A memory device having a plurality sections of memory cells, such as ferroelectric memory cells (hybrid RAM (HRAM) cells) may provide for concurrent access to memory cells within independent sections of the memory device. A first memory cell may be activated, and it may be determined that a second memory cell is independent of the first memory cell. If the second memory cell is independent of the first memory cell, the second memory cell may be activated prior to the conclusion of operations at the first memory cell. Latching hardware at memory sections may latch addresses at the memory sections in order to allow a new address to be provided to a different section to access the second memory cell.

Described herein are ferroelectric (FE) memory cells that include transistors having gates with FE capacitors integrated therein. An example memory cell includes a transistor having a semiconductor channel material, a gate dielectric over the semiconductor material, a first conductor material over the gate dielectric, a FE material over the first conductor material, and a second conductor material over the FE material. The first and second conductor materials form, respectively, first and second capacitor electrodes of a capacitor, where the first and second capacitor electrodes are separated by the FE material (hence, a “FE capacitor”). Separating a FE material from a semiconductor channel material of a transistor with a layer of a gate dielectric and a layer of a first conductor material eliminates the FE-semiconductor interface that may cause endurance issues in some other FE memory cells.

Methods and apparatuses for thin film transistors and related fabrication techniques are described. The thin film transistors may access two or more decks of memory cells disposed in a cross-point architecture. The fabrication techniques may use one or more patterns of vias formed at a top layer of a composite stack, which may facilitate building the thin film transistors within the composite stack while using a reduced number of processing steps. Different configurations of the thin film transistors may be built using the fabrication techniques by utilizing different groups of the vias. Further, circuits and components of a memory device (e.g., decoder circuitry, interconnects between aspects of one or more memory arrays) may be constructed using the thin film transistors as described herein along with related via-based fabrication techniques.

Methods, systems, and devices for low voltage ferroelectric memory cell sensing are described. As part of an access operation for a memory cell, gates of two cascodes may be biased to compensate for associated threshold voltages. An extracted signal corresponding to a charge stored in the memory cell may be transferred through a first cascode to charge a first capacitor. Similarly, a reference signal developed at a dummy digit line may be transferred through a second cascode to charge a second capacitor. By comparing the reference signal developed at the dummy digit line to the extracted signal from the memory cell, the effect of variations in memory cell performance on the sense window may be reduced. Additionally, based on biasing the gates of the cascodes, the difference between the signals compared at the sense component may be low compared to other sensing schemes.

Methods, systems, and devices for thin film transistor deck selection in a memory device are described. A memory device may include memory arrays arranged in a stack of decks formed over a substrate, and deck selection components distributed among the layers to leverage common substrate-based circuitry. For example, each memory array of the stack may include a set of digit lines of a corresponding deck, and deck selection circuitry operable to couple the set of digit lines with a column decoder that is shared among multiple decks. To access memory cells of a selected memory array on one deck, the deck selection circuitry corresponding to the memory array may each be activated, while the deck selection circuitry corresponding to a non-selected memory array on another deck may be deactivated. The deck selection circuitry, such as transistors, may leverage thin-film manufacturing techniques, such as various techniques for forming vertical transistors.

Methods, systems, and devices for voltage adjustment of memory dies based on weighted feedback are described. A supply voltage may be measured at various areas of a memory die, weights may be applied to the measured voltages based on the area from which the particular voltage was measured. The supply voltage may be adjusted based on the weighted signals. The signals may be weighted using digital or analog techniques. Different durations of time in which oscillations from an oscillator circuit are counted may provide weighting for a signal. Weights applied to the signals may be dynamically adjusted, which may allow the weights to be tuned or changed based on changes to operating conditions of the memory dies.

Some embodiments include ferroelectric assemblies. Some embodiments include a capacitor which has ferroelectric insulative material between a first electrode and a second electrode. The capacitor also has a metal oxide between the second electrode and the ferroelectric insulative material. The metal oxide has a thickness of less than or equal to about 30 Å. Some embodiments include a method of forming an assembly. A first capacitor electrode is formed over a semiconductor-containing base. Ferroelectric insulative material is formed over the first electrode. A metal-containing material is formed over the ferroelectric insulative material. The metal-containing material is oxidized to form a metal oxide from the metal-containing material. A second electrode is formed over the metal oxide.

Apparatuses and methods are disclosed that include ferroelectric memory and for operating ferroelectric memory. An example apparatus includes a capacitor having a first plate, a second plate, and a ferroelectric dielectric material. The apparatus further includes a first digit line and a first selection component configured to couple the first plate to the first digit line, and also includes a second digit line and a second selection component configured to couple the second plate to the second digit line.

Embodiments of the disclosure are directed to advanced integrated circuit structure fabrication and, in particular, to ferroelectric random access memory (FRAM) devices with an enhanced capacitor architecture. Other embodiments may be disclosed or claimed.

The present disclosure provides a memory circuit, a memory device and an operating method of the memory device. The memory device includes a storage transistor, a variable capacitance device and a control transistor. The variable capacitance device is electrically connected to the gate of the storage transistor, and the control transistor is connected to the storage transistor in series.