Embodiments of the present disclosure include devices, and methods of making such devices, for delivery of one or more active agents with short or long zero-order release kinetics. Embodiments also include implantable or injectable drug delivery systems capable of controlled release over long periods of time for therapeutic agents.

Provided is a method for manufacturing an electromagnetic shielding film, which includes: step 1), coating a photoresist on a conductive substrate, and then forming a pattern structure on the conductive substrate through a photolithography process; step 2), growing a metal layer in the pattern structure through a selective electrodeposition process to form a metal pattern structure; and step 3), embedding the metal pattern structure in a flexible base material through an imprinting process to form an electromagnetic shielding film. A method for manufacturing an electromagnetic shielding window is also provided.

The invention relates to a method for producing a structure with spatial encoded functionality, the method comprising: providing in a volume (114) a first photosensitive material (116) that is two-photon crosslinking compatible, generating in the volume (114) a framework of crosslinked first photo-sensitive material (116), the generating of the framework comprising exposing the first photosensitive material (116) with a first focused laser beam (118) according to a first pattern for specifically initiating a two-photon crosslinking of the first photosensitive material (116) in accordance with the first pattern, removing from the volume (114) any remaining non-crosslinked portions of the first photosensitive material (116), providing to the volume (114) a second photosensitive material (116) that is two-photon crosslinking compatible, generating in the volume (114) the structure, the generating of the structure comprising exposing the second photosensitive material (116) with a second focused laser beam (118) according to a second pattern for specifically initiating a two-photon crosslinking of predefined surface portions of the framework and the second photosensitive material (116) in accordance with the second pattern, removing from the volume (114) any remaining non-crosslinked portions of the second photosensitive material (116).

An exposure optics serves as an equipping and/or retrofitting optics for a device for producing a three-dimensional object by selectively solidifying building material, layer by layer. The exposure optics includes at least a first object-sided lens system having a first focal length f.sub.1 and a second image-sided lens system having a second focal length f.sub.2, which lens systems can be arranged in the beam path of the radiation emitted by the radiation source. The focal plane of the first lens system and the focal plane of the second lens system coincide in a plane between the two lens systems. The focal length f.sub.1 of the first lens system is equal to or greater than the focal length f.sub.2 of the second lens system. The exposure optics is designed and can be arranged such that the electromagnetic radiation is incident substantially perpendicular on the working surface.

Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

There is a method for forming a three dimensional or porous graphene electrode pattern on a substrate, the method including providing a substrate; coating the substrate with a lignin-polymer composite film; exposing a first part of the coated lignin-polymer composite film to a laser beam for transforming the first part into the graphene pattern; and removing a second part of the coated lignin-polymer composite film, which was not exposed to the laser beam, by placing the second part in water. The lignin-polymer composite film includes (1) a water-soluble alkaline lignin, (2) a polymer having bonding properties, and (3) a solvent, and an amount of the water-soluble alkaline lignin in the lignin-polymer composite film is between 5 and 60% by weight.

A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays.

An exposure apparatus 10 includes an optical pickup 12 configured to emit laser light and being capable of adjusting the focus of the laser light, a control computing unit 16 configured to adjust the focus of the laser light, an auxiliary stage 21 having the light source unit 12 set thereon, the position of the auxiliary stage 21 being adjustable in the direction toward the master 1, an auxiliary stage control unit 25 configured to control the position of the auxiliary stage 21, wherein the optical pickup 12 includes an object lens 124 configured to direct the laser light to the master 1, a VCM actuator 125 configured to displace the object lens 124 in accordance with a drive current, and the auxiliary stage control unit 25 controls the position of the auxiliary stage 21 in accordance with the drive current for the VCM actuator 125.

Disclosed are systems and methods for achieving sub-diffraction limit resolutions for fabrication of integrated circuits using multiphoton lithography. In one embodiment, a photolithography system is disclosed. The system includes a light source, which can generate and emit laser beams at various wavelengths; a reflector configured to receive the laser beams and focus the laser beams on a condensing lens; a scattering medium, configured to receive the laser beams and generate scattered laser beams; and a wave-front shaping module, configured to receive the scattered laser beams and generate a focused laser beam in a photoresist material deposited on a silicon wafer.

The present invention belongs to the field of functional materials, and particularly relates to a directly printable image recording material, a preparation method and application thereof. The image recording material comprises 25 to 78.8 parts by mass of a photopolymerizable monomer, 0.2 to 5 parts by mass of a photoinitiator, 20 to 70 parts by mass of an inert component, and 0.05 to 2 parts by mass of a thermal polymerization inhibitor, and has an initial viscosity of 200 to 800 mPa.Math.s. The photopolymerizable monomer includes a thiol monomer and an olefin monomer, at least one of which is a silicon-based monomer with polyhedral oligomeric silsesquioxane as a silicon core. By introducing a POSS-based thiol or olefin monomer into the photopolymerizable monomer in combination with other material components, the recording material is allowed to have an initial viscosity of 200 to 800 mPa.Math.s, and meanwhile, the low thermal conductivity characteristic of the POSS-based photopolymerizable monomer is utilized, so that image storage quality is ensured, continuous industrial production of the image recording material is achieved, the process cost is reduced and the production efficiency is improved.