Provided are an integrated super-resolution laser direct-writing device and a direct-writing method. The integrated super-resolution laser direct-writing device includes a first continuous laser, a first optical fiber coupler, a mono-mode optical fiber, a second continuous laser, a second optical fiber coupler, a first annular photonic crystal fiber, a bifurcated optical fiber, a lens group, a first dichroic mirror, an LED light source, a lens, a second dichroic mirror, an auto-focusing module, a third dichroic mirror, a third optical fiber coupler, a square-law graded index fiber, a nanometer displacement table, a second lens, a CMOS camera and a control system. According to the present invention, an original large direct-writing device based on a free optical path can achieve optical fibers of key devices and integration of systems and can be better applied to the field of laser direct-writing.

The invention provides a light generating method and system, the method including: generating first light, the first light being capable of forming a first area, a second area, and a third area, and intensity of the first light in the first area being higher than that in the second area and the third area, respectively; generating second light, the second light being capable of simultaneously irradiating the first area and the second area; generating third light, the third light being capable of simultaneously irradiating the first area and the third area; and controlling intensity of the second light and the third light, respectively. The light generating method and system provided by the invention can not only generate light having a super-resolution that may approach infinitesimal in theory but also employ light output by a laser as the only original light source, featuring extremely low costs and freedom from the diffraction limit of the light source, showing a great prospect of applications in the field of lithography.

A resist composition comprising a base polymer and a quencher in the form of an ammonium salt compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

In this work is presented a method for fabrication of high-aspect ratio structures through spalling effect. The spalling is achieved through lithography, etching and sputtering processes, thus providing the flexibility to position the spalled structures according to the application requirements. This method has been successfully demonstrated for metal-oxides and metals. The width of the fabricated structures is dependent on the thickness of the film deposited by sputtering, where structures as small as 20 nm in width have been obtained.

A method of fabricating a refractive optical element on a substrate may provide less expensive and more compact optics for an X-ray system. The method includes coating the substrate with a resin and providing radiation to a portion of the resin to cause two photon polymerization of the resin. The method further includes forming, by two photon polymerization, a first surface of a polymer refractive optical element from the resin. The first surface is disposed along an optical axis of the refractive optical element and the first surface has a roughness of less than 100 nanometers. Further, the method includes forming, by two photon polymerization, a second surface of the polymer refractive optical element. The second surface is disposed along the optical axis of the refractive optical element and the second surface has a roughness of less than 100 nanometers.

An apparatus is provided configured to manufacture an article using a multi-layer/laminated photoresist comprising a plurality of layers of photoresist material, where at least a first layer of photoresist material has a first sensitivity to radiation, and at least a second layer of photoresist material has a different sensitivity to radiation. The apparatus comprises: a. a housing configured to receive the photoresist and locate the photoresist in at least one operational position in the housing; b. an exposure system configured to emit radiation which is incident on the photoresist when in the operational position; wherein: i. the exposure system is configured to emit radiation having a first radiation characteristic to induce a change in one or more properties of the area(s) of the first layer of photoresist material exposed to the radiation; and wherein ii. the first radiation characteristic is configured not to induce a change, or to induce a different change, in one or more properties of at least a different one of the layers of photoresist material. Consequently complex articles can be manufactured including hidden or partially visible features, such as overhangs for example.

The present disclosure discloses a method and apparatus for preparing a femtosecond optical filament interference direct writing volume grating/chirped volume grating. The method is characterized in that optical filaments are formed in glass by using femtosecond pulse laser, and plasma is controlled to quickly scan in the glass and etch a volume grating or chirped volume grating structure by adjusting the focal length of convex lens, laser energy and movement of motor machine. The apparatus includes a femtosecond pulse laser module, a pulse chirp management module, a pulse time domain shaping module, a laser separation and interference module, a glass volume grating processing platform module and a camera online imaging module.

Disclosed herein are methods for patterning two-dimensional atomic layer materials, the methods comprising: illuminating a first location of an optothermal substrate with electromagnetic radiation, wherein the optothermal substrate converts at least a portion of the electromagnetic radiation into thermal energy, and wherein the optothermal substrate is in thermal contact with a two-dimensional atomic layer material; thereby: generating an ablation region at a location of the two-dimensional atomic layer material proximate to the first location of the optothermal substrate, wherein at least a portion of the ablation region has a temperature sufficient to ablate at least a portion of the two-dimensional atomic layer material within the ablation region, thereby patterning the two-dimensional atomic layer material. Also disclosed herein are systems for performing the methods described herein, patterned two-dimensional atomic layer materials made by the methods described herein and methods of use thereof.

The present invention relates to a method for producing a three-dimensional object comprising the following operations: a. introducing a composition (11) into a polymerization vessel (9), b. polymerizing the composition (11) by multiphoton photopolymerization, at predetermined locations, in order to produce the three-dimensional object (3), the composition (11) comprising at least one monomer, at least one filler and at least one photoinitiator, —characterized in that: the difference between the refractive indices of the monomer and of the filler present is less than 0.05; —the viscosity of the composition (11) is greater than or equal to 0.05 Pa.Math.s; —the composition (11) is transparent to the photopolymerization wavelength.

A device performs laser-assisted processing of a material adhering to a substrate or of a substrate associated or substrate-free body or of its surface. The device has a positioning system enabling three translational and three rotational degrees of freedom and having a sample holder. The sample holder holds the substrate to which the material to be processed adheres or to which the body to be processed is associated or, in the absence of a substrate, the body to be processed. The device has a laser source emitting laser pulses and focusing optics which shape the laser pulses such that they impinge in a focal point or a focal volume in the region of the material or body to be processed in such a way that a two-photon or multi-photon polymerization takes place.