A balance mass system shared by a workpiece stage and a mask stage includes a balance mass and an anti-drift and compensation apparatus (16). The balance mass includes a first part (11) for mounting thereon a workpiece stage system, a second part (20) for mounting thereon a mask stage system, and a third part (14) for interconnecting the first part (11) and the second part (20). The first part (11) of the balance mass is floatingly supported on a base frame (1) of a lithography machine, and the third part (14) of the balance mass is in connection with the base frame (1) via the anti-drift and compensation apparatus (16). The anti-drift and compensation apparatus (16) is disposed in proximity to the center of gravity of the balance mass as a whole. This balance mass system can eliminate the need for using an additional support for the mask stage system and allow the construction of a lithography machine with a higher structural compactness, reduced size and weight, and reduced total mass of used balance masses.

An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate includes: a liquid immersion member that forms an immersion liquid space on an object and comprises first and second members, the first member disposed at at least a portion of surrounding of the optical member, the second member disposed at at least a portion of surrounding of an optical path of the exposure light below of the first member, being movable with respect to the first member and comprising a second upper surface and a second lower surface, the second upper surface being opposite to a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, the object being movable below the optical member; and a vibration isolator that suppresses vibration of the first member.

A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.

The disclosure relates to a method and an arrangement for actuating an element in a system for microlithography. According to an aspect in at least one degree of freedom an actuator force is exerted on the element via at least two actuator components. The actuator components are driven independently of one another for generating the actuator force. Driving is effected so that a thermal power introduced into the system on account of the generation of the actuator force by the actuator components deviates from a predefined constant value by not more than 20%.

A method of controlling vibration of a structural element of an exposure apparatus includes receiving data of a position of the structural element, determining a position error signal based at least in part on the position data and a specified position of the structural element, determining a force command to damp a specified vibration mode frequency of the structural element based at least in part on the position error signal and the specified vibration mode frequency, and transmitting the force command to an actuator such that the actuator applies force to the structural element and damps vibration of the structural element at least at the specified vibration mode frequency of the structural element.

A reticle stage for a photolithography scanner is disclosed having a direct-drive ironless linear motor to actuate a short-stroke stage during a turnaround operation. The reticle stage may include a long stroke stage, an array of permanent magnets coupled to a beam, and at least one conductive coil mounted to the short-stroke stage without a ferromagnetic core. The beam may pass through the short-stroke stage and be coupled to one of the long-stroke stage or a balance mass, both of which may be disposed about the perimeter of the short-stroke stage. An electrical current applied to the coil may interact with the magnetic field from the permanent magnets to provide a force on the short-stroke stage.

A photolithography system with an actuatable reticle stage is disclosed. Mechanical actuators coupled to a long-stroke reticle stage are driven to extend and mechanically contact a short-stroke stage during reticle stage turnaround. The actuators may be piezoelectric stack pushers or pneumatic bellows pushers. The pusher devices are controlled and driven to enable higher acceleration turnaround trajectories by applying forces via mechanical contact engaging during turnaround and disengaging before exposure begins during a scan.

Reticle containers can include reinforcement supports that include support features configured to contact and thereby support corner contacts when shocks deflect corner contacts of the reticle container. The reinforcement supports can be integral to a portion of the reticle container such as a cover portion thereof, or provided on an insert configured to attach to a feature of the reticle container. The reinforcement supports can attach over the corner contacts. The reinforcement supports can additionally include contact regions configured to receive contact from the reticle in the event of a shock.

A lithographic apparatus includes an illumination system, a projection system, and a stage. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. The stage moves the patterning device or the substrate. The stage includes a support structure, an actuator device, first, second, and third actuator targets, and a tensional member. The third actuator target is attached to a first side of the support structure. The actuator device is disposed proximal to the first and third targets and magnetically interacts with the first and third targets to move the support structure along a direction. The first and second actuator targets disposed at opposite sides of the support structure and are attached at opposite ends of the tensional member. The tensional member transmits a mechanical load to the second side of the support structure via the second actuator target.