A method for measuring the depth of the vapour cavity during an industrial machining process employs a high-energy beam. An optical measuring beam is directed towards the base of a vapour cavity. An optical coherence tomograph generates interference factors or other raw measurement data from reflections of the measurement beam. An evaluation device generates undisturbed measurement data, wherein raw measurement data that is generated at different times is processed together in the course of a mathematical operation. This operation can be a subtraction or a division. Slowly changing interference factors can thus be eliminated. An end value for the distance to the base of the vapour cavity is calculated from the undisturbed measurement data using a filter. As a result, the depth of the vapour cavity can be determined, in the knowledge of the distance at a part of the surface of the work piece that is not exposed to the high-energy beam.

A heterodyne optical interferometer incorporates error correction elements to correct a cyclic error that may be present in an interferometric measurement. The cyclic error can be caused by various factors such as an imperfect polarization relationship between two wavelength components, deficiencies in optical propagation paths (such as light leakage), imperfect optical coatings, and/or imperfect components. The cyclic error, which typically manifests itself as erroneous displacement information characterized by a low velocity sinusoidal frequency component, can be reduced or eliminated by using birefringent optical elements and other optical elements to alter certain characteristics of one or both wavelength components and reduce light leakage components in one or more light propagation paths in the heterodyne optical interferometer.

Channel separation in ophthalmologic systems is achieved by introducing a small angle between each beam incident on the scanner. The multiple channels are emitted from multiple emitters positioned such that their respective beams reach an X-Y scanner with small angular separations between the beams. This removes the need for dichroic components to combine the multiple channels into a single beam. This also allows the emitters to use the same wavelength if desired, such as in a combined SLO and OCT system in which it may be desirable to use the same light source in order to reduce the cost and complexity of the system.

Deriving data for calibration or improving the positioning of a computer-controlled machine including a movable carrier for changing the position of a first machine part relative that of second machine part. The carrier is moved to a plurality of carrier positions such that the position of the first machine part relative to that of the second machine part changes for each of said plurality of positions. At each carrier position, a pattern generator attached to the first machine part is illuminated with at least two illuminators such that at least one spatial light pattern is created in space. Position data related to the position of said carrier is recorded and composite images of said at least one spatial light pattern is recorded in at least two different optical configurations of said at least two illuminators, said pattern generator, and at least one camera.

An optical distance measurement device includes: a photodetector including PDs for receiving interference light output from an optical interference unit and outputting detection signals of the interference light; and a switch for selecting one of the detection signals output from the PDs, in which a distance calculation unit calculates a distance to a measurement object on the basis of the detection signal selected by the switch.

An interferometric position sensor for sensing the position of an object is disclosed. The position sensor comprises a light source arranged to emit light, a beam splitter, and a detector array. The beam splitter is arranged to split the light between first and second optical paths, which are configured such that the split light is recombined so as to form an optical interference pattern dependent on the difference between the optical path lengths of the first and second optical paths. The detector array is arranged to measure the intensity of at least a part of the optical interference pattern. At least one of the first and second optical path lengths is arranged to be dependent on the position of the object, such that changes in the optical interference pattern can be related to changes in the position of the object.

A measuring assembly for the frequency-based determination of the position of a component, in particular in an optical system for microlithography, includes at least one optical resonator, which has a stationary first resonator mirror, a movable measurement target assigned to the component, and a stationary second resonator mirror. The second resonator mirror is formed by an inverting mirror (130, 330, 430, 530), which reflects back on itself a measurement beam coming from the measurement target.

An optical measurement device includes: a deformation measurement device for measuring magnitude of deformation of an optical detection platform frame, and a correction module for correcting the position of a substrate carrier and/or the position of an optical detection device according to the magnitude of deformation of the optical detection platform frame, so as to eliminate an error in measurement of mark positions due to deformation of the frame. An optical measurement method is also disclosed.

A laser welding device is configured to switch an irradiation position of a measurement beam between a position of a keyhole coaxial with the optical axis of a laser beam and a position of a weld bead behind the center of an optical axis of the laser beam in a welding direction. The laser welding device determines whether there is a gap between an upper metal plate and a lower metal plate based on a measured value of a recess depth measured at the position of the weld bead.

The invention relates to an OCT system comprising an OCT light source, an OCT evaluation unit, a first OCT light guide, a second OCT light guide and a changeover module. The light from the OCT light source passes through the changeover module. In a first state of the changeover module, the OCT light is passed to an entry end of the first OCT light guide. In a second state of the changeover module, the OCT light is passed to an entry end of the second OCT light guide. A scanning device assigned to the first OCT light guide is arranged between the changeover module and the object plane. The OCT system according to the invention can be used in a flexible manner.