In order to provide a determining apparatus capable of determining whether there is a foreign substance on a substrate stage with suppressing a decrease in productivity of an apparatus, the determining apparatus according to the present invention is configured to determine a state of a surface of each of a first substrate stage and a second substrate stage based on a first detection result of a substrate surface of a substrate mounted on the first substrate stage and a second detection result of the substrate surface of the substrate mounted on the second substrate stage.

A molding apparatus that molds a composition on a substrate with a mold includes a mold holding unit configured to hold the mold, a substrate holding unit configured to hold the substrate, a first elastic member configured to apply a first elastic force to the mold holding unit in a direction away from the substrate holding unit, and a control unit configured to cause the mold holding unit to move in the direction away from the substrate holding unit in a case where the control unit determines that an abnormality has occurred.

A mirror, in particular for a microlithographic projection exposure apparatus or an inspection system, having a mirror substrate (205), a reflection layer (220), which is configured to have a reflectivity of at least 50% for electromagnetic radiation of a predefined operating wavelength that is incident on the optically effective surface (200a) of the mirror at an angle of incidence of at least 65 relative to the respective surface normal, and a barrier layer system (210), which is arranged between the reflection layer and the mirror substrate and has a sequence of alternating layer plies composed of a first material and at least one second material. The barrier layer system reduces penetration of hydrogen atoms that would otherwise penetrate the mirror substrate by at least a factor of 10.

The disclosure relates to a device for transmitting electrical signals between a first interface element, arranged at a first structure of a lithography system, and a second interface element, arranged at a second structure of the lithography system. An electrical conductor connects the first interface element and the second interface element. The device has a hollow body which surrounds at least sections of the electrical conductor and which is designed to electromagnetically shield the electrical conductor. A gap is provided in the hollow body or between the hollow body and one of the structures and allows a relative movement of the first structure and the second structure to mechanically decouple the first structure from the second structure.

An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.

An apparatus and a method for cleaning a partial area of a substrate, in particular a photomask, are described. The apparatus has a cleaning head having a lower surface configured to be arranged above and in close proximity to the substrate area to be cleaned, the lower surface having a central opening formed therein, a first annular groove, surrounding the central opening, and at least a second groove, arranged between the first annular groove and the central opening, the first annular groove being fluidly connected to a first port allowing connection to an external supply source and the second annular groove being fluidly connected to a second port allowing connection to an external supply source, a tape supply mechanism arranged to supply an abrasive tape to the central opening in the lower surface of the cleaning head, such that a portion of the abrasive tape protrudes therefrom and a liquid media conduit having an outlet arranged to supply a liquid to a backside of the abrasive tape at or at the vicinity of the central opening. In the method a protruding portion of an abrasive tape, which protrudes from a central opening of a cleaning head is placed in contact with the area of the substrate to be cleaned to thereby bring a lower surface of the cleaning head in close proximity to the substrate area to be cleaned. A liquid is supplied to a backside of the abrasive tape at or at the vicinity of the central opening of the cleaning head, such that at least the portion of the abrasive tape protruding from the central opening is wetted, and a relative movement is caused between the abrasive tape and the surface area of the substrate to be cleaned. The method also encompasses applying a cleaning fluid to the substrate area to be cleaned via at least one first groove or the at least one second groove in the lower surface of the substrate and applying a suction force to the other groove.

A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.

System and method for removing molecular contaminants from an air stream are disclosed. The system includes first, second and third filter. The first filter removes organic contaminants from an air stream passing through the first filter. The second filter is downstream of the first filter, is physically and chemically exchangeable with the first filter and removes organic contaminants from the air stream output of the first filter. The third filter, downstream of the second filter, is not exchangeable with the first filter or the second filter. The first position filter can be replaced by the second filter in the second position when the first filter in the first position becomes depleted as detected. A new filter in the second filter position is inserted. Replacing the depleted first filter with the second downstream filter reduces costs and waste while inserting the new filter in the second position ensures removing organic contaminants.

An imprinting system according to an embodiment includes a first measuring device measuring an intensity of light reflected from an end of a shot area of a monitor substrate being an area on which imprinting has been performed, a dripping condition generating device generating a dripping condition of a resin-based mask material on the basis of the measured intensity of light, and an imprinting apparatus performing imprinting using the dripping condition. The imprinting apparatus includes a second measuring device measuring an intensity of light reflected from an end of a first shot area of a production substrate being an area on which imprinting has been performed, and a control unit adjusting arrangement of droplets of a resin-based mask material ejected on a second shot area of the production substrate being an area on which imprinting is to be performed on the basis of an intensity of light reflected from an end of the first shot area.