A pattern exposure apparatus comprising: a rotary drum that supports a flexible substrate, which is exposed with a mask pattern formed on an outer circumferential surface of a cylindrical mask that rotates about a first center axis; a rotary drum-side scale portion that is arranged for measuring a movement of the substrate which is fed in a circumferential direction by a rotation of the rotary drum, that includes a scale; a first projection optical system that projects an exposure light; a second projection optical system that projects an exposure light; a first reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale; and a second reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale.

A pattern forming photo-curing layer is heated, thereby enabling quick shaping. A pattern manufacturing apparatus (100) includes a controller (101), a laser projector (102), and a heater (103). The controller (101) controls the laser projector (102) to form a pattern on a pattern forming sheet (130) placed on a stage (140). The laser projector (102) includes an optical engine (121), and the controller (101) controls the laser projector (102) to irradiate the pattern forming sheet (130) with a light beam from the optical engine (121). The heater (103) heats the pattern forming sheet (130).

A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

An exposure apparatus has a substrate holding member, a first supporting member, a second supporting member, and a driving system. The first supporting member supports the substrate holding member from below. The second supporting member supports the first supporting member from below such that the first supporting member and the second supporting member are capable of moving relative to each other. The driving system moves the substrate holding member, the first supporting member and the second supporting member. The driving system includes a first driving device and a second driving device, the first driving device moving the substrate holding member and the first supporting member in a direction along a predetermined axis, and the second driving device moving the second supporting member in the direction along the predetermined axis.

A photomask includes a first light-transmitting portion including first and second main patterns spaced apart from each other in a first direction, a second light-transmitting portion having a light transmittance lower than a light transmittance of the first light-transmitting portion and including a first auxiliary pattern disposed between the first and second main patterns and extending in a second direction crossing the first direction, a second auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the first main pattern interposed therebetween and surrounding the first main pattern, and a third auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the second main pattern interposed therebetween and surrounding the second main pattern, and a light shielding portion surrounding the first and second light-transmitting portions.

A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

The present disclosure provides a bearing device. The bearing device includes a bearing platform, a lifting passage extending through the bearing platform, a lifting structure in the lifting passage and a light reflection compensating block between the lifting structure and an inner wall of the lifting passage. A difference between a reflectivity ratio of a top surface of the light reflection compensating block and a reflectivity ratio of a bearing surface of the bearing platform is less than or equal to a threshold value. A difference between the reflectivity ratio of the top surface of the light reflection compensating block and a reflectivity ratio of a top surface of the lifting structure is less than or equal to the threshold value. The present disclosure further provides an exposure apparatus including the bearing device.

A substrate stage and an empty-weight canceling mechanism that supports an empty weight of the substrate stage are made up of separate bodies. Accordingly, the size and weight of the substrate stage (a structure including the substrate stage) can be reduced, compared with the case where the substrate stage and the empty-weight canceling mechanism are integrally configured. Further, due to movement of an X coarse movement stage and a Y coarse movement stage by an X drive mechanism and a Y drive mechanism, the substrate stage is driven in an XY plane and also the empty-weight canceling mechanism that supports the empty weight of the substrate stage is driven. With this operation, the substrate stage can be driven without difficulty even when the substrate stage and the empty-weight canceling mechanism are configured of separate bodies.

An exposure device that draws a pattern on a substrate by shining a beam from a light source device on substrate and scanning the beam in a main scanning direction while varying the intensity of beam according to pattern information, including: a scanning unit having a beam scanning unit that includes a polygonal mirror whereby the beam is oriented to scan the beam, and light detector for photoelectric detection of reflected light generated when beam is shined on substrate; an electro-optical element for controlling the beam's intensity modulation according to pattern information such that at least part of second pattern to be newly drawn is drawn on top of at least part of first pattern formed on substrate; and a measurement unit measuring relative positional relationship between the first and second pattern on the basis of a detection signal output by the detector while second pattern is drawn on substrate.

A fabrication method of a mask and a mask, a display panel and a touch panel are provided. The fabrication method of the mask includes: providing a substrate; forming a photoresist material layer on the substrate; and performing at least two scanning exposure processes on the photoresist material layer by using a scanning beam, wherein, each of the at least two scanning exposure processes is performed along a first direction parallel to a surface where the substrate is located, the scanning beam in each of the at least two scanning exposure processes scans the photoresist material layer in a scanning region having a preset width, at least one pair of adjacent scanning regions partially overlap with each other, and a partially overlapping region of the at least one pair of adjacent scanning regions is located in a first region of the mask.