A high-resolution PSL system and method incorporating one or more of the following features with a standard PSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PSL system to fabricate microstructures of different materials.

An optical reflective device referred to as a skew mirror, having a reflective axis that need not be constrained to surface normal, is described. Examples of skew mirrors are configured to reflect light about a constant reflective axis across a relatively wide range of wavelengths. In some examples, a skew mirror has a constant reflective axis across a relatively wide range of angles of incidence. Exemplary methods for making and using skew mirrors are also disclosed. Skew mirrors include a grating structure, which in some examples comprises a hologram.

An optical reflective device referred to as a skew mirror, having a reflective axis that need not be constrained to surface normal, is described. Examples of skew mirrors are configured to reflect light about a constant reflective axis across a relatively wide range of wavelengths. In some examples, a skew mirror has a constant reflective axis across a relatively wide range of angles of incidence. Exemplary methods for making and using skew minors are also disclosed. Skew mirrors include a grating structure, which in some examples comprises a hologram.

A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.