A semiconductor substrate stage for carrying a substrate is provided. The semiconductor substrate stage includes a base layer, a magnetic shielding layer disposed on the base layer, a carrier layer disposed on the magnetic shielding layer, and a receiver disposed on the carrier layer. The receiver is configured to receive a microwave signal from a signal source electrically isolated from the receiver, and the microwave signal is used for controlling the movement of the semiconductor substrate stage.

A reticle transport system having a magnetically levitated transportation stage is disclosed. Such a system may be suitable for use in vacuum environments, for example, ultra-clean vacuum environments. A magnetic levitated linear motor functions to propel the transportation stage in a linear direction along a defined axis of travel and to magnetically levitate the transportation stage

The present invention provides a positioning apparatus for positioning of an object, the positioning apparatus including a first actuator and a second actuator configured to be arranged along a first direction so as to be parallel to each other, and to cause a beam to move in the first direction, a third actuator configured to be built in the beam, and to cause the object to move in a second direction relative to the beam, the second direction intersecting with the first direction, and a control unit configured to control the first actuator, the second actuator, and the third actuator.

A lithographic apparatus includes a machine table, a base, a placement table, a first baffle plate, a first driving device, and a transporting device. The machine table has a cavity formed by a side surface, a top surface, and a bottom surface. A conveying door is arranged on the side surface. A transferring device in the cavity can extend out from or retract back into the cavity through the conveying door. The placement table is configured to bear a mask carrier, and can at least extend out from or retract back to a bearing surface of the base. The first driving device is configured to drive the placement table to reciprocate between a first position and a second position.

A lithographic apparatus includes a machine table, a base, a placement table, a first baffle plate, a first driving device, and a transporting device. The machine table has a cavity formed by a side surface, a top surface, and a bottom surface. A conveying door is arranged on the side surface. A transferring device in the cavity can extend out from or retract back into the cavity through the conveying door. The placement table is configured to bear a mask carrier, and can at least extend out from or retract back to a bearing surface of the base. The first driving device is configured to drive the placement table to reciprocate between a first position and a second position.

An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pm1 in a first direction and a pitch Pm2 in a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pc1 in the first coil set in the first direction over Pm1 is different from a ratio R2 of a coil pitch Pc2 in the second coil set in the second direction over Pm2.

The present invention provides an exposure apparatus for performing scanning exposure on each of a plurality of shot regions in a substrate, comprising: a stage configured to hold the substrate; a driver configured to drive the stage; and a controller configured to control the scanning exposure on each of the plurality of shot regions while controlling the driver in accordance with a driving profile, wherein the driving profile includes a first section in which the stage is driven at a constant acceleration in a first direction, a second section in which the stage is driven at a constant acceleration in a second direction opposite to the first direction, and a connection section connecting the first section and the second section, and a period in which the scanning exposure is performed includes at least a part of the connection section.

This disclosure provides a substrate carrying device and a photoresist coating development device, and belongs to the field of display technologies. The substrate carrying device includes two carrying mechanisms opposite to each other, and a driving mechanism between the two carrying mechanisms. Each of carrying mechanisms includes a guiding assembly and a plurality of supports. The guiding assembly includes a guide and a moving member in cooperation with each other. The guide is configured to guide the moving member to move along a preset trajectory. The supports are secured to the moving member and are configured to carry the substrate together. The driving mechanism is capable of simultaneously driving movement of the moving members of the two carrying mechanisms.

A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.

The invention provides a substrate support arranged to support a substrate, comprising piezo a actuator, further comprising a first pair of electrodes, a second pair of electrodes and a piezo material having a first surface and a second surface. The first surface is arranged along a first direction and second direction. The first pair of electrodes comprises a first electrode arranged on the first surface and a second electrode arranged on the second surface. The second pair of electrodes is arranged to shear the piezo material. The first pair of electrodes is arranged to elongate the piezo material in a third direction perpendicular to the first direction and second direction. The first electrode is divided into at least two parts and is arranged to rotate the first surface and the second surface relatively to each other about the first direction wherein the piezo actuator is arranged to support the substrate.