A method of assembling a facet mirror of an optical system, in which facets of the facet mirror are imaged onto a field plane of the optical system, includes: a) determining positions of the facets of the facet mirror relative to interfaces of the facet mirror, with the aid of which the facet mirror is able to be connected to a support structure; b) calculating an actual position of an object field of the optical system arising for the facet mirror in the field plane; and c) arranging spacers between the interfaces and the support structure so that the object field in the field plane is brought from the calculated actual position to a target position.

According to an exemplary embodiment of the invention, a method of patterning a photoresist is provided. The method includes selectively illuminating an edge portion of a photoresist using an illumination system to form a patterned portion of the photoresist.

An illumination system includes a plurality of pixels (or spots) that are (or may be) configured in one or more polarization configuration types. The pixels of the illumination system may be configured to promote particular types of polarization (e.g., transverse electric (TE) polarization, transvers magnetic (TM) polarization) to increase pattern contrast while achieving suitable exposure operation throughput. Moreover, the pixels of the pixels of the illumination system may be configured to achieve free-form (arbitrary or freely-configurable) polarization, which permits the polarization of radiation to be tailored to particular exposure operation patterns and other parameters.

A field facet for a field facet mirror of a projection exposure apparatus has a reflection surface spanned by two field facet coordinates. An actuator device having at least two independently controllable actuator units serves to deform the reflection surface in at least two independent deformation degrees of freedom. A first of the deformation degrees of freedom brings about a change in a curvature of the reflection surface along a primary curvature coordinate which coincides with one of the field facet coordinates. A second of the deformation degrees of freedom brings about a change in a torsion of the reflection surface about the primary curvature coordinate. This can yield a field facet, the imaging performance of which is optimized, for example adapted to different illumination channel assignments within the projection exposure apparatus.

An illumination system for an EUV projection lithographic projection exposure apparatus comprises an EUV light source, which generates an output beam of EUV illumination light with a predetermined polarization state. An illumination optical unit guides the output beam along an optical axis, as a result of which an illumination field in a reticle plane is illuminated by the output beam. The light source comprises an electron beam supply device, an EUV generating device and a polarization setting device. The EUV generating device is supplied with an electron beam by the electron beam supply device. The polarization setting device exerts an adjustable deflecting effect on the electron beam for setting the polarization of the output beam. This results in an illumination system, which operates on the basis of an electron beam-based EUV light source and provides an output beam, which is improved for a resolution-optimized illumination.

A method for displacing an optical component is disclosed, in which the electrical power maximally required when displacing the component is less than the sum of the maximum electrical powers of the at least two actuators used for the displacement.

A support device for an optical apparatus is disclosed. The support device includes first and second support elements. The support device also includes first and second flexure bearings. The first flexure bearing and the second flexure bearing each connect the first support element and the second support element to one another in a thermally conductive manner and hold the first support element in a manner movable in at least one first direction relative to the second support element. Spring forces generated by the first flexure bearing and the second flexure bearing partly or completely cancel one another out in the case of a movement of the first support element relative to the second support element in the first direction.

An illumination optical unit for EUV projection lithography illuminates an illumination field with illumination light from a light source. A first facet mirror of the illumination optical unit has a plurality of first facets for the reflective guidance of partial beams of a beam of the EUV illumination light. Disposed downstream of the first facet mirror is a second facet mirror with a plurality of second facets for further reflective guidance of the partial beams. As a result of this, the reflective beam guidance that the two facets predetermines object field illumination channels, by which the whole object field is illuminable by the illumination light in each case and to which exactly one first facet and exactly one second facet is assigned in each case.

Provided is an illumination optical apparatus that illuminates the surface with light from a light source and includes an optical integrator (the integrator) configured to form a plurality of secondary source images (the images); a adjuster having a plurality of adjusting elements for adjusting a light of the images; and a consensor configured such that the adjuster is in a conjugate relationship with the end surface of the integrator, wherein the element is located at positions, which corresponds to a secondary source formed by an odd reflection times in the first direction by the integrator and a secondary source formed by an even times and a secondary source formed by an odd times in the second direction and a secondary source formed by an even times, wherein the element is not located at a position which corresponds to a secondary source formed by no reflection in the integrator.

An illumination optical unit for EUV projection lithography includes a field facet mirror and a pupil facet mirror. A correction control device, which is used for the controlled displacement of at least some field facets that are usable as correction field facets, which are signal connected to displacement actuators, is embodied so that a correction displacement path for the correction field facets is so large that a respective correction illumination channel is cut off at the margin by the correction pupil facet so that the illumination light partial beam is not transferred in the entirety thereof from the correction pupil facet into the object field.