Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.

The invention provides a vibration isolation device configured to support a structure, comprising: an air mount having a base part mounted on a reference structure and a vibration isolated part, and an inverted pendulum device, wherein a lower end of the inverted pendulum device is mounted on the vibration isolated part of the air mount and an upper end of the inverted pendulum device support the structure to be supported, wherein the vibration isolation device comprises a stiffness adjustment device configured to adjust the stiffness of the inverted pendulum device.

A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.

A reaction force diversion mechanism, a motor device and a photolithography machine are disclosed. The photolithography machine includes an illumination unit, a mask stage, a projection objective, a main baseplate, a wafer stage and a main carrier frame. The illumination unit and the mask stage are disposed above the main baseplate, and the main carrier frame is arranged above a ground base. Both of the wafer stage and the main baseplate are supported on the main carrier frame, and vibration dampers are deployed between the main carrier frame and the ground base. Reaction force diversion mechanisms are disposed between the wafer stage and the ground base and between the mask stage and the ground base. The reaction force diversion mechanisms can divert reaction forces generated from movement of the two motion stages onto the ground base while blocking vibration propagating from the ground base toward the motion stages.

An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

A chuck-driving device includes a base extending in first and second directions. The second direction crosses the first direction. The chuck-driving device further includes a slider positioned on the base and configured to move in a third direction substantially perpendicular to the first and second directions, and a pneumatic cylinder positioned on the base and to support the slider in the third direction. The chuck-driving additionally includes a motor assembly positioned on the base, around the pneumatic cylinder, and configured to drive the slider in the third direction. The motor assembly includes a coil base having a hollow portion disposed around sides of the pneumatic cylinder, a coil assembly positioned on the coil base and disposed around the sides of the pneumatic cylinder, and a magnet assembly adjacent to a part of the coil assembly.

An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space and that includes a first member disposed at at least a portion of surrounding of the optical member and a second member disposed at at least a portion of surrounding of the optical member, a driving apparatus configured to relatively move the second member with respect to the first member, and a vibration isolator by which the first member is supported to the apparatus frame.

A chuck-driving device includes a base extending in first and second directions. The second direction crosses the first direction. The chuck-driving device further includes a slider positioned on the base and configured to move in a third direction substantially perpendicular to the first and second directions, and a pneumatic cylinder positioned on the base and to support the slider in the third direction. The chuck-driving additionally includes a motor assembly positioned on the base, around the pneumatic cylinder, and configured to drive the slider in the third direction. The motor assembly includes a coil base having a hollow portion disposed around sides of the pneumatic cylinder, a coil assembly positioned on the coil base and disposed around the sides of the pneumatic cylinder, and a magnet assembly adjacent to a part of the coil assembly.

The stage apparatus according to the present invention includes a first stage configured to be movable in a first direction, a first driving unit configured to generate a thrust force to move the first stage in the first direction, and a reaction force reducing unit configured to generate a thrust force to reduce a reaction force generated by the generation of the thrust force of the first driving unit. The reaction force reducing unit can generate the thrust forces with different magnitudes from each other at a plurality of positions in a second direction perpendicular to the first direction, and can generate the thrust forces with different magnitudes from each other at a plurality of positions in a third direction perpendicular to the first direction and the second direction.

In order to provide an imprint device capable of reducing pattern defects, the imprint device which brings a mold into contact with an imprint material on a substrate and transfers a shape of a surface of the mold onto the substrate includes: a mold holding part which holds the mold; a substrate holding part which holds the substrate; and a measuring unit which measures a contact force generated when a part of the mold or the mold holding part is brought into contact with a predetermined contact part, wherein the contact part is installed at a position in a predetermined plane different from a position in the predetermined plane of the substrate held by the substrate holding part and is installed at a height position corresponding to a height of a surface of the substrate held by the substrate holding part.