Methods and systems are provided for protecting a circuit design for an integrated circuit. Logic circuits are identified in at least a portion of the circuit design for replacement. The logic circuits in the circuit design are replaced with a bitstream and configurable circuits that comprise memory circuits. A transformed circuit design is generated for the integrated circuit that comprises the configurable circuits. The configurable circuits in the transformed circuit design perform logic functions of the logic circuits when the bitstream is stored in the memory circuits in the configurable circuits.

Methods and systems are provided for protecting a circuit design for an integrated circuit. Logic circuits are identified in at least a portion of the circuit design for replacement. The logic circuits in the circuit design are replaced with a bitstream and configurable circuits that comprise memory circuits. A transformed circuit design is generated for the integrated circuit that comprises the configurable circuits. The configurable circuits in the transformed circuit design perform logic functions of the logic circuits when the bitstream is stored in the memory circuits in the configurable circuits.

An integrated circuit structure includes a first and second power rail extending in a first direction and being located at a first level, a first and second set of conductive structures located at a second level and extending in a second direction, a first and second set of vias, and a first and second conductive structure located at a third level and extending in the second direction. The first set of vias coupling the first power rail to the first set of conductive structures. The second set of vias coupling the second power rail to the second set of conductive structures. The first conductive structure overlaps a first conductive structure of the first set of conductive structures and the second set of conductive structures. The second conductive structure overlaps a second conductive structure of the first set of conductive structures and the second set of conductive structures.

An integrated circuit structure includes a first and second power rail extending in a first direction and being located at a first level, a first and second set of conductive structures located at a second level and extending in a second direction, a first and second set of vias, and a first and second conductive structure located at a third level and extending in the second direction. The first set of vias coupling the first power rail to the first set of conductive structures. The second set of vias coupling the second power rail to the second set of conductive structures. The first conductive structure overlaps a first conductive structure of the first set of conductive structures and the second set of conductive structures. The second conductive structure overlaps a second conductive structure of the first set of conductive structures and the second set of conductive structures.

Standard cell libraries include one or more standard cells and one or more corresponding standard cell variations. The one or more standard cell variations are different from their one or more standard cells in terms of geometric shapes, locations of the geometric shapes, and/or interconnections between the geometric shapes. The exemplary systems and methods described herein selectively choose from among the one or more standard cells and/or the one or more standard cell variations to form an electronic architectural design for an electronic device. In some situations, some of the one or more standard cells are unable to satisfy one or more electronic design constraints imposed by a semiconductor foundry and/or semiconductor technology node when placed onto the electronic device design real estate. In these situations, the one or more standard cell variations corresponding to these standard cells are placed onto the electronic device design real estate.

Standard cell libraries include one or more standard cells and one or more corresponding standard cell variations. The one or more standard cell variations are different from their one or more standard cells in terms of geometric shapes, locations of the geometric shapes, and/or interconnections between the geometric shapes. The exemplary systems and methods described herein selectively choose from among the one or more standard cells and/or the one or more standard cell variations to form an electronic architectural design for an electronic device. In some situations, some of the one or more standard cells are unable to satisfy one or more electronic design constraints imposed by a semiconductor foundry and/or semiconductor technology node when placed onto the electronic device design real estate. In these situations, the one or more standard cell variations corresponding to these standard cells are placed onto the electronic device design real estate.

A device includes a first cell, a second cell, and first isolation portions. The second cell is adjacent the first cell. The first and second cells are arranged in a first direction, and the first cell includes first and second conductive structures. The first conductive structures extend in the first direction. Each of the first conductive structures has a first end facing the second cell. The second conductive structures extend in the first direction. The first and second conductive structures are alternately arranged in a second direction different from the first direction. The first isolation portions are respectively abutting the first ends of the first conductive structures. Two of the first isolation portions are misaligned with each other in the second direction.

Systems, methods, and devices are disclosed herein for developing a cell design. Operations of a plurality of electrical cells are simulated to collect a plurality of electrical parameters. A machine learning model is trained using the plurality of electrical parameters. The trained machine learning model receives data having cell layout design constraints. The trained machine learning model determines a cell layout for the received data based on the plurality of electrical parameters. The cell layout is provided for further characterization of electrical performance within the cell layout design constraints.

Embodiments provide for building a global clock tree. In embodiments, an example method includes inserting clock drivers at symmetric locations in one or more hierarchy levels of a plurality of hierarchy levels of an integrated circuit (IC) design. The example method further includes generating one or more routes by routing one or more nets within or across the one or more hierarchy levels of the plurality of hierarchy levels. The example method further includes matching symmetric routes of the one or more routes at each of the one or more hierarchy levels irrespective of a number of physical hierarchies each associated net spans. The example method further includes placing one or more ports at one or more signal entry points where routes of the one or more routes cross physical hierarchy blocks.

Embodiments provide for building a global clock tree. In embodiments, an example method includes inserting clock drivers at symmetric locations in one or more hierarchy levels of a plurality of hierarchy levels of an integrated circuit (IC) design. The example method further includes generating one or more routes by routing one or more nets within or across the one or more hierarchy levels of the plurality of hierarchy levels. The example method further includes matching symmetric routes of the one or more routes at each of the one or more hierarchy levels irrespective of a number of physical hierarchies each associated net spans. The example method further includes placing one or more ports at one or more signal entry points where routes of the one or more routes cross physical hierarchy blocks.