A table device including: a first base including a first reference surface; a second base including a second reference surface, and movable on the first reference surface in a direction parallel to a first axis; a first bearing member provided to the second base, and forming a gas bearing between the first bearing member and the first reference surface; a second bearing member provided to the second base, apart from the first bearing member relative to a direction parallel to a second axis perpendicular to the first axis, and forming a gas bearing between the second bearing member and the first reference surface; and a table movable on the second reference surface. A distance between the first bearing member and the second bearing member is longer than a dimension of a moving range of the table relative to the direction parallel to the second axis.

A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Embodiments of the present disclosure provide a mask device, an exposure apparatus and an exposure method, which enable a reduction in the possibility that the mask is scratched during exposure so as to protect the mask, and in turn a reduction in production cost of the semiconductor devices. The mask device comprises a mask carrier, a mask disposed on a lower surface of the mask carrier, and at least one protection unit provided on the mask carrier, wherein a lower end of the at least one protection unit is arranged to be lower than the lower surface of the mask during exposure. The mask device is applicable in exposure of a substrate to be exposed.

Disclosed is a thermo-mechanical actuator (100) comprising a piezo¬electric module (110), the piezo-electric module comprising at least one piezo-electric element (120), wherein the thermo-mechanical actuator is configured to: receive a thermal actuation signal (132) for controlling a thermal behaviour of the piezo-electric module, or provide a thermal sensing signal (132) representative of a thermal state of the piezo-electric module, and, wherein the thermo-mechanical actuator is configured to: receive a mechanical actuation (134) signal for controlling a mechanical behaviour of the piezo-electric module, or provide a mechanical sensing signal (134) representative of a mechanical state of the piezo-electric module.

A cooling device includes a circulation system configured to circulate a refrigerant in a condenser so as to return the refrigerant to the condenser via a pump, a heater, a throttle valve, and a vaporizer; and a cooling system that includes a heat exchanger arranged in the condenser. The condenser includes a first portion where the refrigerant is present in a liquid state and a second portion where the refrigerant is present in a gas state, and at least a portion of the heat exchanger is arranged in the second portion.

An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.

A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.

A method of operating a semiconductor apparatus includes generating an electric field in peripheral areas of a first covering structure and a second covering structure; causing a photomask to move to a position between the first and second covering structures such that the photomask at least partially vertically overlaps the first and second covering structures and such that particles attached to the photomask are attracted to the first and second covering structures by the electric field; and irradiating the photomask with light through light transmission regions of the first and second covering structures.