Disclosed is a substrate treating apparatus that treats a substrate with processing liquids. The apparatus includes a substrate holder, an exterior cup, and an interior cup. The interior cup includes an interior cup body, and an interior cup outlet. The exterior cup includes an exterior cup body, an exterior bottom cup, a first drain outlet, a first exhaust port, a second drain outlet, a second exhaust port, and a separation partition. The apparatus further includes an annular member movable upwardly/downwardly, and a drive unit that causes the annular member to move to shift the interior cup body between a collecting position and a retracting position.

A nozzle is stored in a nozzle storage hole of a waiting pod. In this state, a cleaning liquid is discharged to an outer peripheral surface of the nozzle from a plurality of discharge ports. Thus, a coating liquid and its solidified matter adhering to the nozzle are dissolved and removed from the nozzle. Subsequently, a metal removal liquid is discharged from a plurality of discharge ports to the outer peripheral surface of the nozzle. Thus, a metallic component remaining on the nozzle is dissolved and removed from the nozzle. Further, pure water is discharged to the outer peripheral surface of the nozzle from the plurality of discharge ports, and the metal removal liquid adhering to the nozzle is cleaned away.

A developing device and a developing method are provided. The developing device includes a developing chamber, a conveyor table, and an air ejection member. A spraying member in the developing chamber sprays a developing agent onto a surface of a display device. The conveyor table moves the display device from outside of the developing chamber to inside of the developing chamber, and from inside of the developing chamber to outside of the developing chamber. The air ejection member ejects airflow onto the display device. The developing agent disposed on the display device can be prevented from flowing out of the developing chamber.

It is proposed to provide a photopolymer developing solution for providing a flexographic relief printing plate. This photopolymer developing solution comprises butylal alone or butylal and one or more organic cosolvents that are liquid at room temperature; or it comprises DPnB and one or more cosolvents and no butylal.

A processing system includes a processing unit that processes the flexographic printing plate with a processing liquid. The processing unit includes a hollow tube having a length extending across a cross-track dimension of the flexographic printing plate. A processing liquid supply system supplies pressurized processing liquid into an interior of the hollow tube. A plurality of pressure-compensating emitters is distributed along the length of the tube which deliver processing liquid onto a surface of the flexographic printing plate, wherein processing liquid flows from the interior of the hollow tube through the pressure-compensating emitters at a controlled flow rate.

A nozzle is stored in a nozzle storage hole of a waiting pod. In this state, a cleaning liquid is discharged to an outer peripheral surface of the nozzle from a plurality of discharge ports. Thus, a coating liquid and its solidified matter adhering to the nozzle are dissolved and removed from the nozzle. Subsequently, a metal removal liquid is discharged from a plurality of discharge ports to the outer peripheral surface of the nozzle. Thus, a metallic component remaining on the nozzle is dissolved and removed from the nozzle. Further, pure water is discharged to the outer peripheral surface of the nozzle from the plurality of discharge ports, and the metal removal liquid adhering to the nozzle is cleaned away.

A substrate treating apparatus includes a plurality of solution treating units for performing solution treatment of substrates, and a plurality of individual gas supply devices provided to correspond individually to the solution treating units, each for supplying gas at a variable rate only to one of the solution treating units. The solution treating units perform the solution treatment by supplying treating solutions to the substrates. The individual gas supply devices supply gas only to the solution treating units corresponding thereto. The individual gas supply devices supply the gas at adjustable rates to the solution treating units. The rate of gas supply to the solution treating units can therefore be varied for each solution treating unit.

A system is for processing a photosensitive flexographic printing plate having a latent image formed by image-wise exposure of an aqueous-processable photopolymer. The system can use a first aqueous processing solution with the latent image for cleaning and then washing a resulting relief image with a second aqueous processing solution, where the second aqueous processing solution is devoid of the photopolymer. A processing solution tank is configured to combine the first used aqueous processing solution with the second used aqueous processing solution to form a combined used aqueous processing solution. A processing solution removal can include: a holding tank configured for receiving the combined used aqueous processing solution; and a conduit from the processing solution tank to the holding tank. The processing solution tank includes the combined used aqueous processing solution at less than a predefined maximum volume and having the photopolymer at less than a predefined maximum concentration.

The purpose of the invention is to provide a separation and recovery device capable of separating and recovering a liquid having a high solvent concentration from a development waste liquid containing a development residue, with a high processing capacity without mixing the development residue in the recovered liquid. The device is a separation and recovery device for separating and recovering a solvent component from a development waste liquid containing a development residue and has a waste-liquid heating mechanism for heating the development waste liquid, an atomization chamber having an ultrasonic element for atomizing the development waste liquid heated by the waste-liquid heating mechanism into mists, and a mist recovery mechanism for recovering the mists formed in the atomization chamber.

A method of manufacturing a semiconductor device and a semiconductor processing system are provided. The method includes the following steps. A photoresist layer is formed on a substrate in a lithography tool. The photoresist layer is exposed in the lithography tool to form an exposed photoresist layer. The exposed photoresist layer is developed to form a patterned photoresist layer in the lithography tool by using a developer. An ammonia gas by-product of the developer is removed from the lithography tool.