Patent classifications
G11B7/261
METHOD FOR PRODUCING A HIGH DEFINITION ANALOGUE AUDIO STORAGE MEDIUM
The present invention provides a computer-implemented method and an apparatus for manufacturing an analogue audio storage medium wherein digital audio data is converted into topographical data representing an analogue translation of the digital audio data, and a laser beam is selectively applied to a substrate to form a physical imprint of the topographical data on the surface of the substrate to create an analogue audio storage medium. The medium may be directly playable on a conventional playback device such as a record player and/or used to mould further playable mediums. The invention thereby enables more efficient manufacturing of e.g. vinyl records and consistently ensures a much higher quality of analogue audio.
Cylindrical base, master and master manufacturing method
Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
HEAT-REACTIVE RESIST MATERIAL, MOLD MANUFACTURING METHOD, MOLD, DEVELOPMENT METHOD AND PATTERN FORMATION MATERIAL
A heat-reactive resist material contains copper oxide, and silicon or silicon oxide, and is formed so that the content of silicon or silicon oxide in the heat-reactive resist material is 4.0 mol % or more less than 10.0 mol % in terms of mole of silicon. A heat-reactive resist layer is formed using the heat-reactive resist material, is exposed, and then, is developed with a developing solution. Using the obtained heat-reactive resist layer as a mask, dry etching is performed on a substrate with a fluorocarbon to manufacture a mold having a concavo-convex shape on the substrate surface. At this point, it is possible to control a fine pattern comprised of the concavo-convex shape.
DATA STORAGE MEDIUM AND MANUFACTURING METHOD THEREOF, DATA STORAGE MEDIUM, DATA READ OUT APPARATUS AND DATA READ OUT METHOD
A data storage medium includes a convexoconcave structure formed in a storage area which is set on a first surface of a quartz glass substrate. The storage area includes a plurality of unit storage areas which are arrayed at least in one direction, and non-data storage areas which are disposed between the unit storage areas, which are adjacent to each other. The convexoconcave structure includes unit data patterns, address patterns and boundary patterns. The unit data patterns are formed in the plurality of unit storage areas respectively in the array sequence of the unit storage areas, and the address patterns are formed in the non-data storage areas so as to correspond to each of the unit storage areas in which the unit data patterns are formed respectively.
CYLINDRICAL BASE, MASTER AND MASTER MANUFACTURING METHOD
Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
Cylindrical base, master and master manufacturing method
Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
METHOD FOR MANUFACTURING INFORMATION RECORDING MEDIUM
The same digital data is recorded with highly integrated manner on a plurality of media able to durably hold information over long-term. A minute graphic pattern indicating data bit information is drawn on a resist layer formed on a quartz glass substrate by exposing a beam and developed so as to prepare a master medium (M1), which comprises the quartz glass substrate having a minute recess and protrusion structure formed by etching where the remaining resist are used as a mask (FIG. (a)). The recess and protrusion structure recorded on the master medium (M1) is shaped and transferred onto a flexible recording medium (G2) on which a UV curable resin layer (61) is formed, whereby an intermediate medium (M2) is prepared (FIGS. (b)-(d)). The inverted recess and protrusion structure transferred to the intermediate medium (M2) is shaped and transferred onto a recording medium (G3) comprising a quartz glass substrate (70) on which a UV curable resin layer (80) is formed, whereby a reproduction medium (M3) having the same recess and protrusion structure as that of the master medium (M1) is prepared (FIGS. (e)-(h)). In shaping and transferring process, the media are separated using the flexibility of the intermediate medium (M2).
Method and device for irradiating spots on a layer
For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
Method of writing to an optical data storage medium, method of reading from an optical data storage medium, and optical data storage medium
According to embodiments of the present invention, a method of writing to an optical data storage medium is provided. The method includes receiving a plurality of data elements, each data element having one of a plurality of values, wherein each value of the plurality of values is associated with a wavelength, and forming, for each data element, a nanostructure arrangement on the optical data storage medium, the nanostructure arrangement configured to reflect light of the wavelength associated with the value of the data element in response to a light irradiated on the optical data storage medium. According to further embodiments of the present invention, a method of reading from an optical data storage medium and an optical data storage medium are also provided.
Substrate alignment through detection of rotating timing pattern
Apparatus and method for aligning a rotatable substrate. In some embodiments, a circumferentially extending timing pattern is formed on a substrate. The timing pattern nominally extends about a center point of the substrate at a selected radius. The substrate is mounted to a support mechanism which rotates the substrate about a central axis. Due to mechanical tolerances, the central axis will be offset from the center point of the substrate as a result of an alignment error during the mounting of the substrate. The offset between the support mechanism central axis and the center point of the substrate is determined using a detector that detects two opposing cross-over transitions of the timing pattern during each revolution of the substrate. A feature may be written to the substrate by positioning a write element with respect to the substrate responsive to the detected offset.