A placement method for integrated circuit design is provided. Each net is considered as a soft module. The net will receive a larger penalty if it covers more routing congested regions. Therefore, it is easier to move the nets away from routing congested regions. In addition, to relieve local congestion, a novel inflation method is proposed to expand the area of a cluster according to its internal connectivity intensity and routing congestion occupied by the cluster. Accordingly, it can get better routability and wirelength.

A placement method for integrated circuit design is provided. Each net is considered as a soft module. The net will receive a larger penalty if it covers more routing congested regions. Therefore, it is easier to move the nets away from routing congested regions. In addition, to relieve local congestion, a novel inflation method is proposed to expand the area of a cluster according to its internal connectivity intensity and routing congestion occupied by the cluster. Accordingly, it can get better routability and wirelength.

Provided are embodiments for a computer-implemented method for routing standard cells of an integrated circuit. Embodiments include obtaining a layout of a plurality of standard cells for routing, and determining existing output connections for each of the plurality of standard cells. Embodiments can also include generating a representation for the layout removing the existing output connections for each of the plurality of standard cells; and providing the representation of the layout to an autorouter. Also provided are embodiments for a system and computer program product for routing standard cells of an integrated circuit.

Provided are embodiments for a computer-implemented method for routing standard cells of an integrated circuit. Embodiments include obtaining a layout of a plurality of standard cells for routing, and determining existing output connections for each of the plurality of standard cells. Embodiments can also include generating a representation for the layout removing the existing output connections for each of the plurality of standard cells; and providing the representation of the layout to an autorouter. Also provided are embodiments for a system and computer program product for routing standard cells of an integrated circuit.

Embodiments for tuning parameters to a synthesis program are provided. At least one set of parameter settings for the synthesis program is selected. A plurality of identical synthesis jobs for the at least one set of parameter settings is run in an iteration of the synthesis program. Results of the iteration of the synthesis program are analyzed utilizing a tuning optimization cost function. Combinations of the parameter settings are created based on the analysis. At least one synthesis job for is run each of the combinations of the parameter settings in a subsequent iteration of the synthesis program. The analysis of the results, the creating of the combinations of parameter settings, and the running at the at least one synthesis job for each of the combinations of parameter settings are repeated until an exit criteria has been achieved.

Systems and techniques that facilitate electronic generation of three-dimensional quantum circuit diagrams are provided. In various embodiments, a system can comprise a data component that can access qubit topology data characterizing a quantum computing device. In various aspects, the system can further comprise a rendering component that can render a three-dimensional quantum circuit diagram based on the qubit topology data. In various instances, the qubit topology data can indicate which qubits of the quantum computing device are coupled together. In various cases, the rendering component can render the three-dimensional quantum circuit diagram by generating a two-dimensional qubit configuration model of the quantum computing device based on which qubits of the quantum computing device are coupled together, by extruding one or more qubit lines three-dimensionally outward from the two-dimensional qubit configuration model, and by rendering one or more quantum gates on the one or more qubit lines.

Systems and techniques that facilitate electronic generation of three-dimensional quantum circuit diagrams are provided. In various embodiments, a system can comprise a data component that can access qubit topology data characterizing a quantum computing device. In various aspects, the system can further comprise a rendering component that can render a three-dimensional quantum circuit diagram based on the qubit topology data. In various instances, the qubit topology data can indicate which qubits of the quantum computing device are coupled together. In various cases, the rendering component can render the three-dimensional quantum circuit diagram by generating a two-dimensional qubit configuration model of the quantum computing device based on which qubits of the quantum computing device are coupled together, by extruding one or more qubit lines three-dimensionally outward from the two-dimensional qubit configuration model, and by rendering one or more quantum gates on the one or more qubit lines.

A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.

This disclosure relates to a computing chip, a hashrate board, and a data processing apparatus. The computing chip includes a plurality of operation stages arranged in a pipeline configuration. Each operation stage includes: a first combinational logic circuit occupying a plurality of first cell points adjacent to each other, at least a portion of the first cell points being located in a first incomplete column; one or more second combinational logic circuits each occupying one or more second cell points, at least a portion of the second cell points being located in a second incomplete column; and a plurality of registers each occupying a plurality of third cell points, at least a portion of the third cell points being located in the first incomplete column or the second incomplete column. The first cell points, the second cell points, and third cell points occupy equal areas on the computing chip.