A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

The present invention provides a home pot. The home pot comprising: a housing having a cylindrical accommodation space of which the upper part is open and in which a nozzle tip can be accommodated, and has n injection flow paths formed on a sidewall in contact with the accommodation space; and a cleaning liquid supply portion provided in the housing and configured to supply a cleaning liquid to the n injection flow paths, and the n injection flow paths are disposed to be inclined with respect to the center of the accommodation space such that a high-speed swirling flow is generated in the accommodation space.

The present application discloses a component having a movably mounted component element of a projection exposure apparatus and in particular a movement limiting apparatus, and a method for limiting the movement of movable component elements of a component of a projection exposure apparatus.

A laser apparatus may include, a first frame and a second frame, a sleeve through-hole provided in the second frame, a sleeve insertion hole provided in the first frame, a bolt, a positioning sleeve that is formed in an approximately cylindrical shape into which the bolt can be inserted and that positions the first frame and the second frame by passing through the sleeve through-hole and being inserted into the sleeve insertion hole, a nut that is provided in the first frame and into which the bolt is screwed, and a fall prevention unit that is provided in the second frame and that prevents the bolt and the positioning sleeve from falling.

An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.

An optical imaging apparatus includes an optical element support sub-structure and an auxiliary support sub-structure. The optical element support sub-structure is configured to support an optical element and has a first temporary support interface arrangement. The optical element is configured to form part of a group of optical elements of the optical imaging apparatus configured to transfer, in an exposure process using exposure light, an image of a pattern of a mask onto a substrate. The auxiliary support sub-structure is configured to support an auxiliary component and has a second temporary support interface arrangement. The auxiliary component is configured to execute, during the exposure process, an auxiliary function of the exposure process other than transferring the image of the pattern onto the substrate.

A photomask blank substrate container having an inner member, inner cassette and retainer member, container main body having a lower box and an upper lid, and a sealing tape, in which the container main body and inner member include a polymer-based material in which when 0.1 g of a sample thereof is retained at 40° C. for 60 minutes to release an outgas component, the outgas total amount detected by a gas chromatography mass spectrometer is 1.9×103 ng or less in terms of n-tetradecane, and the sealing tape is a material in which when a size of 10 mm×10 mm of a sample thereof is retained at 150° C. for 10 minutes to release an outgas component, the outgas total amount detected by a gas chromatography mass spectrometer is 1.8×103 ng or less in terms of n-tetradecane. This photomask blank substrate container allows storing and transporting the photomask blank substrate while suppressing influence on the resist pattern.

A photolithography device includes: a fixed slot, configured to install and fix the light source; a sensing module, configured to sense the distance information between the light source and the fixed slot; a prompt module, configured to send prompt information according to the distance information; and a determination module, configured to determine the installation status of the light source according to the prompt information.

A method of controlling a temperature of the semiconductor device includes operating an semiconductor apparatus; maintaining a temperature of a vessel of the semiconductor apparatus with a first cooling output by a cooling controller; heating the vessel for removing a material on the vessel; transferring a first signal, by a converter, to the cooling controller when heating the vessel; and reducing the first cooling output to a second cooling output by the cooling controller base on the first signal.

A photolithography device includes: a fixed slot, configured to install and fix the light source; a sensing module, configured to sense the distance information between the light source and the fixed slot; a prompt module, configured to send prompt information according to the distance information; and a determination module, configured to determine the installation status of the light source according to the prompt information.