A method of manufacturing a semiconductor device and a semiconductor processing system are provided. The method includes the following steps. A photoresist layer is formed on a substrate in a lithography tool. The photoresist layer is exposed in the lithography tool to form an exposed photoresist layer. The exposed photoresist layer is developed to form a patterned photoresist layer in the lithography tool by using a developer. An ammonia gas by-product of the developer is removed from the lithography tool.

A substrate treating apparatus includes a plurality of solution treating units for performing solution treatment of substrates, and a plurality of individual gas supply devices provided to correspond individually to the solution treating units, each for supplying gas at a variable rate only to one of the solution treating units. The solution treating units perform the solution treatment by supplying treating solutions to the substrates. The individual gas supply devices supply gas only to the solution treating units corresponding thereto. The individual gas supply devices supply the gas at adjustable rates to the solution treating units. The rate of gas supply to the solution treating units can therefore be varied for each solution treating unit. A pair of the solution treating units are both arranged and carry out the solution treatment in a same chamber.

Disclosed is a developing device for developing a substrate, comprising: a developing tank, a recovery box and a conveying unit provided right above the developing tank and configured to convey the substrate; wherein the developing tank comprises a first tank, a second tank and a third tank, which are spaced and are sequentially arranged; the recovery box comprises a first box and a second box; the first tank is communicated with the first box; as the substrate is arranged in the second tank, the second tank is communicated with the first box; as the substrate is arranged in the third tank, the third tank is communicated with the second box. The developing device can solve the technical problems of separately recovering the developers doped with different photoresist concentrations during the development of the substrate to reduce the cost of diluting the developer concentration in the recovery box.

The present invention relates to a unit and a method for treating the water-based washing liquid used in or by a washing station of flexographic plates. The unit comprises at least a first tank in which the liquid is collected and in which the monomer or polymer contained in the liquid itself surfaces. The unit further comprises at least a second tank into which part of the liquid contained in the second tank overflows following the opening of barrier means. Such means in closing condition isolate the two tanks. By means of such overflow, a volume of liquid is collected in the second tank, which contains the polymer or monomer previously surfaced in the first tank.

A method and apparatus for processing a lithographic printing plate includes development with an alkaline solution and gumming with a first gum solution and subsequently with a second gum solution, wherein both gum solutions are provided in a cascade configuration whereby the second gum solution overflows into the first gum solution.

A method for processing a heat-sensitive lithographic printing plate material includes the steps of first treating the plate material with an alkaline development solution followed by treating the plate material with an aqueous solution containing a buffer.

A method for processing a lithographic printing plate includes development with an alkaline solution and gumming with a first gum solution and subsequently with a second gum solution, wherein both gum solutions are provided in a cascade configuration in which the second gum solution overflows into the first gum solution and wherein an alkaline silicate-free developer is used.

An apparatus for processing a lithographic printing plate material includes a development unit and a closed loop recirculation system including at least one inlet opening for removing a development solution and at least one inlet opening for injecting the development solution.

A method for processing a lithographic printing plate, comprising includes development with an alkaline solution and gumming with a first gum solution and subsequently with a second gum solution, wherein both gum solutions are provided in a cascade configuration whereby the second gum solution overflows into the first gum solution.

An apparatus for processing a lithographic printing plate material includes a development unit including a development cavity, the cavity including a bottom plate, a cover plate and sidewalls which together define a volume which is closed with the exception of an entry aperture which allows a plate material to enter the cavity and an exit aperture which allows a plate material to leave the cavity; wherein the cover plate is provided with at least one protruding element at the side facing the development unit.