An electronic device comprises a semiconductor memory that includes: a memory cell; a protective layer disposed along a profile of the memory cell; and a buffer layer interposed between at least a portion of a sidewall of the memory cell and the protective layer, wherein the buffer layer and the protective layer include silicon nitride, and wherein a density of the protective layer is greater than a density of the buffer layer.

A storage element is provided. The storage element includes a memory layer; a fixed magnetization layer; an intermediate layer including a non-magnetic material; wherein the intermediate layer is provided between the memory layer and the fixed magnetization layer; wherein the fixed magnetization layer includes at least a first magnetic layer, a second magnetic layer, and a non-magnetic layer, and wherein the first magnetic layer includes a CoFeB composition. A memory apparatus and a magnetic head are also provided.

The disclosed technology relates to a multibit memory cell. In one aspect, the multibit memory cell includes a plurality of spin-orbit torque (SOT) tracks, plurality of magnetic tunnel junctions (MTJs), an electrically conductive path connecting a first MTJ and a second MTJ together, and a plurality of terminals. The plurality of terminals can be configured to provide a first SOT write current to the first MTJ, a second SOT write current to the second MTJ, and at least one of: the second SOT write current to a third MTJ, a third SOT write current to the third MTJ, and a spin transfer torque (STT) write current through the third MTJ. The junction resistances of the various MTJs are such that a combined multibit memory state of the MTJs is readable by a read current through all the MTJs in series.

Some embodiments relate to a memory device. The memory device includes a magnetoresistive random-access memory (MRAM) cell comprising a magnetic tunnel junction (MTJ). The MTJ device comprises a stack of layers, comprising a bottom electrode disposed over a substrate. A seed layer disposed over the bottom electrode. A buffer layer is disposed between the bottom electrode and the seed layer. The buffer layer prevents diffusion of a diffusive species from the bottom electrode to the seed layer.

A semiconductor storage device includes a memory cell including a switching element and a variable resistance element, and a circuit for switching the memory cell ON, performing a first read operation on the memory cell, generating a first voltage based on the first read operation, switching the memory cell ON after first data is written to the memory cell, performing a second read operation while the memory cell is maintained to be ON when the first data is stored in the memory cell during the first read operation, performing the second read operation after the memory cell transitions from ON to OFF at least once when second data is stored in the memory cell during the first read operation, generating a second voltage based on the second read operation, and determining the data stored in the memory cell during the first read operation based on the first and second voltages.

An ultra-fast magnetic random access memory (MRAM) comprises a three terminal composite SOT magnetic tunneling junction (CSOT-MTJ) element including a magnetic flux guide (MFG) having a very high magnetic permeability, a spin Hall channel (SHC) having a large positive spin Hall angle, an in-plane magnetic memory (MM) layer, a tunnel barrier (TB) layer, and a magnetic pinning stack (MPS) having a synthetic antiparallel coupling pinned by an antiferromagnetic material. The magnetic writing is significantly boosted by a combined effort of enhanced spin orbit torque (SOT) and Lorentz force generated by current-flowing wire (CFW) in the SHC layer and spin transfer torque (STT) by a current flowing through the MTJ stack, and further enhanced by a magnetic close loop formed at the cross section of MFG/SHC/MM tri-layer.

A method for controlling functional elements and a device for use in bioprocess engineering or medical technology is disclosed. The method includes providing a first functional element, which has a memory, in which items of element information having specifications about the type and the function of the functional element are stored, and providing a second functional element. The method includes connecting the first and the second functional element to a control unit, reading the items of element information out of the first functional element and carrying out a check of the read-out items of element information from the second functional element or using items of information which are stored in the control unit. The first functional element is controlled by the control unit in dependence on the check or in dependence on the items of element information.

A magnetoelectric memory device includes a magnetic tunnel junction located between a first electrode and a second electrode. The magnetic tunnel junction includes a reference layer, a nonmagnetic tunnel barrier layer, a free layer, and a dielectric capping layer. At least one layer that provides voltage-controlled magnetic anisotropy is provided within the magnetic tunnel junction, which may include a pair of nonmagnetic metal dust layers located on, or within, the free layer, or a two-dimensional metal compound layer including a compound of a nonmagnetic metallic element and a nonmetallic element.

A memory system may include a magnetic tunnel junction stack, a first high resistance tunnel barrier, and a first voltage controlled magnetic anisotropy write layer. The first voltage controlled magnetic anisotropy write layer may be adjacent the high resistance tunnel barrier, and the voltage controlled magnetic anisotropy write line may include a magnetic material in direct contact with a high resistance tunnel barrier.

A magnetoelectric memory device includes a magnetic tunnel junction located between a first electrode and a second electrode. The magnetic tunnel junction includes a reference layer, a nonmagnetic tunnel barrier layer, a free layer, and a dielectric capping layer. At least one layer that provides voltage-controlled magnetic anisotropy is provided within the magnetic tunnel junction, which may include a pair of nonmagnetic metal dust layers located on, or within, the free layer, or a two-dimensional metal compound layer including a compound of a nonmagnetic metallic element and a nonmetallic element.