Patent classifications
G
PHYSICS
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G03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
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7/00
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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G03F7/26
Processing photosensitive materials; Apparatus therefor
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G03F7/30
Imagewise removal using liquid means
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G03F7/3042
from printing plates transported horizontally through the processing stations
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G03F7/3042

TREATMENT METHOD AND TREATMENT APPARATUS FOR WASTE AQUEOUS DEVELOPMENT LIQUID, AND DEVELOPING SYSTEM
20260014522 · 2026-01-15 · ·

A treatment method for a waste aqueous development liquid generated through development of a flexographic printing original plate by using an aqueous development liquid, the method including: a first filtration step of filtering the waste aqueous development liquid at 5 C. or more and 48 C. or less through a microfiltration membrane to give a recovered liquid and a concentrated waste liquid; and a reuse step of reusing the recovered liquid for development of a flexographic printing original plate.