A surface inspection apparatus includes an imaging device that images a surface of an object to be inspected; and a processor configured to: calculate a texture of the object through processing of an image imaged by the imaging device; and display a symbol representing the texture of the object at a coordinate position on a multidimensional distribution map.

In one embodiment, a method includes determining, by a processor, a measurement of edge detection noise; receiving a measurement of a biased parameter including measurement noise; based on the measurement of edge detection noise and a number of measurement points, determining a contribution of edge detection noise to the biased parameter; determining an unbiased parameter by subtracting the contribution of noise from the biased parameter including the measurement noise; and outputting the unbiased parameter.

In one embodiment, a method includes determining, by a processor, a measurement of edge detection noise; receiving a measurement of a biased parameter including measurement noise; based on the measurement of edge detection noise and a number of measurement points, determining a contribution of edge detection noise to the biased parameter; determining an unbiased parameter by subtracting the contribution of noise from the biased parameter including the measurement noise; and outputting the unbiased parameter.

In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

In one embodiment, a method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, and identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information. The method also includes determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, analyzing the feature edge positions to determine errors in the manufacture of the pattern structure, and controlling a lithography tool based on the analysis of the feature edge positions.

A method for characterising a region of interest comprising adipose tissue using medical imaging data, e.g. based on computer tomography (CT) of a subject is disclosed. The method comprises calculating the value of a radiomic signature of the region of interest using the medical imaging data. Also disclosed is a method for deriving a radiomic signature indicative of adipose tissue dysfunction. The method comprises obtaining a radiomic dataset and using the radiomic dataset to construct a radiomic signature of a region of interest comprising adipose tissue. Also disclosed are systems for performing the aforementioned methods.

Methods, systems, and computer-readable mediums for configuring a lithography tool to manufacture a semiconductor device. The method includes selecting a first variable, selecting a second variable, selecting at least one response variable that is a function of the first variable and second variable, determining a measurement uncertainty for each response variable, determining, based on a measurement of the response variable, and the measurement uncertainty for the response variable, a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable, wherein the plurality of probabilities represent a process window, and configuring, based on the process window, a lithography tool to manufacture a semiconductor device.

Methods, systems, and computer-readable mediums for configuring a lithography tool to manufacture a semiconductor device. The method includes selecting a first variable, selecting a second variable, selecting at least one response variable that is a function of the first variable and second variable, determining a measurement uncertainty for each response variable, determining, based on a measurement of the response variable, and the measurement uncertainty for the response variable, a plurality of probabilities representing a plurality of indications of whether a plurality of points associated with a lithography process meet a specification requirement for each response variable, wherein the plurality of probabilities represent a process window, and configuring, based on the process window, a lithography tool to manufacture a semiconductor device.

Apparatuses and methods are disclosed for assessing the texture of skin using images thereof. In exemplary embodiments, a texture map of an area of skin is generated from a combination of a standard white light image, a parallel-polarized image, and a cross-polarized image of the area of skin. The texture map is then flattened to remove the underlying curvature of the skin. A texture roughness metric is then generated based on the flattened texture map. An image of the texture map and the metric can be displayed to provide visual and alphanumeric representations of the texture of skin, thereby facilitating the comparison of baseline and follow-up images of the skin, such as those taken before and after treatment.

Apparatuses and methods are disclosed for assessing the texture of skin using images thereof. In exemplary embodiments, a texture map of an area of skin is generated from a combination of a standard white light image, a parallel-polarized image, and a cross-polarized image of the area of skin. The texture map is then flattened to remove the underlying curvature of the skin. A texture roughness metric is then generated based on the flattened texture map. An image of the texture map and the metric can be displayed to provide visual and alphanumeric representations of the texture of skin, thereby facilitating the comparison of baseline and follow-up images of the skin, such as those taken before and after treatment.