Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.

Some devices, systems, and methods obtain a material map of a region; divide the region into a plurality of subregions; perform, for each of one or more subregions of the plurality of subregions, a first drop-pattern-generation process, wherein the first drop-pattern-generation process generates a respective initial drop pattern for the subregion based on the material map; and perform, for each of the one or more subregions of the plurality of subregions, a second drop-pattern-generation process, wherein the second drop-pattern-generation process generates a respective revised drop pattern for the subregion based on the material map and on the respective initial drop pattern for the subregion.

A pattern forming method includes: a first step of forming a first pattern to define a first shot arrangement; and a second step of performing an imprint process, thereby forming a second pattern on the imprint material on the first pattern and defining a second shot arrangement. In the second step, the second shot arrangement is defined so as to reduce an overlay error between the first and second shot arrangements by deforming the mold. In the first step, based on information of the estimated second shot arrangement definable on the substrate when the second step is performed after the second pattern formed on the mold is amended by deforming the mold, the first pattern is formed to make an overlay error between the first and second shot arrangements fall within an allowable range.

An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a substrate stage mechanism having a substrate chuck configured to hold the substrate, a mold driver configured to drive the mold, and a controller configured to control, based on tilt information indicating a tilt of the substrate chuck which is caused by a force received from the mold driver, the mold driver so as to adjust a relative tilt of the mold with respect to the substrate in the imprint process.

An imprint method for forming a pattern of an imprint material on a substrate includes irradiating the imprint material with light to increase a viscosity of the imprint material on the substrate with a mold and the imprint material being in contact with each other, aligning the substrate and the mold with each other while changing and increasing a control gain to be used in a controller, which is configured to control relative positions of the mold and the substrate so as to reduce a displacement based on a result of detection of the displacement between the substrate and the mold, in such a manner that the control gain increases with the mold and the imprint material being in contact with each other, and curing the imprint material by irradiating the imprint material with light.

According to the embodiment, the template includes: a first substrate; a pattern projected from a principal surface of the first substrate; a first mark projected from the principal surface of the first substrate, the first mark surrounding a recessed portion disposed in an inside region of the first mark; and a second mark recessed from the principal surface of the first substrate; wherein the first mark is provided with, in a planar view, an inner portion having a pair of first sides opposed to each other and a pair of second sides opposed to each other, the first sides extending in a first direction along the first substrate, the second sides extending in a second direction intersecting with the first direction along the first substrate, the inner portion surrounding the recessed portion of the first mark, and an outer portion having a pair of third sides opposed to each other and a pair of fourth sides opposed to each other, the third sides extending in the first direction, the fourth sides extending in the second direction, the outer portion being an outer edge portion of the first mark.

A method and system for controlling a position of a moveable stage having a substrate supported thereon is provided. First position information representing a position of the substrate relative to a mark on an object is obtained from a sensor. Alignment prediction information is generated based on the obtained first position wherein the generated alignment prediction information including at least one parameter value. First trajectory information is generated and includes the at least one parameter value based on the obtained first position information and the generated alignment prediction information. Second trajectory information is generated based on the generated alignment prediction information first trajectory information and second position information, wherein the second position information represents a position of the moveable stage. An output control signal is generated based on the second trajectory information and used to control the moveable stage to approach a target position based on the generated output signal.

An imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. The imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.

An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.

An imprint method of molding an imprint material on a shot region of a substrate using a mold, includes aligning the shot region and the mold in a state where the imprint material and a pattern region of the mold are in contact with each other; and curing the imprint material by irradiating the imprint material with curing light after the aligning. The aligning is controlled so as to include an overlap period during which a period during which deformation light used to deform the shot region is applied to the substrate through the imprint material and a period during which polymerization light used to increase a viscosity of the imprint material is applied to the imprint material overlap each other. The polymerization light to be applied to the imprint material is controlled in accordance with the deformation light to be applied to the imprint material during the overlap period.