A coating and developing method includes: a step that applies a resist containing a metal to a front surface of a substrate to form a resist film, and exposes the resist film; a developing step that supplies a developer to the front surface of the substrate to develop the resist film; and a step that forms, before the developing step, a first protective film on a peripheral part of the substrate on which the resist film is not formed, so as to prevent the developer from coming into contact with the peripheral part of the substrate, wherein the first protective film is formed at least on a peripheral end surface and a peripheral portion of a rear surface of the substrate in the peripheral part of the substrate.

An image exposure device includes an image display device having pixels that emit light having a plurality of wavelengths; a photosensitive recording medium support portion that supports a photosensitive recording medium for recording an image of the image display device; a collimation portion that is disposed between the image display device and the photosensitive recording medium support portion and makes radiation light including the light having a plurality of wavelengths radiated from the pixels into first transmitted light radiated within a range of a first radiation angle narrower than a radiation angle of the radiation light; and a dichroic filter that is disposed between the collimation portion and the photosensitive recording medium support portion, and makes the first transmitted light including the light having a plurality of wavelengths into second transmitted light radiated within a range of a second radiation angle equal to or smaller than the first radiation angle.

A substrate processing apparatus includes: a processing block in which a substrate is sequentially transferred and processed; a carry-in/out transfer mechanism that carrys-in/out the substrate with respect to modules; a carry-out module configured to place the substrate therein after the substrate is processed; a multi-module configured by a plurality of modules having a same order in which the substrate is transferred in the processing block; a main transfer mechanism that moves around in a transfer path provided in the processing block to deliver the substrate among the modules; and a controller that sets a first transfer schedule including determination of a number of modules to become transfer destinations of the substrate in the multi-module, and determination of a number of stay cycles which is a number of times that the main transfer mechanism moves around after the substrate is carried into the multi-module until the substrate is carried out.

A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.

Aspects of disclosure provide a method for attaching wiring connections to a component using both design and field measured data of the component to produce accurate wiring connections.

Aspects of disclosure provide a method for attaching wiring connections to a component using both design and field measured data of the component to produce accurate wiring connections.

A temperature control device and a temperature control method are provided. The temperature control device is located at an interface between a photoresist coating and developing machine and a lithography machine and includes: a temperature detection device, a gas flow generator and a controller. The temperature detection device and the gas flow generator are respectively connected to the controller. The temperature detection device is configured to detect an actual temperature at the interface in real time. The gas flow generator is at least configured to generate a gas flow sealing knife around the interface. The controller is configured to control the gas flow generator to generate the gas flow sealing knife responsive to that the actual temperature detected by the temperature detection device is not equal to the target temperature, to control the actual temperature at the interface to reach the target temperature through the gas flow sealing knife.

An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm.sup.2 and equal to or lower than a fluence of the main pulse laser beam.

A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

An extreme ultraviolet light generation apparatus includes: an optical base; and a chamber module replaceable from the optical base. The chamber module includes a chamber in which extreme ultraviolet light is generated, a condenser mirror disposed inside the chamber and configured to condense extreme ultraviolet light generated inside the chamber, a window configured to transmit, into the chamber, a laser beam introduced into the optical base, and having a function to seal up the chamber, and a laser beam condensation optical system configured to condense the laser beam having transmitted through the window.