, exposing the photosensitive layer to a first exposure energy through a first mask, exposing the photosensitive layer to a second exposure energy through a second mask, baking the photosensitive layer, and developing the exposed photosensitive layer. The photosensitive layer includes a polymer that turns soluble to a developer solution, at least one photo-acid generator (PAG), and at least one photo-base generator (PBG). A portion of the layer exposed to the second exposure energy overlaps with a portion exposed to the first exposure energy.

Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.

A hydrogel material composition includes: (1) an alginate (or other cross-linking polymer) material; (2) an optional α-hydroxy carboxylate material; and (3) an iron cation material. The hydrogel material composition with or without the α-hydroxy-carboxylate material may be used in a photolithographic imaging application or a photorelease application within the context of a photoirradiation induced reduction/oxidation reaction of an iron (III) cation material to form an iron (II) cation material.

A stretchable transparency-adjusting film includes an inner elastic part having a three-dimensional network shape and including a first elastomer, an inorganic thin film surrounding the inner elastic part, and an outer elastic part surrounding the inorganic thin film and including a second elastomer. A scattering unit defined by the inner elastic part, the inorganic thin film and the outer elastic part in a cross-section is orientated in an inclined direction to a vertical direction and a horizontal direction.

A display device and a manufacturing method thereof are provided. The display device includes a display area and a non-display area. The display device includes a substrate, an element layer, an electrode pattern layer, a photoresist pattern layer, and a light-emitting element. The element layer is disposed on the substrate. The electrode pattern layer is disposed on the element layer, and the electrode pattern layer includes multiple electrodes. The photoresist pattern layer is disposed on the electrode pattern layer, and the photoresist pattern layer includes a first photoresist pattern disposed corresponding to the display area and corresponding to the electrodes; a second photoresist pattern disposed corresponding to the non-display area and between the electrodes. The light-emitting element is disposed on the photoresist pattern layer and is electrically connected to the electrodes of the electrode pattern layer.