Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.

Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.

An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

Disclosed is a degassing apparatus. The degassing apparatus includes a dissolved gas extracting nozzle that extracts dissolved gases in a form of bubbles from a treatment solution including the dissolved gases, a first tank that separates the bubbles extracted while passing through the dissolved gas extracting nozzle from the treatment solution, and a second tank having a stabilization space, in which the treatment solution, from which the bubbles have been separated, is stored from the first tank and is stabilized. The dissolved gas extracting nozzle is configured such that a diameter of an outlet is smaller than a diameter of an intermediate passage such that the dissolved gases in the treatment solution are extracted in the form of the bubbles through a cavitation phenomenon.

The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.

Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.

An air conditioner including; an air flow path through which air flows; a plate having an air through hole installed in a downstream opening of the air flow path; and a humidifier disposed on the air flow path and capable of supplying vapor into the air flow path. The air flow path has a horizontal channel provided with the downstream opening and extending along a horizontal direction, and the humidifier is disposed on the horizontal channel. The humidifier includes a water storage tank opened upward to an inside of the horizontal channel, and a heater that heats the water in the storage tank. The air conditioner further includes a moisture absorption member that extends in an up and down direction, above a wall part of the storage tank on the side of the plate, or diagonally thereabove on the side of the plate.

The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank. Next, the exhaust system performs a hydrogen-gas discharge operation in which the inlet valve and the first outlet valve are closed, and the a bypass valve disposed in a bypass line and the second outlet valve disposed in a hydrogen-gas discharge line are opened to discharge the hydrogen gas stayed in an upper part of the buffer tank while flowing the exhaust gas into a bypass line.

A de-bubbling slide is configured to fit in a dispensing vessel and capture, with a receiving element, a flow of fluid into the dispensing vessel from a fluid inlet. The receiving element of the de-bubbling slide directs the flow of fluid to a flow surface of the de-bubbling slide from which gas dissolved in the flow of fluid, or bubbles in the flow of fluid, escape from the fluid. Openings in an upper surface of the de-bubbling slide allow the escaped gas to exit the de-bubbling slide.