Routing a circuit path includes selecting pixels on the circuit path based at least on penalty values associated with the pixels. Pixels on a rejected circuit path are penalized by increasing their penalty values. Re-routing a rejected circuit path allows for pixels on previously rejected paths to be considered when rerouting the rejected circuit path, rather than being eliminated outright.

Routing a circuit path includes selecting pixels on the circuit path based at least on penalty values associated with the pixels. Pixels on a rejected circuit path are penalized by increasing their penalty values. Re-routing a rejected circuit path allows for pixels on previously rejected paths to be considered when rerouting the rejected circuit path, rather than being eliminated outright.

Embodiments of the present application provide a method and an apparatus for adjusting metal wiring density. By detecting metal wiring density in each of metal density detection windows in a target layout, a region in which the metal wiring density is greater than a preset density threshold can be quickly positioned in the target layout, thereby improving the layout correction efficiency; then a power fill mesh in a target metal density detection window in which the metal wiring density is greater than the preset density threshold is cropped multiple times, until the metal wiring density in each of the metal density detection windows is less than or equal to the preset density threshold, such that sufficient power fill meshes are retained in the target layout while the metal wiring density of the target layout is less than or equal to the preset density threshold.

Embodiments of the present application provide a method and an apparatus for adjusting metal wiring density. By detecting metal wiring density in each of metal density detection windows in a target layout, a region in which the metal wiring density is greater than a preset density threshold can be quickly positioned in the target layout, thereby improving the layout correction efficiency; then a power fill mesh in a target metal density detection window in which the metal wiring density is greater than the preset density threshold is cropped multiple times, until the metal wiring density in each of the metal density detection windows is less than or equal to the preset density threshold, such that sufficient power fill meshes are retained in the target layout while the metal wiring density of the target layout is less than or equal to the preset density threshold.

A method of designing a 3D Integrated Circuit including: partitioning at least one design into at least two levels, a first level and a second level, where the first level includes logic and the second level includes memory; and then obtaining a first placement of at least portion of the second level, where the first placement includes placement of a first memory array, where the Circuit includes a plurality of connections between the first level and the second level; and performing a second placement, where performing the second placement includes placing the first logic circuit based on the first placement of the first memory array, where the performing a second placement includes using a placer executed by a computer, where the placer is a part of a Computer Aided Design tool, and where the logic includes a first logic circuit configured to read data from the first memory array.

A method of designing a 3D Integrated Circuit including: partitioning at least one design into at least two levels, a first level and a second level, where the first level includes logic and the second level includes memory; and then obtaining a first placement of at least portion of the second level, where the first placement includes placement of a first memory array, where the Circuit includes a plurality of connections between the first level and the second level; and performing a second placement, where performing the second placement includes placing the first logic circuit based on the first placement of the first memory array, where the performing a second placement includes using a placer executed by a computer, where the placer is a part of a Computer Aided Design tool, and where the logic includes a first logic circuit configured to read data from the first memory array.

A device including first track groups on a first conductive layer of an integrated circuit. Each of the first track groups including at least one of a different first track group pitch, a different first track group spacing, and a different first track group width than the other first track groups. Where each of the first track groups includes first tracks that have at least one of a different first track width and a different first track spacing than the first tracks in the other first track groups.

A device including first track groups on a first conductive layer of an integrated circuit. Each of the first track groups including at least one of a different first track group pitch, a different first track group spacing, and a different first track group width than the other first track groups. Where each of the first track groups includes first tracks that have at least one of a different first track width and a different first track spacing than the first tracks in the other first track groups.

Embodiments of the disclosure relate to the field of semiconductor technologies, and provide a layout and a wiring method, a comparison method, a fabrication method, a device, and a storage medium. The layout wiring method includes: obtaining names of all ports in a layout, each port has a first node and a second node; detecting whether the first node and the second node of each port are each connected to any other port through an actual connection layer, and if not, taking a port of which the first node and/or the second node are not connected to the actual connection layer as a port to be connected; and connecting at least two ports to be connected having the same name using a virtual connection layer.

Embodiments of the disclosure relate to the field of semiconductor technologies, and provide a layout and a wiring method, a comparison method, a fabrication method, a device, and a storage medium. The layout wiring method includes: obtaining names of all ports in a layout, each port has a first node and a second node; detecting whether the first node and the second node of each port are each connected to any other port through an actual connection layer, and if not, taking a port of which the first node and/or the second node are not connected to the actual connection layer as a port to be connected; and connecting at least two ports to be connected having the same name using a virtual connection layer.