G05B2219/32096

MODULAR BATCH DESIGN TOOL FOR BATCH ENGINEERING SYSTEMS
20180067462 · 2018-03-08 ·

A method of batch system design for batch processes run by a batch processing system includes providing a piping and instrumentation diagram of the batch system and process write-ups of batch processes as inputs to a batch design tool. The algorithm processes the inputs along with modular batch design concepts and a compliant batch standard to derive batch engineering system designs including a first batch engineering system design compliant with the batch standard including a physical model and procedural model. The batch engineering system designs include function blocks for implementation. The first batch engineering system design is modified based on received customer' feedback by a system specific configuration generation block to generate system specific configurations in a form of master batch recipes, the function blocks and sequential function charts ladder logistics. The system specific configurations are processed to generate a customized batch engineering system design.

Dispatch control method for furnace process

A dispatch control method for a furnace process including the following steps is provided. Before a plurality of lots of wafers is loaded into a furnace, the characteristic variation value of each of the plurality of lots of wafers is calculated. The plurality of lots of wafers is ordered according to the size of the characteristic variation values. The plurality of lots of wafers is placed in the furnace in a descending order of the characteristic variation values corresponding to a plurality of locations in the furnace causing the characteristic variation values to change from smaller to larger.

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
20170168477 · 2017-06-15 ·

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

METHOD FOR CONTROLLING A PUMP SYSTEM AND PUMP SYSTEM
20170152849 · 2017-06-01 ·

The invention relates to a method for controlling a pump system and to a pump system (10) having a pump unit (11) for dispensing multi-component material under pressure by means of a spray gun, the pump unit comprising a pump device (12), a mixer (13) and a spray gun (14), the pump device having at least two pumps (16, 17) for pumping component material and associated liquid tanks (18, 19) for storing component material, wherein the pump system has a control device (24), the control device comprising a control means (26) and a database (27), recipes for mixing multi-component material being stored in the database, the pump unit being controlled by means of the control means as a function of a recipe.

BATCH AUTHORING TOOL AND BIOREACTOR CONTROL SYSTEM
20170090490 · 2017-03-30 · ·

A bioreactor control system comprises a batch server for controlling a bioreactor system in response to a recipe, a batch software system for generating a control sequence for the bioreactor system via the batch server for implementing the recipe, and a recipe conversion system that inputs the recipe into the batch software system. Preferably, the recipe conversion system reads a word processor file containing the recipe and interprets styles applied to text in the word processor file as indicating equipment and phases of the recipe to the recipe conversion system. Generally, the bioreactor system includes one or more bioreactors and additional hardware to perform the upstream and downstream processing. The document properties of the word processor file containing the recipe are applied as header information for the recipe input into the batch software system. This system solves a problem associated with traditional batching software systems, in which the authoring of recipes on the systems can be relatively arcane. Here, the recipe can be authored on a common word processor.

Matching process controllers for improved matching of process

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

METHODS AND APPARATUS TO DEFINE STAGES FOR MULTI-VARIATE BATCH CONTROL ANALYTICS
20170083012 · 2017-03-23 ·

Methods and apparatus to define stages for multi-variate batch control analytics are disclosed. An example method includes determining, with the processor, a current stage in a current batch process based on a current value of a batch stage parameter. The current value of the batch stage parameter determined based on process control data associated with process parameters in the current batch process. The current stage determined independent of batch events defined by at least one of a start or an end of procedures, unit procedures, operations, or phases in a batch recipe. The example method further includes applying, with the processor, a model to the current batch process, the model corresponding to the current stage.

Matching process controllers for improved matching of process

A method includes identifying first parameters of a first processing chamber of a semiconductor fabrication facility. The first parameters include first input parameters and first output parameters. The method further includes identifying second parameters of a second processing chamber of the semiconductor fabrication facility. The second parameters include second input parameters and second output parameters. The method further includes generating, by a processing device based on the first parameters and the second parameters, composite parameters comprising composite input parameters and composite output parameters. Semiconductor fabrication is based on the composite parameters.

Batch authoring tool and bioreactor control system
09552000 · 2017-01-24 · ·

A bioreactor control system comprises a batch server for controlling a bioreactor system in response to a recipe, a batch software system for generating a control sequence for the bioreactor system via the batch server for implementing the recipe, and a recipe conversion system that inputs the recipe into the batch software system. Preferably, the recipe conversion system reads a word processor file containing the recipe and interprets styles applied to text in the word processor file as indicating equipment and phases of the recipe to the recipe conversion system. Generally, the bioreactor system includes one or more bioreactors and additional hardware to perform the upstream and downstream processing. The document properties of the word processor file containing the recipe are applied as header information for the recipe input into the batch software system. This system solves a problem associated with traditional batching software systems, in which the authoring of recipes on the systems can be relatively arcane. Here, the recipe can be authored on a common word processor.

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
20250199521 · 2025-06-19 ·

A method includes: generating composite input parameters using first input parameters of a first processing chamber and second input parameters of a second processing chamber; generating third input parameters by adjusting the first input parameters such that the third input parameters more closely approximate the composite input parameters than the first input parameters; generating fourth input parameters by adjusting the second input parameters such that the fourth input parameters more closely approximate the composite input parameters than the second input parameters; causing fabrication of first semiconductors in the first processing chamber in a third process run based on the third input parameters and corresponding to a lower yield loss than the first process run; and causing fabrication of second semiconductors in the second processing chamber in a fourth process run based on the fourth input parameters and corresponding to a lower yield loss than the second process run.