A gas delivery system and associated method includes a flow channel, a control valve, a downstream pressure sensor, and a controller. The control valve controls flow of gas in the flow channel. The downstream pressure sensor, located downstream of the control valve, measures gas pressure in the flow channel. The controller has an external trigger input to receive a trigger signal applied to a shutoff valve downstream from the control valve. The controller operates in separate modes based on a state of the trigger signal. In a non-triggered mode, the controller controls pressure at the pressure sensor via the control valve in accordance with a first gain schedule. In the triggered mode, the controller controls the pressure at the pressure sensor via the control valve in accordance with a second gain schedule that is distinct from the first gain schedule.

A manifold can determine a turnover scheme including a target turnover schedule of target turnover levels, based on an operation schedule and efficiency setting for a fluid distribution. Each target turnover level can correspond to a volume of fluid to be cycled through the fluid distribution system over a period of time. The manifold can operate respective valves and a supply device based on a target turnover level and determine a current turnover level from a flowrate detected by a flow sensor for at least one of the valves. The manifold can receive a current usage of the fluid distribution system and determine a required turnover level. An override status for the turnover scheme can be based on the efficiency setting and a comparison of the current, target, and the required turnover levels, and the manifold can operate respective valves and the supply device based on the override status.

A method for temperature control includes: acquiring the present temperature of a reaction window in a process chamber of a semiconductor machine; comparing the present temperature with the preset temperature to acquire a comparison result; and adjusting the exhaust amount of an exhaust passage of the process chamber based on the comparison result to control the temperature of the reaction window.

A fluid pressure reducing valve apparatus includes a pressure reducing valve. The valve has: a body containing a fluid-flow chamber, a liquid supply orifice into the chamber, a liquid outlet from the chamber, a regulation plate opposed to the orifice, a spring acting to urge the plate towards the orifice, and a diaphragm between the plate and the body to close the chamber between them. A controllable motor drive acts between the body and an end of the spring remote from the plate. A flow meter is positioned downstream of the outlet. A controller is arranged to receive flow data from the flow meter and to control the motor drive for withdrawal of the remote end of the spring in accordance with flow rate measured by the flow meter. For an increase in demand flow, the plate is partially withdrawn to maintain downstream pressure on such increase and vice versa.

A water supply system for an aircraft having consumers with buffer stores connected to a water tank by lines and a pressure source. Each consumer has a filling valve between the buffer store and the pressure source. The buffer store can be filled by opening the filling valve. In each consumer, water can be removed from the buffer store by opening a consumer valve. Each consumer transmits at least one state parameter describing a state of the buffer store of the respective consumer to a control system. The control system controls opening and closing of the filling valves of the consumers taking into account the transmitted state parameters such that removal of water from the water tank by the pressure source does not exceed a threshold value at any point in time. An aircraft having a water supply system and method for controlling a water supply system are disclosed.

A first valve of a manifold for a fluid distribution system may regulate a fluid flow to a first fluid handling device (“FHD”). A second valve of the manifold may communicate with a second FHD, a reservoir, or a recirculation line. A target flow condition for the manifold may be determined by a manifold control system (“MCS”) based on a device setting received for the first FHD. The MCS may determine a fluid distribution system operation for obtaining the target flow condition based on the target flow condition, a flowrate of the fluid flow, and an operational state of a supply device. The operation may include the MCS controlling at least one of the supply device, the first valve, and the second valve to change the flowrate. The MCS may continuously operate at least one manifold valve to maintain the target flow condition once exhibited by the manifold.

A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal E1 output to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.

A flow rate component, such as a bypass valve with a motorized actuator, a variable speed circulation pump, or both, is controlled in realtime by an automatic controlled to regulate water flow rate through a swimming pool heater, such as a heat pump, to optimize heat transfer, minimize energy consumption, and improve life spans of components of the swimming pool circulation, filtering and heating system.

A gas supply amount measurement method is performed in a gas supply system including a vaporization section, a control valve provided downstream of the vaporization section, and a supply pressure sensor for measuring the supply pressure between the vaporization section and the control valve. The method comprises: a step of measuring an initial supply pressure by the supply pressure sensor in a state where the control valve is closed; a step of opening the control valve for only a predetermined time; a step of measuring for a plurality of times of the supply pressure in a period of time between a time at which the pressure starts to fall from the initial supply pressure and a time at which a predetermined time has elapsed when the control valve is open for only a predetermined time, and a step of determining the gas supply amount when the control valve is open for only a predetermined time by calculation based on the measured values of the plurality of supply pressures.

A flow rate control device for rapidly adjusting a flow rate to a set flow rate is provided. A flow rate control device for controlling a flow rate of a fluid supplied to a controlled object to hold a flow rate set value in the controlled object includes a measured value acquisition unit acquiring a measured value by a flow rate sensor measuring a flow rate of the fluid, a setting value acquisition unit acquiring the flow rate set value of the fluid, an adjustment value determination unit determining a flow rate adjustment value different from the flow rate set value, and a drive control unit controlling the flow rate of the fluid by adjusting an opening position of a valve supplying the fluid to the controlled object to make a difference between the measured value and the flow rate adjustment value small.