Inclination identifying information for identifying inclination of a substrate with respect to a reference plane is detected. Based on the detected inclination identifying information and a first angle, a holding position of the substrate held by a rotation holder is corrected in a direction that is in parallel to the reference plane such that a distance between a portion of the substrate that is to be processed by a peripheral region processor and the center of the substrate is maintained constant. In this state, processing having directivity of inclination with respect to the reference plane by the first angle is performed on a peripheral region of the substrate by the peripheral region processor while the substrate is rotated by the rotation holder.

Provided is a laminate that includes a base, an organic layer, a protective layer and a photo-sensitive layer in this order, the photo-sensitive layer contains an onium salt-type photo-acid generator that contains an anion moiety having a group with at least one ring structure selected from the group consisting of condensed ring structure, bridged ring structure and spiro ring structure, the photo-sensitive layer is intended for development with use of a developing solution, and the protective layer is intended for stripping with use of a stripping solution; and also provided are a composition used for forming the protective layer or the photo-sensitive layer contained in the laminate; and a laminate forming kit used for forming the laminate.

The present invention provides a modified repair solution, a preparation method thereof, and a method for repairing color resist. Through adding additives to a photoresist solvent, a ketone compound in the modified repair solution is adsorbed on a surface of a source/drain metal layer to chemically react with a molecular linker to form a transparent colloid. The colloid is colorless and transparent, insoluble in water and organic solvent, and has strong adsorption with aluminum. After the transparent colloid is formed, further formation of the colloid is prevented, and aluminum is prevented from contacting with alkaline modified repair chemical solution, thereby preventing aluminum from being corroded; moreover, the chemical solution can be prevented from remaining in a damaged portion of a protective layer, and reaction with aluminum at high temperatures in post processing can be prevented, thereby preventing a vertical disconnection.

Provided is a laminate that includes a base, an organic layer, a protective layer and a photo-sensitive layer in this order, the protective layer containing a resin, the resin having a branched part and a molecular chain bonded to the branched part, the molecular chain has at least one repeating unit from among repeating units represented by any of Formula (1-1) to Formula (5-1) below, the photo-sensitive layer being intended for development with use of a developing solution, and the protective layer being intended for stripping with use of a stripping solution; a composition intended for use in forming the protective layer or the photo-sensitive layer contained in the laminate; and, a laminate forming kit intended for use in forming the laminate, in the formula, R.sup.11 represents a hydrogen atom or a methyl group, R.sup.21 represents a hydrogen atom or a methyl group, each of R.sup.31 to R.sup.33 independently represents a substituent or a hydrogen atom, each of R.sup.41 to R.sup.49 independently represents a substituent or a hydrogen atom, and each of R.sup.51 to R.sup.54 independently represents a hydrogen atom or a substituent.

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Provided is a method for manufacturing an electromagnetic shielding film, which includes: step 1), coating a photoresist on a conductive substrate, and then forming a pattern structure on the conductive substrate through a photolithography process; step 2), growing a metal layer in the pattern structure through a selective electrodeposition process to form a metal pattern structure; and step 3), embedding the metal pattern structure in a flexible base material through an imprinting process to form an electromagnetic shielding film. A method for manufacturing an electromagnetic shielding window is also provided.

The present invention provides a chemical liquid which makes it possible to obtain a resist pattern while inhibiting pattern interval variation in a case where the chemical liquid is used as a developer or rinsing solution. The present invention also provides a chemical liquid storage body, a resist pattern forming method, and a semiconductor chip manufacturing method. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing n-butyl acetate and isobutyl acetate, in which a content of the n-butyl acetate is 99.000% to 99.999% by mass with respect to a total mass of the chemical liquid, and a content of the isobutyl acetate is 1.0 to 1,000 mass ppm with respect to the total mass of the chemical liquid.

A method of removing a photoresist, a laminate, a method of forming a metallic pattern, a polyimide resin, and a stripper are provided. The method of removing the photoresist includes forming a release layer on a substrate, the release layer having a first surface and a second surface opposite to each other, wherein the first surface of the release layer is in contact with the substrate; forming a photoresist layer on the second surface of the release layer; and removing the release layer and the photoresist layer. The release layer is formed by a polyimide resin. The polyimide resin is obtained by performing a polymerization of tetracarboxylic dianhydrides, diamines, and phenolamines. The diamines include hydroxyfluorinated diamines, benzoic acid diamines, and aminotetramethyldisiloxanes.

The present disclosure provides a photoresist stripping device and a photoresist stripping method. The photoresist stripping device including a conveyor belt, a liquid storage tank, a filtering device, a lighting device and a stripping tank. Through disposing a metal-organic framework (MOF) material in a filter element, the MOF material is configured to adsorb a dissolved oxygen of the stripping solution in a visible light environment, thereby reducing the difference in oxygen concentration between the inside and outside of the gap, and alleviating hollowing out phenomenon of copper caused by stripping the photoresist of the substrate. Further, when reaching a saturation step, can heat or emit ultraviolet light to release the dissolved oxygen to make the filter material recyclable.

The radical supply step of supplying the radicals (active species) to the resist film R is performed in the plasma processing (Step S102). Then, the resist removal step of supplying the organic solvent having the low surface tension to the resist film R present on the front surface Sa of the substrate S after the radical supply step to remove the resist film R from the front surface Sa of the substrate S is performed (Step S104).

The invention relates to the use of a composition comprising a C.sub.1 to C.sub.6 alkanol and a carboxylic acid ester of formula (I) wherein R.sup.1 is selected from a C.sub.1 to C.sub.6 alkyl, which may be unsubstituted or substituted by OH or F, and —X.sup.21—[O—X.sup.22].sub.n—H; R.sup.2 is selected from a C.sub.1 to C.sub.6 alkyl, which may be unsubstituted or substituted by OH or F, and —X.sup.21—[O—X.sup.22].sub.n—H; X.sup.21, X.sup.22 are independently selected from C.sub.1 to C.sub.6 alkandiyl, which may be unsubstituted or substituted by OH or F; n is an integer from 1 to 5. wherein, the C.sub.1 to C.sub.6 alkanol and the carboxylic acid ester are selected so as to form an azeotropic mixture and are present in an amount from 20% by weight below to 20% by weight above such azeotropic mixture.

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