A motion stage device, an exposure device and a lithography machine are disclosed. The motion stage device includes: Y-direction motors (203), a mover of each Y-direction motor (203) movable in a horizontal Y-direction; X-direction motors provided on X-direction guide rails (105), the X-direction guide rails (105) is in connection with the movers of the Y-direction motors (203) and movable in the horizontal Y-direction under actuation of the Y-direction motors (203), the X-direction motors having movers (107b) movable in a horizontal X-direction; an inner frame (102), supporting the X-direction guide rails (105); and a motion stage (108, 106), disposed on the movers (107b) of the X-direction motor. This motion stage device possesses improved modal and vibration characteristics because of a reduced load on the Y-direction motors (203). Additionally, the X-direction guide rails (105) are in non-contact connection with the inner frame (102) and thus will not pose significant vibration-causing impacts on the inner frame (102). This allows stable movement and improved control accuracy.

A reaction force diversion mechanism, a motor device and a photolithography machine are disclosed. The photolithography machine includes an illumination unit, a mask stage, a projection objective, a main baseplate, a wafer stage and a main carrier frame. The illumination unit and the mask stage are disposed above the main baseplate, and the main carrier frame is arranged above a ground base. Both of the wafer stage and the main baseplate are supported on the main carrier frame, and vibration dampers are deployed between the main carrier frame and the ground base. Reaction force diversion mechanisms are disposed between the wafer stage and the ground base and between the mask stage and the ground base. The reaction force diversion mechanisms can divert reaction forces generated from movement of the two motion stages onto the ground base while blocking vibration propagating from the ground base toward the motion stages.

A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.

The invention provides a vibration isolation device configured to support a structure, comprising: an air mount having a base part mounted on a reference structure and a vibration isolated part, and an inverted pendulum device, wherein a lower end of the inverted pendulum device is mounted on the vibration isolated part of the air mount and an upper end of the inverted pendulum device support the structure to be supported, wherein the vibration isolation device comprises a stiffness adjustment device configured to adjust the stiffness of the inverted pendulum device.

An exposure apparatus performs scanning exposure of a substrate with an illumination light via a projection optical. A mask is supported on a first base member, with a slider provided inside a movable member. The first base member is arranged above the projection optical system and has a first opening through which the illumination light passes. The mask is supported in a second opening of the slider, through which the illumination light passes. The slider moves inside the movable member by a first drive system. A stage having a holder that holds the substrate is moved on a second base member by a second drive system. The first and the second drive systems move the mask and the substrate relative to the illumination light during scanning exposure. The movable member is moved by a reaction force generated by a movement of the slider by the first drive system.

Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.

Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.

The disclosure relates to a method and an arrangement for actuating an element in a system for microlithography. According to an aspect in at least one degree of freedom an actuator force is exerted on the element via at least two actuator components. The actuator components are driven independently of one another for generating the actuator force. Driving is effected so that a thermal power introduced into the system on account of the generation of the actuator force by the actuator components deviates from a predefined constant value by not more than 20%.

An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space and that includes a first member disposed at at least a portion of surrounding of the optical member and a second member disposed at at least a portion of surrounding of the optical member, a driving apparatus configured to relatively move the second member with respect to the first member, and a vibration isolator by which the first member is supported to the apparatus frame.

A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.