There is provided a technique that includes: displaying a recipe editing screen including at least a selection screen area that displays a parameter list for selection of parameters included in a recipe of a substrate processing apparatus, and a parameter editing screen area that edits the parameters; receiving a selection operation that selects an editing target parameter from the parameter list; displaying, on the parameter editing screen area, in an editable manner, a timing chart that is changeable at a time of each process in a series of processes included in a substrate processing process; and editing the editing target parameter by receiving an operation instruction to edit the timing chart displayed on the parameter editing screen area and changing the timing chart according to the operation instruction.

A process control management method in a computer system for configuring and supervising a process plant includes providing an interactive user interface to manage a plurality of objects in the process plant, where each of the plurality of objects corresponds to a physical or logical entity in the process plant, including generating a navigation pane to display a set of selectable items, each in the set of selectable items corresponding to a respective one of the plurality of objects, and generating a command pane to display a set of selectable controls, each in the set of selectable controls corresponding to a task to be performed on at least one of the plurality of objects in the process plant; receiving a selection of one of an item in the set of selectable items via the navigation panel and a control in the set of selectable controls via the command panel; determining an operational context based on the received selection, wherein the operational context corresponds to one of a range of actions applicable to the selection if the selection is an item selection, or a range of items to which the selection is applicable if the selection is a control selection; and adjusting one of the navigation pane or the command pane according to the operational context, including displaying a subset of selectable items in the navigational pane, wherein each in the subset of selectable items is within the range applicable to the selection, if the selection is a control selection, and displaying a subset of selectable controls in the command pane, wherein each in the subset of selectable controls is within the range applicable to the selection, if the selection is an item selection.

An industrial control system stores three types of models. Models of a first type are associated with models of a second type. When a model of the first type is associated with a model of a third type, the set of models of the second type that are associated with the model of the first type is established. The industrial control system can provide an indication of the set of models of the second type. The industrial control system also establishes the set of models of the first type that are associated with the set of models of the second type. The industrial control system provides an indication of the set of models of the first type. In some embodiments, the industrial control system is a recipe management system and the models of the first, second, and third types are capability models, equipment models, and recipe models.

A recipe management system executes a recipe on a piece of equipment in a process plant using one or more capabilities of the piece of equipment. A configuration system creates models of the capabilities, piece of equipment, and recipe and associates the capability models with the equipment model and recipe model. The recipe model can be used to execute the recipe on any piece of equipment with the capabilities with which it is associated. The equipment model can be used to execute any recipe that uses no capabilities other than those with which it is associated.

There is provided a technique that includes: displaying a recipe editing screen including at least a selection screen area that displays a parameter list for selection of parameters included in a recipe of a substrate processing apparatus, and a parameter editing screen area that edits the parameters; receiving a selection operation that selects an editing target parameter from the parameter list; displaying, on the parameter editing screen area, in an editable manner, a timing chart that is changeable at a time of each process in a series of processes included in a substrate processing process; and editing the editing target parameter by receiving an operation instruction to edit the timing chart displayed on the parameter editing screen area and changing the timing chart according to the operation instruction.

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.

A method includes identifying first parameters of a first processing chamber of a semiconductor fabrication facility. The first parameters include first input parameters and first output parameters. The method further includes identifying second parameters of a second processing chamber of the semiconductor fabrication facility. The second parameters include second input parameters and second output parameters. The method further includes generating, by a processing device based on the first parameters and the second parameters, composite parameters comprising composite input parameters and composite output parameters. Semiconductor fabrication is based on the composite parameters.

A method includes: generating composite input parameters using first input parameters of a first processing chamber and second input parameters of a second processing chamber; generating third input parameters by adjusting the first input parameters such that the third input parameters more closely approximate the composite input parameters than the first input parameters; generating fourth input parameters by adjusting the second input parameters such that the fourth input parameters more closely approximate the composite input parameters than the second input parameters; causing fabrication of first semiconductors in the first processing chamber in a third process run based on the third input parameters and corresponding to a lower yield loss than the first process run; and causing fabrication of second semiconductors in the second processing chamber in a fourth process run based on the fourth input parameters and corresponding to a lower yield loss than the second process run.