A wafer support system has a wafer support device and a dicing frame, wherein the wafer support device has a bottom plate and a top plate. The top plate has a support surface for supporting the wafer, and the bottom plate has a maximum diameter being larger than the maximum diameter of the top plate so that the bottom plate forms a repository for the dicing frame. The dicing frame has a plate-like shape defining a center hole, wherein the minimum diameter of the center hole is larger than the maximum diameter of the top plate so that the dicing frame sinks below the upper surface of the wafer and/or the support surface. Further, a wafer support device, a wafer support system and a mask aligner are provided.

An exposure apparatus includes a carrying device and a UV light generation device that irradiate a transparent substrate positioned on the carrying device. The carrying device includes a base, a linear electric machine, an exposure table, and a pneumatic lift device that is arranged between the exposure table and the base and supports the exposure table on the base. A stator of the linear electric machine is fixed to the base, and a rotor of the linear electric machine is fixedly coupled to the exposure table. The linear electric machine drives the exposure table to move relative to the base. A method for exposure of a transparent substrate is also provided. The linear electric machine only needs to drive the movement of the exposure table thereby helping increase exposure speed and exposure accuracy. The pneumatic lift device provides an additional function of cushioning.

The embodiments of the disclosure relate to a proximity exposure device and an exposure method thereof. The proximity exposure device includes: a loading table; a holder mounted onto the loading table to hold a mask; a vacuum hood arranged above the mask to form a sealed space above the mask; and a pumping mechanism connected to the vacuum hood to pump air from the vacuum hood such that a negative pressure state is formed above the mask.

Disclosed are a linear light source generator, a lenticular system used in the linear light source generator, and a stepper equipped with the linear light source generator. The linear light source generator uses a lenticular, and includes a light source and a lenticular system. A light exposure work of the stepper is performed based on a relative transfer between the linear light source generator, and a pattern film or a photo mask.

A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

Provided is an near-field lithography immersion system, including: an immersion unit including: a liquid flow channel and a gas flow channel configured to apply gas to confine an immersion liquid provided by the liquid flow channel into an exposure field; at least two interface modules, the interface module includes a gas connector, a liquid connector and a brake connector, the gas connector and the liquid connector are correspondingly connected to the gas flow channel and the liquid flow channel, respectively, the brake connector is configured to control an assembly and a disassembly of the immersion unit, and the interface module is detachably connected to the immersion unit; and a mask loading module including a mask base plate and a mask, the immersion liquid is guided to an edge of the mask from below the mask base plate to form an immersion field between the mask and a substrate.

The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.

In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (43) by nozzles (45). The photopolymer is selectively irradiated to activate its photoinitiator and the unirradiated polymer is removed. The irradiation can be via a mask (49) which does not come into contact with the polymer, or via a beam splitting arrangement (63, 64) or a diffraction grating (71). The pattern can be formed by either leaving the exposed photopolymer in situ, or using the exposed photopolymer to mask the substrate, etching the substrate, and then removing the exposed photopolymer. In another aspect, there is provided a method 1100 comprising the step 1102 of applying a layer of photocurable material to the exterior surface, the step 1104 of irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, and the step 1106 of removing uncured photocurable material to form the microstructure pattern. The radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material corresponding to the selected intensity pro file.

The embodiments of the disclosure relate to a proximity exposure device and an exposure method thereof. The proximity exposure device includes: a loading table; a holder mounted onto the loading table to hold a mask; a vacuum hood arranged above the mask to form a sealed space above the mask; and a pumping mechanism connected to the vacuum hood to pump air from the vacuum hood such that a negative pressure state is formed above the mask.

The present disclosure provides a mask plate, a mask exposure device and a mask exposure method, belongs to the field of display technology. The mask plate includes a tray with at least one mask locating slot, and a mask is arranged in each mask locating slot. By the mask plate, the mask exposure device and the mask exposure method provided by the present disclosure, an effective mask with a closed-loop shaped opening may be provided, thereby improving a quality of a film formed on a substrate.