Some embodiments include an apparatus having horizontally-spaced bottom electrodes supported by a supporting structure. Leaker device material is directly against the bottom electrodes. Insulative material is over the bottom electrodes, and upper electrodes are over the insulative material. Plate material extends across the upper electrodes and couples the upper electrodes to one another. The plate material is directly against the leaker device material. The leaker device material electrically couples the bottom electrodes to the plate material, and may be configured to discharge at least a portion of excess charge from the bottom electrodes to the plate material. Some embodiments include methods of forming apparatuses which include capacitors having bottom electrodes and top electrodes, with the top electrodes being electrically coupled to one another through a conductive plate. Leaker devices are formed to electrically couple the bottom electrodes to the conductive plate.

Three-dimensional hysteretic memory based on semiconductor nanoribbons is disclosed. An example memory cell may include a nanoribbon-based access transistor and a capacitor coupled to the access transistor, where the capacitor at least partially wraps around the nanoribbon in which the access transistor is formed. One or both of a gate stack of the access transistor and the capacitor insulator may include a hysteretic material/arrangement. Plurality of such memory cells may be provided in a single nanoribbon, and the nanoribbon may be one of a stack of nanoribbons provided above one another over a support structure. Incorporating hysteretic memory cells in different layers above a support structure by using stacks of semiconductor nanoribbons may allow significantly increasing density of hysteretic memory cells in a memory array having a given footprint area, or conversely, significantly reducing the footprint area of the memory array with a given density of hysteretic memory cells.

The present disclosure includes apparatuses, methods, and systems for using an average reference voltage for sensing memory. An embodiment includes a memory having a plurality of memory cells coupled to a common node driver, where a group of the memory cells are coupled to an access line and each respective memory cell of the group is coupled to a different respective sense line, sense circuitry coupled to the different respective sense lines, and circuitry configured to apply an average reference voltage from the common node driver to the sense circuitry during a sense operation being performed on the group of memory cells coupled to the access line.

In some examples, an electronic device comprising an input ferroelectric (FE) capacitor, an output FE capacitor, and a channel positioned beneath the input FE capacitor and positioned beneath the output FE capacitor. In some examples, the channel is configured to carry a magnetic signal from the input FE capacitor to the output FE capacitor to cause a voltage change at the output FE capacitor. In some examples, the electronic device further comprises a transistor-based drive circuit electrically connected to an output node of the output FE capacitor. In some examples, the transistor-based drive circuit is configured to deliver, based on the voltage change at the output FE capacitor, an output signal to an input node of a second device.

Methods, systems, and devices for sensing a memory with shared sense components are described. A device may activate a word line and a plate line each coupled with a set of memory cells, where each memory cell of the set of memory cells is coupled with a respective digit line of a set of digit lines. The device may activate a set of switching components to couple each digit line of the set of digit lines with a respective sense component of a set of sense components, where each switching component of the set of switching components is coupled with a respective memory cell of the set of memory cells. The device may sense the set of memory cells based on activating the word line and the plate line and based on coupling the set of digit lines with the set of sense components.

A high-density low voltage ferroelectric (or paraelectric) memory bit-cell that includes a planar ferroelectric or paraelectric capacitor. The memory bit-cell comprises 1T1C configuration, where a plate-line is parallel to a word-line, or the plate-line is parallel to a bit-line. The memory bit-cell can be 1TnC, where ‘n’ is a number. In a 1TnC bit-cell, the capacitors are vertically stacked allowing for multiple values to be stored in a single bit-cell. The memory bit-cell can be multi-element FE gain bit-cell. In a multi-element FE gain bit-cell, data sensing is done with signal amplified by a gain transistor in the bit-cell. As such, higher storage density is realized using multi-element FE gain bit-cells. In some examples, the 1T1C, 1TnC, and multi-element FE gain bit-cells are multi-level bit-cells. To realize multi-level bit-cells, the capacitor is placed in a partially switched polarization state by applying different voltage levels or different time pulse widths at the same voltage level.

A 3D monolithic stacking memory structure is provided in the present invention, including a semiconductor substrate, a field effect transistor (FET) on the semiconductor substrate, a plurality of back-end metal layers on the FET and the semiconductor substrate, an oxide-semiconductor FET (OSFET) in the back-end metal layers, wherein a drain of the OSFET is connected with a gate of the FET, and a FEMIM storage capacitor formed on the back-end metal layers, wherein a bottom electrode of the FEMIM storage capacitor is connected with the drain of the OSFET and the gate of the FET, and the FET, the OSFET and the FEMIM storage capacitor are stacked in order from bottom to top on the semiconductor substrate.

Disclosed herein is a programmable delay circuit for providing an adjustable delay for a signal transmitted from an input node to an output node. The adjustable delay circuit includes a state-programmable memory element that may be programmed to a first state to provide a first delay as the adjustable delay or programmed to a second state to provide a second delay as the adjustable delay. The state-programmable memory element may be a remanent polarizable capacitor that may be programmed to at least two different remanent polarization states to configure the first delay or the second delay.

A semiconductor device including a capacitor, with a memory film isolating a first electrode from a contact, formed over a transistor and methods of forming the same are disclosed. In an embodiment, a semiconductor device includes a gate stack over a semiconductor substrate; a capacitor over the gate stack, the capacitor including a first electrode extending along a top surface of the gate stack, the first electrode being U-shaped; a first ferroelectric layer over the first electrode; and a second electrode over the first ferroelectric layer, a top surface of the second electrode being level with a top surface of the first ferroelectric layer, and the top surface of the first ferroelectric layer and the top surface of the second electrode being disposed further from the semiconductor substrate than a topmost surface of the first electrode.

A semiconductor structure includes a substrate, an interconnection structure disposed over the substrate and a first memory cell. The first memory cell is disposed over the substrate and embedded in dielectric layers of the interconnection structure. The first memory cell includes a first transistor and a first data storage structure. The first transistor is disposed on a first base dielectric layer and embedded in a first dielectric layer. The first data storage structure is embedded in a second dielectric layer and electrically connected to the first transistor. The first data storage structure includes a first electrode, a second electrode and a storage layer sandwiched between the first electrode and the second electrode.