The invention relates to a control system comprising a controller arranged to provide an output signal on the basis of an input signal. The controller comprises a linear integrator, a linear gain and a selector. The linear integrator is arranged to provide a first control signal. The linear gain is in parallel to the linear integrator and is arranged to provide a second control signal. The selector is arranged to switch between an integrator mode in which the first control signal is used as the output signal of the controller and a gain mode in which the second control signal is used as the output signal of the controller. The selector is arranged to switch to the integrator mode when the value of the second control signal passes zero, and to switch to the gain mode when: eu<k.sub.h.sup.1u.sup.2, wherein e is the input signal of the controller, u is the output signal of the controller, and k.sub.h is the gain of the linear gain.

Examples of synchronized parallel tile computation techniques for large area lithography simulation are disclosed herein for solving tile boundary issues. An exemplary method for integrated circuit (IC) fabrication comprises receiving an IC design layout, partitioning the IC design layout into a plurality of tiles, performing a simulated imaging process on the plurality of tiles, generating a modified IC design layout by combining final synchronized image values from the plurality of tiles, and providing the modified IC design layout for fabricating a mask. Performing the simulated imaging process comprises executing a plurality of imaging steps on each of the plurality of tiles. Executing each of the plurality of imaging steps comprises synchronizing image values from the plurality of tiles via data exchange between neighboring tiles.

A system for creating customized root canal obturation cores is provided. The system receives a 3D image data set representing one or more teeth. The system then displays an image of a tooth of the one or more teeth. After receiving at least one user input, the system constructs a 3D output data set from the 3D image data set based on the at least one user input. Next, the system converts the constructed 3D output data set to control data. A computer controlled manufacturing system can use the 3D output data set to manufacture a customized root canal obturation core.

Techniques for modifying a mask fabrication process based the identification of an abnormality in a pattern of a fabricated lithography mask are disclosed including comparing a fabricated lithography mask to a lithography mask design where the fabricated lithography mask is fabricated based at least in part on the lithography mask design using a mask fabrication process. An abnormality in a pattern of the fabricated lithography mask relative to a corresponding one of the plurality of patterns in the lithography mask design is identified based at least in part on the comparison of the fabricated lithography mask to the lithography mask design. A calibrated mask model is generated based at least in part on the identified abnormality in the pattern of the fabricated lithography mask and the mask fabrication process is modified based at least in part on the calibrated mask model.

A method of simulating a resist pattern according to an exemplary embodiment includes a step (A) of calculating a latent image of a concentration of an active species in a resist film that has been radiated by a radioactive ray along a target pattern with respect to a radiation position of the radioactive ray, a step (B) of calculating a change rate of the concentration with respect to the radiation position at an edge of the target pattern on the basis of the latent image, a step (C) of calculating a probabilistic variation at the edge of the target pattern, and a step (D) of calculating a variation in pattern edge roughness from the change rate of the concentration and the probabilistic variation.

An inspection system includes a controller communicatively coupled to a physical inspection device (PID), a virtual inspection device (VID) configured to analyze stored PID data, and a defect verification device (DVD). The controller may receive a pattern layout of a sample including multiple patterns fabricated with selected lithography configurations defining a process window, receive locations of PID-identified defects identified through analysis of the sample with the PID, wherein the PID-identified defects are verified by the DVD, remove one or more lithography configurations associated with the locations of the PID-identified defects from the process window, iteratively refine the process window by removing one or more lithography configurations associated with VID-identified defects identified through analysis of selected portions of stored PID data with the VID, and provide, as an output, the process window when a selected end condition is met.

The current disclosure describes techniques for managing vertical alignment or overlay in semiconductor manufacturing using machine learning. Alignments of interconnection features in a fan-out WLP process are evaluated and managed through the disclosed techniques. Big data and neural networks system are used to correlate the overlay error source factors with overlay metrology categories. The overlay error source factors include tool related overlay source factors, wafer or die related overlay source factors and processing context related overlay error source factors.

A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.

An information processing apparatus includes an acquisition unit configured to acquire a plurality of pieces of collected data collected in a state where lithographic processing is executed by a lithography apparatus for forming a pattern by applying a plurality of processing conditions, a classification unit configured to classify the acquired data based on the processing conditions, a judgement unit configured to judge that an abnormality has occurred in the acquired collected data by judging whether the collected data falls within an allowable range specified based on the processing conditions.

Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.