G03F7/70758

SILICON WAFER EDGE PROTECTION DEVICE

A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.

System and method for providing vibration isolation by magnetic levitation

A magnetic levitation system comprising a control system configured to control six degrees of freedom of a levitated object, wherein each degree of freedom has at least a third order roll off. Another system and a method are also disclosed.

Lithography apparatus, stage apparatus, and method of manufacturing articles

This disclosure provides a lithography apparatus including: a lens barrel having an optical system configured to irradiate a substrate with a beam; and a stage apparatus configured to repeat a long distance movement in a primary scanning direction of the substrate and a short distance movement which is shorter than the long distance movement in terms of the amount of movement in a secondary scanning direction of the substrate, and being configured to form a pattern on the substrate with the beam, wherein the stage apparatus includes: a first moving body configured to move in the primary scanning direction; a floating unit configured to support the first moving body, so as to float by a magnetic force and be movable in the primary scanning direction; a second moving body configured to move in the secondary scanning direction; and a guide using a rolling body configured to support the second moving body in contact therewith so as to be movable in the secondary scanning direction.

POSITIONING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
20170329237 · 2017-11-16 ·

An apparatus for moving movable part on surface parallel to first and second directions includes single guide to constrain position of the movable part in the second direction and drive mechanism to drive the movable part. The movable part includes first movable member movable in the first direction while being guided by the guide, second movable member having first and second ends, the first end being connected to the first movable member via rotation bearing and moving above the surface, and third movable member movable within range between the first and second ends while being guided by the second movable member. The drive mechanism includes first driver to drive the first end of the second movable member in the first direction, and second driver to drive the second end of the second movable member in the first direction.

Tubular linear actuator, patterning device masking device and lithographic apparatus

The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with respect to a longitudinal axis of the tubular linear actuator, and a magnet assembly comprising a series of permanent magnets with alternating polarization direction extending in the longitudinal direction, wherein the magnet assembly is at least partially arranged in the coil assembly and movably with respect to the coil assembly, wherein the tubular coils comprise edge windings.

Linear motor, stage apparatus, and exposure apparatus
09804508 · 2017-10-31 · ·

A linear motor with high heat recovery efficiency that inhibits the rise in surface temperature is offered. The linear motor is disposed in a surrounding member (142) and facing a flow passage (142a) of a liquid for regulating temperature, and is provided with a coil unit (141) having at least a part thereof in contact with the liquid. The coil unit (141) is provided with a coil body (144), a mold layer (143) that covers the coil body and holds it in specific form, and a liquid protection layer (150) that covers the mold layer (143) and has liquid protection properties.

Stage apparatus, lithography apparatus, and article manufacturing method
09804507 · 2017-10-31 · ·

Provided is a stage apparatus that includes a first movable unit; a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit; a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction; and a switch unit that forms a closed circuit including coils in the stator coil array and a resistance during operation of a dynamic brake, wherein the resistance value of a first coil located at a center region of the stroke range in the stator coil array is larger than that of a second coil located toward an end side of the stroke range rather than the center region in the stator coil array.

ACTUATOR

An actuator may include a supporting body; a movable body; a connecting body connected to the movable body and the supporting body and having elasticity or viscoelasticity; a first magnetic driving circuit including first magnets and a first coil held by the supporting body and movable body, the first coil being opposed to the first magnets in a first direction, and the first magnetic driving circuit generating driving the movable body in a second direction which perpendicularly intersects with the first direction; and a second magnetic driving circuit including second magnets and a second coil held by the supporting body or the movable body, the second coil being opposed to the second magnets in the first direction, and the second magnetic driving circuit driving the movable body in a third direction which perpendicularly intersects with the first direction and crosses the second direction.

DISPLACEMENT DEVICE BASED ON HALL-EFFECT SENSORS AND PLANAR MOTORS
20220052585 · 2022-02-17 ·

The present invention discloses a displacement device based on Hall-effect sensors and planar motors. The device at least comprises a planar motor stator, a planar motor mover, and a Hall-effect sensor array, a magnet array on the planar motor stator extends on a first plane substantially parallel to a direction X and a direction Y to form a working area, a coil array on the planar motor mover is configured on a second plane parallel to the first plane, an interaction between the coil array and the magnet array causes the planar motor mover to produce a displacement of at least two degrees of freedom within the working area, the magnet array is configured by first magnet blocks and second magnet blocks alternately in rows and columns, the Hall-effect sensor array is composed of a plurality of Hall-effect sensors, and installed on the planar motor mover, a size of the magnet blocks of the magnet array in the direction X is not less than twice a column spacing of the Hall-effect sensor array, and the size of the magnet blocks of the magnet array in the direction Y is not less than twice a row spacing of the Hall-effect sensor array.

System and method for controlling a temperature of a reaction assembly

A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a conductor array (36) that is coupled to the reaction assembly (18); (iv) a temperature adjuster (20); and (v) a control system (22) that selectively controls the temperature adjuster (20). The conductor array (36) includes a set of first zone conductor units (250), and a set of second zone conductor units (252). The temperature adjuster (20) independently adjusts the temperature of the set of first zone conductor units (250), and the set of second zone conductor units (252).