A system for preparing a photopolymer printing plate includes an imager, a plate unloader configured to automatically unload the plate from the imager and deliver the plate to an exposure unit comprising a plurality of UV LEDs, and a controller configured to operate the imager, the plate unloader, and the exposure unit. The imager has a rotatable drum configured to rotate while laser beams ablate portions of an ablatable layer of the printing plate in accordance with imaging data. The UV LEDs include a back array and a front array configured to expose the front of the UV-curable plate, at least one of which is configured to emit UV radiation toward the plate during relative motion between the plate and the array.

Apparatus and method for directly curing photopolymer printing plates, such as with UV radiation. Printing plates are cured directly by radiation, such as emitted from a high power UV laser beam. No LAMS layer or film bearing the image information is required on top of the polymer plate. The laser beam may be split into several individually-modulated beams by means of an Acousto Optical Deflector. Each individual beam is capable of curing pixels of the image that are to be transferred to the printing plate. Support shoulders for the printing details, formed by the pixels are determined by the caustic of the UV beam propagation.

A method of manufacturing a holographic pattern-expressing organogel, by using a dithering mask, according to an aspect of the present disclosure includes: preparing a dithering mask including white pixels and black pixels arranged in periodic patterns; photocuring a polymer by passing an ultraviolet ray through the dithering mask; passing a first solvent through the cured polymer; and passing a second solvent through the cured polymer through which the first solvent is passed.

Embodiments described herein relate to methods of printing features within a lithography environment. The methods include determining a mask pattern. The mask pattern includes auxiliary features to be provided with main features to a maskless lithography device in a lithography process. The auxiliary features are determined with a rule-based process flow or a lithography model process flow.

Embodiments described herein relate to methods of printing double exposure patterns in a lithography environment. The methods include determining a second exposure pattern to be exposed with a first exposure pattern in a lithography process. The second exposure pattern is determined with a rule-based process flow or a lithography model process flow.

A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.

A device for measuring reference points in real time during lithographic printing includes a light source providing an exposure beam; a light modulator modulating the exposure beam according to an exposure pattern; a measurement system configured to measure a position of a number of alignment marks previously arranged on a substrate; and an exposure optical system comprising a control unit. The exposure optical system delivers the modulated exposure beam as an image provided by the light modulator onto the substrate. The exposure system control unit is configured to calculate the orientation of the substrate based on the position of the alignment marks and control the delivering of the modulated exposure beam relative to the calculated orientation of the substrate.

A system for preparing a photopolymer printing plate includes exposure unit comprising a plurality of UV light emitting diodes (UV LEDs), a holder comprising a UV translucent material configured to receive the printing plate, and a controller configured to activate the plurality of UV LEDs. The UV LEDs include a plurality of stationary back UV LEDs configured to emit UV radiation toward the non-printing back side of the printing plate through the holder with the printing plate disposed in a stationary position on the holder, the plurality of stationary back UV LED sources together defining at least one back array having a collective irradiation field covering an area at least coextensive with the lateral length and lateral width of the plate.

A method of fabricating an optical connection to at least one planar optical waveguide integrated on a planar integrated circuit (PIC) uses a machine vision system or the like to detect one or more positions at which one or more optical connections are to be made to at least one planar optical waveguide located on the PIC. A spatial light modulator (SLM) is used as a programmable photolithographic mask through which the optical connections are written in a volume of photosensitive material using a photolithographic process. The SLM is programmed to expose the photosensitive material to an illumination pattern that defines the optical connections. The programming is based at least in part on the positions that have been detected by the vision system. The optical connections are printed by exposing the photosensitive material to illumination that is modulated by the pattern with which the SLM is programmed.

The present disclosure relates to a liquid crystal display (LCD) system. The system in one example has a light source for generating unpolarized light, and an LCD screen arranged in a path of transmittance of the unpolarized light. First and second wire grid polarizers are arranged adjacent to the LCD screen and each have a plurality of nano-scale wires, with the first and second wire grid polarizers have differing polarizations. A pitch of each of the nano-scale wires is no larger than one-third a wavelength of the unpolarized light from the light source. The wire grid polarizers create, in connection with operation of the LCD screen, a 2D light mask suitable for initiating the polymerization of an optically curable material.