Provided is a conveying type washing device capable of achieving both maintainability and productivity. This conveying type washing device develops a flexographic printing plate precursor after imagewise exposure using a washing solution. The conveying type washing device has a conveying unit that conveys the flexographic printing plate precursor through a conveying path including a curved conveying path, and a development unit that develops the flexographic printing plate precursor in a state in which the flexographic printing plate precursor is immersed in the washing solution by the conveying unit and conveyed.

A processing system includes a processing unit that processes the flexographic printing plate with a processing liquid. The processing unit includes a hollow tube having a length extending across a cross-track dimension of the flexographic printing plate. A processing liquid supply system supplies pressurized processing liquid into an interior of the hollow tube. A plurality of pressure-compensating emitters is distributed along the length of the tube which deliver processing liquid onto a surface of the flexographic printing plate, wherein processing liquid flows from the interior of the hollow tube through the pressure-compensating emitters at a controlled flow rate.

A system is for processing a photosensitive flexographic printing plate having a latent image formed by image-wise exposure of an aqueous-processable photopolymer. The system can use a first aqueous processing solution with the latent image for cleaning and then washing a resulting relief image with a second aqueous processing solution, where the second aqueous processing solution is devoid of the photopolymer. A processing solution tank is configured to combine the first used aqueous processing solution with the second used aqueous processing solution to form a combined used aqueous processing solution. A processing solution removal can include: a holding tank configured for receiving the combined used aqueous processing solution; and a conduit from the processing solution tank to the holding tank. The processing solution tank includes the combined used aqueous processing solution at less than a predefined maximum volume and having the photopolymer at less than a predefined maximum concentration.

A substrate processing apparatus includes: a plurality of unit blocks, each having a plurality of modules for processing substrates and a substrate transfer path; a plurality of main transfer mechanisms, each being provided on the substrate transfer path, and configured to transfer the substrates among the plurality of modules; a loading and unloading transfer mechanism configured to load and unload the substrates with respect to each of the unit blocks; a memory configured to store substrate transfer history for each of the unit blocks; and a setting part configured to update a cycle time, which is a time required for a corresponding one of the main transfer mechanisms to move around the substrate transfer path once, of each of the unit blocks based on the substrate transfer history, and configured to set a transfer schedule of the substrates in each of the unit blocks based on the updated cycle time.

A substrate processing apparatus includes: a plurality of unit blocks, each having a plurality of modules for processing substrates and a substrate transfer path; a plurality of main transfer mechanisms, each being provided on the substrate transfer path, and configured to transfer the substrates among the plurality of modules; a loading and unloading transfer mechanism configured to load and unload the substrates with respect to each of the unit blocks; a memory configured to store substrate transfer history for each of the unit blocks; and a setting part configured to update a cycle time, which is a time required for a corresponding one of the main transfer mechanisms to move around the substrate transfer path once, of each of the unit blocks based on the substrate transfer history, and configured to set a transfer schedule of the substrates in each of the unit blocks based on the updated cycle time.

A developing apparatus includes a developing mechanism and a heating mechanism, and the heating mechanism includes a plurality of heating units. The plurality of heating units are provided above or below the developing mechanism, and each heating unit of the plurality of heating units is disposed independently.

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

A system is for processing a photosensitive flexographic printing plate having a latent image formed by image-wise exposure of an aqueous-processable photopolymer. The system can use a first aqueous processing solution with the latent image for cleaning and then washing a resulting relief image with a second aqueous processing solution, where the second aqueous processing solution is devoid of the photopolymer. A processing solution tank is configured to combine the first used aqueous processing solution with the second used aqueous processing solution to form a combined used aqueous processing solution. A processing solution removal can include: a holding tank configured for receiving the combined used aqueous processing solution; and a conduit from the processing solution tank to the holding tank. The processing solution tank includes the combined used aqueous processing solution at less than a predefined maximum volume and having the photopolymer at less than a predefined maximum concentration.

Provided is a conveying type washing device capable of achieving both maintainability and productivity. This conveying type washing device develops a flexographic printing plate precursor after imagewise exposure using a washing solution. The conveying type washing device has a conveying unit that conveys the flexographic printing plate precursor through a conveying path including a curved conveying path, and a development unit that develops the flexographic printing plate precursor in a state in which the flexographic printing plate precursor is immersed in the washing solution by the conveying unit and conveyed.

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.