Methods for automated handling for forming a device and automated handling systems for forming a device are presented. One of the methods includes providing a production area with a plurality of destinations and a transport system which includes transport and load/unload (U/L) units in the production area. The transport units include automated guided vehicles (AGVs) with a storage compartment for holding at least one carrier containing production material for forming the device and U/L units include AGVs with a robotic system for handling carriers. A transfer of a selected carrier from a first destination to a second destination is determined. A request to the transport system is issued to effect the transfer of the selected carrier, which includes using a selected U/L unit, a selected transport unit, or a combination of selected U/L and transport units.

Devices, systems and methods are provided related to controlled interaction between a mobile robot and another entity in an operating environment. In one method, for example, performance of a task for a time is signaled for, wherein the performance of the task involves the entity. The mobile robot is operated to interact with the entity at the time.

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

A method includes identifying first parameters of a first processing chamber of a semiconductor fabrication facility. The first parameters include first input parameters and first output parameters. The method further includes identifying second parameters of a second processing chamber of the semiconductor fabrication facility. The second parameters include second input parameters and second output parameters. The method further includes generating, by a processing device based on the first parameters and the second parameters, composite parameters comprising composite input parameters and composite output parameters. Semiconductor fabrication is based on the composite parameters.

A method includes: generating composite input parameters using first input parameters of a first processing chamber and second input parameters of a second processing chamber; generating third input parameters by adjusting the first input parameters such that the third input parameters more closely approximate the composite input parameters than the first input parameters; generating fourth input parameters by adjusting the second input parameters such that the fourth input parameters more closely approximate the composite input parameters than the second input parameters; causing fabrication of first semiconductors in the first processing chamber in a third process run based on the third input parameters and corresponding to a lower yield loss than the first process run; and causing fabrication of second semiconductors in the second processing chamber in a fourth process run based on the fourth input parameters and corresponding to a lower yield loss than the second process run.

A manufacturing system includes: a first tank configured to store generation fuel; a manufacturing device having a first power generation device configured to generate power using the generation fuel, the manufacturing device being configured to operate using power supplied from the first power generation device; and a transport robot configured to transport the generation fuel from the first tank to the manufacturing device.